Patents by Inventor Stoyan Nihtianov
Stoyan Nihtianov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8426831Abstract: In one an embodiment, there is provided an assembly comprising at least one detector. Each of the at least one detector includes a substrate having a doped region of a first conduction type, a layer of dopant material of a second conduction type located on the substrate, a diffusion layer formed within the substrate and in contact with the layer of dopant material and the doped region of the substrate, wherein a doping profile, which is representative of a doping material concentration of the diffusion layer, increases from the doped region of the substrate to the layer of dopant material, a first electrode connected to the layer of dopant material, and a second electrode connected to the substrate. The diffusion layer is arranged to form a radiation sensitive surface.Type: GrantFiled: February 17, 2012Date of Patent: April 23, 2013Assignee: ASML Netherlands B.V.Inventors: Stoyan Nihtianov, Arie Johan Van Der Sijs, Bearrach Moest, Petrus Wilhelmus Josephus Maria Kemper, Marc Antonius Maria Haast, Gerardus Wilhelmus Petrus Baas, Lis Karen Nanver, Francesco Sarubbi, Antonius Andreas Johannes Schuwer, Gregory Micha Gommeren, Martijn Pot, Thomas Ludovicus Maria Scholtes
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Patent number: 8324598Abstract: In one an embodiment, there is provided an assembly comprising at least one detector. Each of the at least one detector includes a substrate having a doped region of a first conduction type, a layer of dopant material of a second conduction type located on the substrate, a diffusion layer formed within the substrate and in contact with the layer of dopant material and the doped region of the substrate, wherein a doping profile, which is representative of a doping material concentration of the diffusion layer, increases from the doped region of the substrate to the layer of dopant material, a first electrode connected to the layer of dopant material, and a second electrode connected to the substrate. The diffusion layer is arranged to form a radiation sensitive surface.Type: GrantFiled: February 17, 2012Date of Patent: December 4, 2012Assignee: ASML Netherlands B.V.Inventors: Stoyan Nihtianov, Arie Johan Van Der Sijs, Bearrach Moest, Petrus Wilhelmus Josephus Maria Kemper, Marc Antonius Maria Haast, Gerardus Wilhelmus Petrus Baas, Lis Karen Nanver, Francesco Sarubbi, Antonius Andreas Johannes Schuwer, Gregory Micha Gommeren, Martijn Pot, Thomas Ludovicus Maria Scholtes
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Publication number: 20120268722Abstract: In one an embodiment, there is provided an assembly comprising at least one detector. Each of the at least one detector includes a substrate having a doped region of a first conduction type, a layer of dopant material of a second conduction type located on the substrate, a diffusion layer formed within the substrate and in contact with the layer of dopant material and the doped region of the substrate, wherein a doping profile, which is representative of a doping material concentration of the diffusion layer, increases from the doped region of the substrate to the layer of dopant material, a first electrode connected to the layer of dopant material, and a second electrode connected to the substrate. The diffusion layer is arranged to form a radiation sensitive surface.Type: ApplicationFiled: February 17, 2012Publication date: October 25, 2012Applicant: ASML Netherlands B.V.Inventors: Stoyan NIHTIANOV, Arie Johan Van Der Sijs, Bearrach Moest, Petrus Wilhelmus Josephus Maria Kemper, Marc Antonius Maria Haast, Gerardus Wilhelmus Petrus Baas, Lis Karen Nanver, Francesco Sarubbi, Antonius Andreas Johannes Schuwer, Gregory Micha Gommeren, Martijn Pot, Thomas Ludovicus Maria Sholtes
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Publication number: 20120113402Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.Type: ApplicationFiled: November 3, 2011Publication date: May 10, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria CADEE, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Comelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
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Patent number: 8138485Abstract: A radiation detector, a method of manufacturing a radiation detector, and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation sensitive surface. The radiation sensitive surface is sensitive to radiation wavelengths between 10-200 nm and charged particles. The radiation detector has a silicon substrate, a dopant layer, a first electrode, and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the silicon substrate.Type: GrantFiled: June 24, 2008Date of Patent: March 20, 2012Assignee: ASML Netherlands B.V.Inventors: Stoyan Nihtianov, Arie Johan Van Der Sijs, Bearrach Moest, Petrus Wilhelmus Joseph Maria Kemper, Marc Antonius Maria Haast, Gerardus Wilhelmus Petrus Baas, Lis Karen Nanver, Francesco Sarubbi, Antonius Andreas Johannes Schuwer, Gregory Micha Gommeren, Martijn Pot, Thomas Ludovicus Maria Scholtes
