Patents by Inventor Su Hyong Yun

Su Hyong Yun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8663736
    Abstract: Provided is a germanium complex represented by Chemical Formula 1 wherein Y1 and Y2 are independently selected from R3, NR4R5 or OR6, and R1 through R6 independently represent (Ci-C7) alkyl. The provided germanium complex with an amidine derivative ligand is thermally stable, is highly volatile, and does not include halogen components. Therefore, it may be usefully used as a precursor to produce high-quality germanium thin film or germanium-containing compound thin film by metal organic chemical vapor deposition (MOCVD) or atomic layer deposition (ALD).
    Type: Grant
    Filed: January 7, 2010
    Date of Patent: March 4, 2014
    Assignee: Soulbrain Sigma-Aldrich Ltd.
    Inventors: Jae Sun Jung, Su Hyong Yun, Minchan Kim, Sung Won Han, Yong Joo Park, Su Jung Shin, Ki Whan Sung, Sang Kyung Lee
  • Publication number: 20110268881
    Abstract: Provided is a germanium complex represented by Chemical Formula 1 wherein Y1 and Y2 are independently selected from R3, NR4R5 or OR6, and R1 through R6 independently represent (Ci-C7) alkyl. The provided germanium complex with an amidine derivative ligand is thermally stable, is highly volatile, and does not include halogen components. Therefore, it may be usefully used as a precursor to produce high-quality germanium thin film or germanium-containing compound thin film by metal organic chemical vapor deposition (MOCVD) or atomic layer deposition (ALD).
    Type: Application
    Filed: January 7, 2010
    Publication date: November 3, 2011
    Applicant: TECHNO SEMICHEM CO., LTD.
    Inventors: Jae Sun Jung, Su Hyong Yun, Minchan Kim, Sung Won Han, Yong Joo Park, Su Jung Shin, Ki Whan Sung, Sang Kyung Lee