Patents by Inventor Stuart Bayes
Stuart Bayes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20100247931Abstract: Described is a method of treating an article having at its surface oxide or hydroxide moieties, as well as the resulting treated article. The method includes priming the surface of the article by contact with an alkoxysilane in an aprotic organic solvent in the presence of an acid catalyst so that the alkoxysilane reacts with the oxide or hydroxide moieties of the surface. This yields a primed surface. A polymer is then reacted with one or more amino, hydroxyl, carboxylic acid and/or acid anhydride groups on the surface to covalently couple the polymer to the primed surface via the alkoxysilane. The reaction with the polymer is not a free-radical reaction.Type: ApplicationFiled: March 5, 2010Publication date: September 30, 2010Inventors: Kadem Gayed Al-Lamee, Martyn Peter Lott, Diane Cook, Stuart Bayes
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Publication number: 20040241325Abstract: A metal, glass or ceramics article, for example a stent, having at its surface oxide or hydroxide is treated to enhance the biocompatibility and/or physical characteristics of the surface. The surface is de-greased and primed by contact with an alkoxysilane in a aprotic organic solvent in the presence of an acid catalyst so that the alkoxysilane molecules react with the oxide or hydroxide of said surface to form covalent bonds, the alkoxysilane further comprising one or more amino, hydroxyl, carboxylic acid or acid anhydride groups. A polymer, e.g. carbodymethyl cellulose, is then covalently coupled to said surface via said amino, hydroxyl, carboxylic acid or acid anhydride groups, after which biologically active materials may be coupled to the polymer. Such materials may include an anti-coagulating agent or anti-platelet agent and an agent that inhibits smooth cell proliferation and restenosis.Type: ApplicationFiled: March 17, 2004Publication date: December 2, 2004Inventors: Kadem Gayed Al-Lamee, Martyn Peter Lott, Diane Cook, Stuart Bayes
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Patent number: 6777164Abstract: The invention provides a lithographic printing for precursor having an imagable coating on an aluminum support, wherein the imagable coating comprises a polymeric substance comprising colorant groups, and wherein the aluminum support on which the coating is provided is anodized but not subsequently modified by means of a post-anodic treatment compound, and the coating does not comprise a colorant dye. The polymeric substance may also comprise pendent infra-red or developer dissolution inhibiting groups, and these groups may also be the colorant groups themselves.Type: GrantFiled: April 6, 2001Date of Patent: August 17, 2004Assignee: Kodak Polychrome Graphics LLCInventors: Geoffrey Horne, Kevin Barry Ray, Alan Stanley Victor Monk, Stuart Bayes
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Patent number: 6558869Abstract: This invention is directed to a precursor for preparing a resist pattern by heat mode imaging, the precursor comprising a heat sensitive composition, the solubility of which in an aqueous alkaline developer is arranged to increase in heated areas, and a means for increasing the resistance of non-heated areas of the heat sensitive composition to dissolution in an aqueous alkaline developer (the “developer resistance means”), wherein said developer resistance means comprises one or more compounds selected from the group consisting of: (A) compounds which include a poly(alkylene oxide) unit; (B) siloxanes; and (C) esters, ethers and amides of polyhydric alcohols, wherein said heat-sensitive composition comprises an aqueous alkaline developer soluble polymeric substance (i.e. the “active polymer”) and a compound which reduces the aqueous alkaline developer solubility of the polymeric substance (i.e.Type: GrantFiled: April 25, 2000Date of Patent: May 6, 2003Assignee: Kodak Polychrome Graphics LLCInventors: Christopher David McCullough, Kevin Barry Ray, Alan Stanley Monk, John David Riches, Anthony Paul Kitson, Gareth Rhodri Parsons, David Stephen Riley, Peter Andrew Reath Bennett, Richard David Hoare, James Laurence Mulligan, John Andrew Hearson, Carole-Anne Smith, Stuart Bayes, Mark John Spowage