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Publication number: 20100321650Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.Type: ApplicationFiled: August 26, 2010Publication date: December 23, 2010Applicant: ASML NETHERLANDS B.V.Inventors: THEODORUS PETRUS MARIA CADEE, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Mana Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Comelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
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Patent number: 7830495Abstract: A lithographic apparatus having a stationary magnet motor to drive a support such as a substrate support or a patterning device support, may be provided with a measurement system to measure a position of the support in question, e.g., to provide a safety system to prevent a collision of the support with another part. The measurement system may be configured to measure a magnetic field strength of an alternating magnetic field generated by the magnet assembly of the stationary magnet motor, and/or measure generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measure light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter.Type: GrantFiled: July 10, 2007Date of Patent: November 9, 2010Assignee: ASML Netherlands B.V.Inventors: Olaf Hubertus Wilhelmus Van Bruggen, Marcel Koenraad Marie Baggen, Johannes Roland Dassel, Remko Wakker, Stoyan Nihtianov, Frank Auer, Frits Van Der Meulen, Patrick David Vogelsang, Martinus Cornelis Reijnen, Tom Van Zutphen
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Patent number: 7804575Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.Type: GrantFiled: August 17, 2005Date of Patent: September 28, 2010Assignee: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
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Publication number: 20100165310Abstract: A system for inspecting an extreme ultra violet (EUV) mask. The system includes an array of sensors and an optical system. The array of sensors is configured to produce analog data corresponding to received optical energy. The optical system is configured to direct EUV light from an inspection area of an EUV patterning device onto the array of sensors, whereby the analog data is used to determine defects or to compensate for irregularities found on the EUV mask.Type: ApplicationFiled: October 21, 2009Publication date: July 1, 2010Applicant: ASML Holding N.V.Inventors: Harry SEWELL, Stoyan Nihtianov, Luigi Scaccabarozzi
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Patent number: 7586108Abstract: The invention relates to a radiation detector, a method of manufacturing a radiation detector and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation-sensitive surface. The radiation-sensitive surface is sensitive for radiation with a wavelength between 10-200 nm. The radiation detector has a silicon substrate, a dopant layer, a first electrode and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer which is in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the Silicon substrate.Type: GrantFiled: June 25, 2007Date of Patent: September 8, 2009Assignee: ASML Netherlands B.V.Inventors: Stoyan Nihtianov, Arie Johan Van Der Sijs, Bearrach Moest, Petrus Wilhelmus Josephus Maria Kemper, Marc Antonius Maria Haast, Gerardus Wilhelmus Petrus Baas, Lis Karen Nanver, Francesco Sarubbi, Antonius Andreas Johannes Schuwer, Gregory Micha Gommeren, Martijn Pot, Thomas Ludovicus Maria Scholtes
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Publication number: 20090021717Abstract: A radiation detector, a method of manufacturing a radiation detector, and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation sensitive surface. The radiation sensitive surface is sensitive to radiation wavelengths between 10-200 nm and charged particles. The radiation detector has a silicon substrate, a dopant layer, a first electrode, and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the silicon substrate.Type: ApplicationFiled: June 24, 2008Publication date: January 22, 2009Applicant: ASML Netherlands B.V.Inventors: Stoyan Nihtianov, Arie Johan Van Der Sijs, Bearrach Moest, Petrus Wilhelmus, Joshepus, Maria Kemper, Marc Antonius, Maria Haast, Gerardus Wilhelmus, Petrus, Baas, Lis Karen Nanver, Francesco Sarubbi, Antonius Andreas, Johannes Schuwer, Gregory Micha Gommeren, Martijn Pot, Thomas Ludovicus, Maria Scholtes
