Patents by Inventor Stuart Rounds

Stuart Rounds has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of photoresist ash residue removal
    Patent number: 6734120
    Abstract: A method of enabling the removal of fluorine containing residue from a semiconductor substrate comprising applying a gas and/or vapor to which the residue is reactive to the residue while the temperature of the substrate is at an elevated level with respect to ambient temperature and the residue is exposed to ultraviolet radiation, for a time period which is sufficient to effect at least one of volatilizing the residue or rendering the residue hydrophilic enough to be removable with deionized water.
    Type: Grant
    Filed: February 17, 2000
    Date of Patent: May 11, 2004
    Assignee: Axcelis Technologies, Inc.
    Inventors: Ivan Berry, Stuart Rounds, John Hallock, Michael Owens, Mahmoud Dahimene
  • Method of stripping photoresist using re-coating material
    Patent number: 6406836
    Abstract: A method of stripping a photoresist layer comprising applying a re-coating material on the photoresist layer which extends through and fills openings in a first layer on which the photoresist layer is disposed, ashing the stack comprised of the photoresist layer and the re-coating material, and removing such re-coating material as remains in the openings in the first layer after the ashing.
    Type: Grant
    Filed: March 21, 2000
    Date of Patent: June 18, 2002
    Assignee: Axcelis Technologies, Inc.
    Inventors: Robert Mohondro, Qingyuan Han, Ivan Berry, Mahmoud Dahimene, Stuart Rounds