Abstract: A method for forming an active material containing coating on a substrate, which method comprises the steps of: i) introducing one or more gaseous or atomised liquid and/or solid coating-forming materials which undergo chemical bond forming reactions within a plasma environment and one or more active materials which substantially do not undergo chemical bond forming reactions within a plasma environment, into an atmospheric or low pressure non-thermal equilibrium plasma discharge and/or an excited gas stream resulting therefrom, and ii) exposing the substrate to the resulting mixture of atomised coating-forming and at least one active material which are deposited onto the substrate surface to form a coating; wherein the substrate is not a wipe, cloth or sponge for household care or depilatory care or a water solute household cleaning unit dose product.