Abstract: An apparatus for holding a cable for an electric vehicle charger includes a cable holding unit configured to restrict a charging cable extended and connected to a charging coupler, and to ascend or descend to predetermined positions, a housing unit mounted in a manner that is rotatable along a leftward-rightward direction, the cable holding unit being accommodated inside the housing unit, a driving unit configured to provide drive power for enabling the cable holding unit to ascend and descend and drive power for rotating the housing unit, and a control unit configured to control the driving unit in such a manner that the cabling holding unit and the housing unit are selectively driven when the charging coupler is removed from an electric vehicle charger or rests thereon.

Abstract: The present invention provides a method and apparatus for cleaning parts used in substrate processing. In a method for cleaning parts of a substrate processing, plasma generated from cleaning gas is supplied together with a cooling medium to clean the parts, but the cooling medium may be provided at a lower temperature than the plasma.

Abstract: A electric vehicle cable mounting system includes a driving unit including a rotary disc and allowing a charging cable to be released from a side in accordance with a rotation motion of a rotary disc, a guide unit provided behind the driving unit and allowing the driving unit to move in a vertical direction in accordance with a rotation motion of the rotary disc, and a controller controlling the driving unit and the guide unit such that the charging cable is automatically released in an electric vehicle charge mode and is automatically returned in an electric vehicle charge standby mode.

Abstract: The present disclosure relates to an organic electroluminescent compound and an organic electroluminescent device comprising the same. By comprising the compound according to the present disclosure, it is possible to produce an organic electroluminescent device having improved driving voltage, power efficiency, and/or lifetime properties compared to the conventional organic electroluminescent devices.

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing having a treating space for treating a substrate; a support unit positioned at the treating space; and a plasma source for generating a plasma by exciting a gas supplied to the treating space, and wherein the support unit includes: a first plate at which the substrate is positioned at a top side; a second plate which is positioned at a bottom side of the first plate; and an adhesive layer for adhering the first plate and the second plate to each other, and wherein a top surface of the second plate is divided into a central region including a center of the top surface and an edge region surrounding the central region, and a height of the adhesive layer filled between a bottom surface of the first plate and the top surface of the second plate is substantially different at the central region and at the edge region.

Abstract: A substrate support device according to one aspect of the present invention includes a seating plate part on which a substrate is seated, a shaft part coupled to a lower portion of the seating plate part to support the seating plate part, and a gap flange part coupled to the shaft part or the seating plate part to define a thermal insulation gap between the shaft part and the gap flange part and between the seating plate part and the gap flange part, the gap flange part including a gas inlet port and a gas outlet port so that cooling gas circulates in the thermal insulation gap.

Abstract: An apparatus and a method for non-destructive inspection of quality of an electrostatic chuck are disclosed. The apparatus includes a measurement unit for measuring a first capacitance of a dielectric layer of the electrostatic chuck and for measuring a second capacitance of an electrode installed in the dielectric layer; and a control unit configured to evaluate quality of the electrode, based on the first capacitance and the second capacitance.

Abstract: Disclosed is a method of treating the surface of a quartz member. The method can remove a masking material generated by a chemical reaction between the quartz member and an etching solution, thereby completely removing scratches on the surface of the quartz member without interrupting the treatment process unlike existing technologies. The method also embosses the surface of the quartz member, thereby increasing the frictional resistance and surface roughness of the surface of the quartz member depending on the shape or density of protrusions on the surface. In addition, the method prevents deposits on the surface of the quartz member from peeling off.

Abstract: The present invention relates to a pharmaceutical composition for preventing, treating or alleviating cancer, containing a PLK1 inhibitor as an active ingredient, and a compound according to the present invention selectively binds to PBD of PLK1, thereby having advantages of high selectivity and binding affinity for PLK1 and low toxicity. Therefore, a PLK inhibitor compound according to the present invention can be effectively used as an anticancer agent by inhibiting the growth of various cancer cells, and can be expected to exhibit synergistic effects with existing developed anticancer agents through co-administration, in addition to individual administration thereof.

Abstract: The present invention relates to a method of screening for a cancer therapeutic agent using Cyclin B1, Cyclin-dependent kinase 1 (CDK1), and retinoic acid receptor responder 1 (RARRES1), and a composition for diagnosing cancer or predicting a prognosis using the same. As a result of having conducted intensive studies to discover molecular mechanisms for diagnosing cancer and predicting a prognosis, the inventors of the present invention confirmed that in cancer-derived samples, according to the degree of mutual binding between RARRES1 and CDK1 or Cyclin B1, the mitosis of cancer cells was arrested, the formation of CDK1-Cyclin B1 complexes was suppressed, and the degradation of these proteins was promoted, and thus RARRES1 was a crucial factor in the diagnosis of cancer, prognosis prediction, and the treatment of cancer.

Abstract: An apparatus for recovering a quartz part includes a processing tank for providing a space accommodating a hydrofluoric acid aqueous solution such that a quartz part to be processed may be immersed, a liquid supply line supplying the hydrofluoric acid aqueous solution to the processing tank, and a heater heating the hydrofluoric acid aqueous solution in the processing tank.

Abstract: A support unit includes a first plate on which a substrate is seated, a second plate located under the first plate, a third plate located under the second plate, a ground electrode disposed between the first plate and the second plate, and a heater electrode disposed between the second plate and the third plate. The first plate includes a first dielectric plate, a conductive plate disposed under the first dielectric plate, and a second dielectric plate disposed under the conductive plate.

Abstract: The present invention provides a method and apparatus for cleaning parts used in substrate processing. In a method for cleaning parts of a substrate processing, plasma generated from cleaning gas is supplied together with a cooling medium to clean the parts, but the cooling medium may be provided at a lower temperature than the plasma.

Abstract: Disclosed is a method of treating the surface of a quartz member. The method can remove a masking material generated by a chemical reaction between the quartz member and an etching solution, thereby completely removing scratches on the surface of the quartz member without interrupting the treatment process unlike existing technologies. The method also embosses the surface of the quartz member, thereby increasing the frictional resistance and surface roughness of the surface of the quartz member depending on the shape or density of protrusions on the surface. In addition, the method prevents deposits on the surface of the quartz member from peeling off.

Abstract: Provide are a substrate treating apparatus and a substrate treating method. The substrate treating apparatus comprises a chamber, a substrate supporting member which is positioned in the chamber to support the substrate, a spray member which supplies a rinse liquid to the substrate, a depressurizing line which is used to depressurize the chamber, and a controller which vaporizes the rinse liquid by depressurizing the chamber through the depressurizing line after supplying the rinse liquid in a liquid phase.

Abstract: Thinning agent supplying systems for use with spin-coating machines are disclosed. An example supplying system enables the stable supply of thinning agent for cleaning a wafer. The example system includes an input terminal; first and second tanks for receiving the thinning agent from the input terminal; first and second valves for controlling discharge of the thinning agent from the first and second tanks; a pressure-exerting unit for applying pressurized gas to discharge the thinning agent from the first and/or second tanks; and a de-gas unit for removing bubbles from the thinning agent discharged from the first and/or second tanks.

Abstract: Thinning agent supplying systems for use with spin-coating machines are disclosed. An example supplying system enables the stable supply of thinning agent for cleaning a wafer. The example system includes an input terminal; first and second tanks for receiving the thinning agent from the input terminal; first and second valves for controlling discharge of the thinning agent from the first and second tanks; a pressure-exerting unit for applying pressurized gas to discharge the thinning agent from the first and/or second tanks; and a de-gas unit for removing bubbles from the thinning agent discharged from the first and/or second tanks.