Patents by Inventor Stuart Bayes

Stuart Bayes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100247931
    Abstract: Described is a method of treating an article having at its surface oxide or hydroxide moieties, as well as the resulting treated article. The method includes priming the surface of the article by contact with an alkoxysilane in an aprotic organic solvent in the presence of an acid catalyst so that the alkoxysilane reacts with the oxide or hydroxide moieties of the surface. This yields a primed surface. A polymer is then reacted with one or more amino, hydroxyl, carboxylic acid and/or acid anhydride groups on the surface to covalently couple the polymer to the primed surface via the alkoxysilane. The reaction with the polymer is not a free-radical reaction.
    Type: Application
    Filed: March 5, 2010
    Publication date: September 30, 2010
    Inventors: Kadem Gayed Al-Lamee, Martyn Peter Lott, Diane Cook, Stuart Bayes
  • Publication number: 20040241325
    Abstract: A metal, glass or ceramics article, for example a stent, having at its surface oxide or hydroxide is treated to enhance the biocompatibility and/or physical characteristics of the surface. The surface is de-greased and primed by contact with an alkoxysilane in a aprotic organic solvent in the presence of an acid catalyst so that the alkoxysilane molecules react with the oxide or hydroxide of said surface to form covalent bonds, the alkoxysilane further comprising one or more amino, hydroxyl, carboxylic acid or acid anhydride groups. A polymer, e.g. carbodymethyl cellulose, is then covalently coupled to said surface via said amino, hydroxyl, carboxylic acid or acid anhydride groups, after which biologically active materials may be coupled to the polymer. Such materials may include an anti-coagulating agent or anti-platelet agent and an agent that inhibits smooth cell proliferation and restenosis.
    Type: Application
    Filed: March 17, 2004
    Publication date: December 2, 2004
    Inventors: Kadem Gayed Al-Lamee, Martyn Peter Lott, Diane Cook, Stuart Bayes
  • Patent number: 6777164
    Abstract: The invention provides a lithographic printing for precursor having an imagable coating on an aluminum support, wherein the imagable coating comprises a polymeric substance comprising colorant groups, and wherein the aluminum support on which the coating is provided is anodized but not subsequently modified by means of a post-anodic treatment compound, and the coating does not comprise a colorant dye. The polymeric substance may also comprise pendent infra-red or developer dissolution inhibiting groups, and these groups may also be the colorant groups themselves.
    Type: Grant
    Filed: April 6, 2001
    Date of Patent: August 17, 2004
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Geoffrey Horne, Kevin Barry Ray, Alan Stanley Victor Monk, Stuart Bayes
  • Patent number: 6558869
    Abstract: This invention is directed to a precursor for preparing a resist pattern by heat mode imaging, the precursor comprising a heat sensitive composition, the solubility of which in an aqueous alkaline developer is arranged to increase in heated areas, and a means for increasing the resistance of non-heated areas of the heat sensitive composition to dissolution in an aqueous alkaline developer (the “developer resistance means”), wherein said developer resistance means comprises one or more compounds selected from the group consisting of: (A) compounds which include a poly(alkylene oxide) unit; (B) siloxanes; and (C) esters, ethers and amides of polyhydric alcohols, wherein said heat-sensitive composition comprises an aqueous alkaline developer soluble polymeric substance (i.e. the “active polymer”) and a compound which reduces the aqueous alkaline developer solubility of the polymeric substance (i.e.
    Type: Grant
    Filed: April 25, 2000
    Date of Patent: May 6, 2003
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Christopher David McCullough, Kevin Barry Ray, Alan Stanley Monk, John David Riches, Anthony Paul Kitson, Gareth Rhodri Parsons, David Stephen Riley, Peter Andrew Reath Bennett, Richard David Hoare, James Laurence Mulligan, John Andrew Hearson, Carole-Anne Smith, Stuart Bayes, Mark John Spowage
  • Patent number: 6551763
    Abstract: A composition used as a resist in the manufacture of electronic parts, for example printed circuits, and which is rendered soluble in a developer by pattemwise delivery of heat, comprises a polymer and optionally an infrared absorbing compound. However in contrast to conventional compositions no compound is present which alters the solubility of the polymer in an aqueous developer.