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Publication number: 20090015246Abstract: A lithographic apparatus having a stationary magnet motor to drive a support such as a substrate support or a patterning device support, may be provided with a measurement system to measure a position of the support in question, e.g., to provide a safety system to prevent a collision of the support with another part. The measurement system may be configured to measure a magnetic field strength of an alternating magnetic field generated by the magnet assembly of the stationary magnet motor, and/or measure generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measure light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter.Type: ApplicationFiled: July 10, 2007Publication date: January 15, 2009Applicant: ASML Netherlands B.V.Inventors: Olaf Hubertus Wilhelmus Van Bruggen, Frank Auer, Marcel Koenraad Marie Baggen, Frits Van Der Meulen, Patrick David Vogelsang, Martinus Cornelis Reijnen, Johannes Roland Dassel, Stoyan Nihtianov, Remko Wakker, Tom Van Zutphen
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Publication number: 20080315121Abstract: The invention relates to a radiation detector, a method of manufacturing a radiation detector and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation-sensitive surface. The radiation-sensitive surface is sensitive for radiation with a wavelength between 10-200 nm. The radiation detector has a silicon substrate, a dopant layer, a first electrode and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer which is in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the Silicon substrate.Type: ApplicationFiled: June 25, 2007Publication date: December 25, 2008Applicant: ASML Netherlands B.V.Inventors: Stoyan Nihtianov, Arie Johan Van Der Sijs, Bearrach Moest, Petrus Wilhelmus Josephus Maria Kemper, Marc Antonius Maria Haast, Gerardus Wilhelmus Petrus Baas, Lis Karen Nanver, Francesco Sarubbi, Antonius Andreas Johannes Schuwer, Gregory Micha Gommeren, Martijn Pot, Thomas Ludovicus Maria Scholtes
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Patent number: 7321416Abstract: The present invention comprises a lithographic apparatus and device manufacturing method method that uses a patterning device that increase a number of individually controllable elements that are programmed simultaneously to increase an update rate of an array of individually controllable elements. A number of required high speed analog inputs to the array is reduced. The complexity of the array is reduced and the maximum update speed of the array is increased. Furthermore, the number of elements within an array can be readily expanded. The patterning device can be divided into a plurality of groups of cells and the lithographic apparatus can comprise a plurality of supply channels. Each supply channel can be arranged to provide a voltage signal to each cell in a respective group of cells. This can reduce the number of required inputs to the patterning device for individually addressing each cell.Type: GrantFiled: June 15, 2005Date of Patent: January 22, 2008Assignee: ASML Netherlands B.V.Inventors: Martinus Cornelis Reijnen, Andrej Makarovic, Lambertus Gerardus Maria Kessels, Stoyan Nihtianov, Petrus Wilhelmus Josephus Maria Kemper, Kamen Hristov Chilov
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Patent number: 7304715Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.Type: GrantFiled: August 13, 2004Date of Patent: December 4, 2007Assignee: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria Cadee, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens, Frederick Eduard De Jong, Koen Goorman, Boris Menchtchikov, Marco Koert Stavenga, Martin Frans Pierre Smeets, Aschwin Lodewijk Hendricus Johannes Van Meer, Bart Leonard Peter Schoondermark, Patricius Aloysius Jacobus Tinnemans, Stoyan Nihtianov
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Patent number: 7190437Abstract: A lithographic apparatus capable of wirelessly communicating control and power signals, is presented herein. In one embodiment, the apparatus comprises an illumination system to provide a beam of radiation, a support structure configured to support a patterning device that imparts the beam of radiation with a pattern in its cross-section, a substrate holder configured to hold a substrate, a projection system to project the patterned beam radiation onto a target portion of the substrate, and a wireless signaling system configured to transmit and receive information-bearing electromagnetic radiation. The wireless system comprises at least a transmitter to transmit the electromagnetic radiation and a first transducer configured to receive and convert the electromagnetic radiation into a first electrical signal containing the information which is used to control at least a portion of the support structure, the substrate table, the projection system, and the illumination system.Type: GrantFiled: December 30, 2003Date of Patent: March 13, 2007Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Stoyan Nihtianov, Petrus Wilhelmus Josephus Maria Kemper
