Abstract: The present invention is directed to a lithium ion battery electrode slurry composition comprising: (a) an electrochemically active material capable of lithium intercalation and deintercalation; (b) a binder dispersed in an aqueous or organic medium and comprising a reaction product of a reaction mixture comprising one or more epoxy functional polymer(s) and one or more acid functional acrylic polymer(s); and (c) an electrically conductive agent. The present invention also provides an electrode comprising: (a) an electrical current collector; and (b) a cured film formed on the electrical current collector. The cured film is deposited from the slurry composition described above. Electrical storage devices prepared from the electrode are also provided.

Abstract: The present invention is directed to a lithium ion battery electrode slurry composition comprising: (a) an electrochemically active material capable of lithium intercalation and deintercalation; (b) a binder dispersed in an aqueous or organic medium and comprising a reaction product of a reaction mixture comprising one or more epoxy functional polymer(s) and one or more acid functional acrylic polymer(s); and (c) an electrically conductive agent. The present invention also provides an electrode comprising: (a) an electrical current collector; and (b) a cured film formed on the electrical current collector. The cured film is deposited from the slurry composition described above. Electrical storage devices prepared from the electrode are also provided.

Abstract: In some embodiments, the present invention provide filtration media for the treatment of flue gas streams and methods of making and using the same. In one embodiment, a filtration medium comprises a pollutant absorbent layer comprising a plurality of activated carbon fibers, at least one woven fabric, and at least one non-woven fabric, wherein the pollutant absorbent layer is positioned between the at least one woven fabric and the at least one non-woven fabric.

Abstract: In some embodiments, the present invention provide filtration media for the treatment of flue gas streams and methods of making and using the same. In one embodiment, a filtration medium comprises a pollutant absorbent layer comprising a plurality of activated carbon fibers, at least one woven fabric, and at least one non-woven fabric, wherein the pollutant absorbent layer is positioned between the at least one woven fabric and the at least one non-woven fabric.

Abstract: This invention is directed to a slurry system and process of metal removal from a substrate. This invention is useful for polishing a microelectronic device. This invention is especially useful for chemical mechanical planarization of a semiconductor wafer for removal of an overburden thereof. The slurry system of the present invention includes a first slurry and a second slurry, wherein the first slurry has a higher abrasive concentration than the second slurry. The process of the present invention includes a first polish with the first slurry to partially remove metal from the substrate, and a second polish with the second slurry to further remove metal from the substrate.

Abstract: A method of CMP of a substrate surface includes providing a polishing pad having a polishing layer, that may be substantially free of abrasive particles, with a functional group chemically bonded (covalent or ionic) to the polishing layer. The functional group acts as an activator or catalyst for a compound of a polishing slurry to exhibit a higher material removal rate for removing selected portions of the surface of the substrate than exhibited in CMP of a substantially identical substrate in the presence of a substantially identical polishing slurry and a polishing pad wherein the substantially identical polishing layer does not have the functional group. The functional group may be derived from a compound comprising a polyamine, a polyelectrolyte, and/or an amino acid. A method of making the CMP pad and the CMP pad formed thereby is also disclosed.

Abstract: A method of CMP of a substrate surface includes providing a polishing pad having a polishing layer, that may be substantially free of abrasive particles, with a functional group chemically bonded (covalent or ionic) to the polishing layer. The functional group acts as an activator or catalyst for a compound of a polishing slurry to exhibit a higher material removal rate for removing selected portions of the surface of the substrate than exhibited in CMP of a substantially identical substrate in the presence of a substantially identical polishing slurry and a polishing pad wherein the substantially identical polishing layer does not have the functional group. The functional group may be derived from a compound comprising a polyamine, a polyelectrolyte, and/or an amino acid. A method of making the CMP pad and the CMP pad formed thereby is also disclosed.

Abstract: Described are hydrophobic particulate inorganic oxides useful for reinforcing polymeric composition, e.g., rubber. The materials are characterized by: (a) the substantial absence of functional groups capable of chemical reaction with rubber; (b) a BET surface area of in the range of from 40 to 350 m2/g; (c) a hydroxyl content in the range of 2 to 15 OH/nm2; (d) a carbon content in the range of from 0.1 to 6 percent by weight that is substantially non-extractable; (e) a pH in the range of from 3 to 10; (f) an M1 Standard White Area less than 0.4 percent and (g) a methanol wettability of from 15 to 45 percent. Compositions such as polymers, cured organic rubber articles, master batches and slurries containing the hydrophobic fillers are also described.