    Type: Grant
    Filed: June 2, 2000
    Date of Patent: April 22, 2003
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Anthony Paul Kitson, Peter Andrew Reath Bennett, Christopher David McCullough, Stuart Bayes, Kevin Barry Ray
  • Patent number: 6537735
    Abstract: The invention is directed to a method for producing a predetermined resist pattern on a substrate. The method includes the patternwise application of infrared radiation to a precursor which contains the substrate, having a coating thereon, wherein the coating contains a positive working composition; and the development of the pattern using a developer. The composition contains a polymeric substance having functional groups Q thereon, such that the functionalized polymeric substance has the property that it is developer insoluble prior to delivery of infrared radiation and developer soluble thereafter.
    Type: Grant
    Filed: January 5, 2000
    Date of Patent: March 25, 2003
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Christopher David McCullough, Kevin Barry Ray, Alan Stanley Victor Monk, Stuart Bayes, Mark John Spowage
  • Publication number: 20020172874
    Abstract: The invention provides a lithographic printing for precursor having an imagable coating on an aluminum support, wherein the imagable coating comprises a polymeric substance comprising colorant groups, and wherein the aluminum support on which the coating is provided is anodized but not subsequently modified by means of a post-anodic treatment compound, and the coating does not comprise a colorant dye. The polymeric substance may also comprise pendent infra-red or developer dissolution inhibiting groups, and these groups may also be the colorant groups themselves.
    Type: Application
    Filed: April 6, 2001
    Publication date: November 21, 2002
    Applicant: KODAK POLYCHROME GRAPHICS LLC
    Inventors: Geoffrey Horne, Kevin Barry Ray, Alan Stanley Victor Monk, Stuart Bayes
  • Patent number: 6303271
    Abstract: A method for preparing a printing form and a method of printing are disclosed. A coating of a radiation sensitive ink on a lithographic support having a hydrophilic surface is imaged. The unexposed areas of the coating are removed to produce a printing form, which is used for printing. Preferably, the same radiation sensitive ink is used for printing as is used in the coating, and, preferably, the desired printing run length is predetermined and the thickness of the coating determined according to the desired run length.
    Type: Grant
    Filed: June 29, 1999
    Date of Patent: October 16, 2001
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Peter A. R. Bennett, Carole-Anne Smith, Stuart Bayes, David S. Riley
  • Patent number: 6218083
    Abstract: A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask comprises the imagewise exposure of a radiation sensitive diazide-containing coating (conventionally considered as a UV sensitive material), to non-UV radiation, such as direct heat radiation or infra-red radiation. A positive of the exposed image is revealed on development. Additionally, it has been found that a flood exposure to UV radiation after the imagewise exposure to the non-UV radiation means that a negative of the exposed image is revealed, on development.
    Type: Grant
    Filed: March 5, 1999
    Date of Patent: April 17, 2001
    Assignee: Kodak Plychrome Graphics, LLC
    Inventors: Christopher D. McCullough, Kevin B. Ray, Alan S. Monk, Stuart Bayes, Anthony P. Kitson
  • Patent number: 6077645
    Abstract: There is described a water-less lithographic plate precursor which comprises on an aluminium plate a light-sensitive composition which comprises a polymer with hydroxy functional groups, an acid generator which when light exposed yields an acid together with a silyl ether of general formula (I), where Rf is a fluoroaliphatic group having 3 to 10 carbon atoms, Y is oxygen, SO.sub.2, carbonyl or a direct link, X is N R.sub.4 where R.sub.4 is hydrogen or lower alkyl having up to six carbon atoms or is a direct link, each of R.sub.1, R.sub.2 and R.sub.3 are lower alkyl groups having up to six carbon atoms and R.sub.5 is a lower alkyl group having up to six carbon atoms.
    Type: Grant
    Filed: January 26, 1999
    Date of Patent: June 20, 2000
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Peter Andrew Reath Bennett, Carole-Anne Smith, Stuart Bayes