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Patent number: 7170583Abstract: A lithographic apparatus includes a substrate table to hold a substrate; a substrate table position measurement system to measure a position quantity of the substrate table, a projection system to project a patterned radiation beam onto a target portion of the substrate, a fluid supply system to supply an immersion fluid in a space between a downstream lens of the projection system and the substrate, and a fluid supply system position measurement system to measure a position quantity of the fluid supply system. To prevent a collision between the fluid supply system and the substrate table, a damage control system of the lithographic apparatus may include a calculator to calculate a dimensional quantity of a gap between the fluid supply system and the substrate table from the positioned quantity of the substrate table and the position quantity of the fluid supply system. The damage control system may generate a warning signal when the dimensional quantity goes beyond a predetermined safety level.Type: GrantFiled: June 29, 2005Date of Patent: January 30, 2007Assignee: ASML Netherlands B.V.Inventors: Frits Van Der Meulen, Henrikus Herman Marie Cox, Martijn Houkes, Robertus Johannes Van Vliet, Stoyan Nihtianov, Petrus Wilhelmus Josephus Maria Kemper, Roland Petrus Hendrikus Hanegraaf
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Publication number: 20070002294Abstract: A lithographic apparatus includes a substrate table to hold a substrate; a substrate table position measurement system to measure a position quantity of the substrate table, a projection system to project a patterned radiation beam onto a target portion of the substrate, a fluid supply system to supply an immersion fluid in a space between a downstream lens of the projection system and the substrate, and a fluid supply system position measurement system to measure a position quantity of the fluid supply system. To prevent a collision between the fluid supply system and the substrate table, a damage control system of the lithographic apparatus may include a calculator to calculate a dimensional quantity of a gap between the fluid supply system and the substrate table from the positioned quantity of the substrate table and the position quantity of the fluid supply system. The damage control system may generate a warning signal when the dimensional quantity goes beyond a predetermined safety level.Type: ApplicationFiled: June 29, 2005Publication date: January 4, 2007Applicant: ASML Netherlands B.V.Inventors: Frits Van Der Meulen, Henrikus Cox, Martijn Houkes, Robertus Van Vliet, Stoyan Nihtianov, Petrus Wilhelmus Kemper, Roland Hanegraaf
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Publication number: 20060285094Abstract: The present invention comprises a lithographic apparatus and device manufacturing method method that uses a patterning device that increase a number of individually controllable elements that are programmed simultaneously to increase an update rate of an array of individually controllable elements. A number of required high speed analog inputs to the array is reduced. The complexity of the array is reduced and the maximum update speed of the array is increased. Furthermore, the number of elements within an array can be readily expanded. The patterning device can be divided into a plurality of groups of cells and the lithographic apparatus can comprise a plurality of supply channels. Each supply channel can be arranged to provide a voltage signal to each cell in a respective group of cells. This can reduce the number of required inputs to the patterning device for individually addressing each cell.Type: ApplicationFiled: June 15, 2005Publication date: December 21, 2006Applicant: ASML Netherlands B.V.Inventors: Martinus Reijnen, Andrej Makarovic, Lambertus Kessels, Stoyan Nihtianov, Petrus Wilhelmus Kemper, Kamen Chilov
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Patent number: 7148494Abstract: The invention relates to a level sensor for use in a lithographic apparatus that determines a surface height of a substrate. The level sensor includes an emitter and a receiver, wherein the emitter is arranged to emit a signal directed to a predetermined position on the surface of the substrate, such that the signal is at least partially reflected by the substrate to render a reflected signal. The receiver is arranged to receive at least part of the reflected signal, and the level sensor is arranged to determine the surface height of the substrate with respect to the level sensor based on the emitted and received signal. The signal includes a pressure wave.Type: GrantFiled: December 29, 2004Date of Patent: December 12, 2006Assignee: ASML Netherlands B.V.Inventors: Anastasius Jacobus Anicetus Bruinsma, Frank Staals, Robert Jan Van Wijk, Stoyan Nihtianov