Patents by Inventor Su-Fu Lee

Su-Fu Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9012332
    Abstract: Disclosed are a test piece and the manufacturing method thereof The test piece includes an insulating substrate and a circuit pattern structure formed on the insulating substrate, wherein circuit pattern structure includes a first metal pattern layer, a second metal pattern layer, a third metal pattern layer, a fourth metal pattern layer, and a fifth metal pattern layer. The first metal pattern layer, the second metal pattern layer, the third metal pattern layer, the fourth metal pattern layer, and the fifth metal pattern layer have same pattern shapes and positions thereof are overlapping in a plane. The first metal pattern layer and the second metal pattern layer are nano-metal films formed by vacuum coating, therefore, the test piece has excellent uniformity of film and low resistance to provide a stable test current to prevent the judging mistakes and to improve the test efficiency.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: April 21, 2015
    Inventors: Hui-Ping Chiang, Su-Fu Lee, Hsiu-Ying Hsu
  • Publication number: 20130240255
    Abstract: Disclosed are a test piece and the manufacturing method thereof The test piece includes an insulating substrate and a circuit pattern structure formed on the insulating substrate, wherein circuit pattern structure includes a first metal pattern layer, a second metal pattern layer, a third metal pattern layer, a fourth metal pattern layer, and a fifth metal pattern layer. The first metal pattern layer, the second metal pattern layer, the third metal pattern layer, the fourth metal pattern layer, and the fifth metal pattern layer have same pattern shapes and positions thereof are overlapping in a plane. The first metal pattern layer and the second metal pattern layer are nano-metal films formed by vacuum coating, therefore, the test piece has excellent uniformity of film and low resistance to provide a stable test current to prevent the judging mistakes and to improve the test efficiency.
    Type: Application
    Filed: March 14, 2013
    Publication date: September 19, 2013
    Inventors: Hui-Ping Chiang, Su-Fu Lee, Hsiu-Ying Hsu