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Patent number: 6551763Abstract: A composition used as a resist in the manufacture of electronic parts, for example printed circuits, and which is rendered soluble in a developer by pattemwise delivery of heat, comprises a polymer and optionally an infrared absorbing compound. However in contrast to conventional compositions no compound is present which alters the solubility of the polymer in an aqueous developer.Type: GrantFiled: June 2, 2000Date of Patent: April 22, 2003Assignee: Kodak Polychrome Graphics LLCInventors: Anthony Paul Kitson, Peter Andrew Reath Bennett, Christopher David McCullough, Stuart Bayes, Kevin Barry Ray
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Patent number: 6537735Abstract: The invention is directed to a method for producing a predetermined resist pattern on a substrate. The method includes the patternwise application of infrared radiation to a precursor which contains the substrate, having a coating thereon, wherein the coating contains a positive working composition; and the development of the pattern using a developer. The composition contains a polymeric substance having functional groups Q thereon, such that the functionalized polymeric substance has the property that it is developer insoluble prior to delivery of infrared radiation and developer soluble thereafter.Type: GrantFiled: January 5, 2000Date of Patent: March 25, 2003Assignee: Kodak Polychrome Graphics LLCInventors: Christopher David McCullough, Kevin Barry Ray, Alan Stanley Victor Monk, Stuart Bayes, Mark John Spowage
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Publication number: 20020172874Abstract: The invention provides a lithographic printing for precursor having an imagable coating on an aluminum support, wherein the imagable coating comprises a polymeric substance comprising colorant groups, and wherein the aluminum support on which the coating is provided is anodized but not subsequently modified by means of a post-anodic treatment compound, and the coating does not comprise a colorant dye. The polymeric substance may also comprise pendent infra-red or developer dissolution inhibiting groups, and these groups may also be the colorant groups themselves.Type: ApplicationFiled: April 6, 2001Publication date: November 21, 2002Applicant: KODAK POLYCHROME GRAPHICS LLCInventors: Geoffrey Horne, Kevin Barry Ray, Alan Stanley Victor Monk, Stuart Bayes
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Patent number: 6303271Abstract: A method for preparing a printing form and a method of printing are disclosed. A coating of a radiation sensitive ink on a lithographic support having a hydrophilic surface is imaged. The unexposed areas of the coating are removed to produce a printing form, which is used for printing. Preferably, the same radiation sensitive ink is used for printing as is used in the coating, and, preferably, the desired printing run length is predetermined and the thickness of the coating determined according to the desired run length.Type: GrantFiled: June 29, 1999Date of Patent: October 16, 2001Assignee: Kodak Polychrome Graphics LLCInventors: Peter A. R. Bennett, Carole-Anne Smith, Stuart Bayes, David S. Riley
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Patent number: 6218083Abstract: A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask comprises the imagewise exposure of a radiation sensitive diazide-containing coating (conventionally considered as a UV sensitive material), to non-UV radiation, such as direct heat radiation or infra-red radiation. A positive of the exposed image is revealed on development. Additionally, it has been found that a flood exposure to UV radiation after the imagewise exposure to the non-UV radiation means that a negative of the exposed image is revealed, on development.Type: GrantFiled: March 5, 1999Date of Patent: April 17, 2001Assignee: Kodak Plychrome Graphics, LLCInventors: Christopher D. McCullough, Kevin B. Ray, Alan S. Monk, Stuart Bayes, Anthony P. Kitson
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Patent number: 6077645Abstract: There is described a water-less lithographic plate precursor which comprises on an aluminium plate a light-sensitive composition which comprises a polymer with hydroxy functional groups, an acid generator which when light exposed yields an acid together with a silyl ether of general formula (I), where Rf is a fluoroaliphatic group having 3 to 10 carbon atoms, Y is oxygen, SO.sub.2, carbonyl or a direct link, X is N R.sub.4 where R.sub.4 is hydrogen or lower alkyl having up to six carbon atoms or is a direct link, each of R.sub.1, R.sub.2 and R.sub.3 are lower alkyl groups having up to six carbon atoms and R.sub.5 is a lower alkyl group having up to six carbon atoms.Type: GrantFiled: January 26, 1999Date of Patent: June 20, 2000Assignee: Kodak Polychrome Graphics LLCInventors: Peter Andrew Reath Bennett, Carole-Anne Smith, Stuart Bayes