Patents by Inventor Su-Jin Lee

Su-Jin Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Developer composition, for EUV light source, for forming photosensitive photoresist micropattern
    Patent number: 11199779
    Abstract: A photoresist developer composition for an EUV (extreme ultraviolet) light source in a semiconductor-manufacturing process is proposed. Further, the photoresist developer composition for an EUV light source for forming a micropattern and a lithography process of forming a pattern on a semiconductor substrate using an EUV light source using the composition are proposed. The composition includes an aqueous solution containing 2 to 10 wt % of tetraethylammonium hydroxide (TEAH). When a photoresist is developed, an Eop is reduced, which shortens a process time, prevents a pattern from collapsing, and enables a pattern to have a uniform profile.
    Type: Grant
    Filed: January 9, 2019
    Date of Patent: December 14, 2021
    Assignee: YOUNG CHANG CHEMICAL CO., LTD
    Inventors: Su Jin Lee, Gi Hong Kim, Seung Hun Lee
  • Method and composition for improving LWR in patterning step using negative tone photoresist
    Patent number: 11187985
    Abstract: The present invention relates to a method of reducing the LWR (Line Width Roughness) of a photoresist pattern using a negative tone photoresist during the fabrication of a semiconductor, and more specifically to a composition capable of reducing LWR in order to ensure a higher pattern CDU after a negative tone development process, and a processing method using the composition, thus reducing the LWR, thereby providing better CDU than existing methods.
    Type: Grant
    Filed: April 26, 2017
    Date of Patent: November 30, 2021
    Assignee: YOUNG CHANG CHEMICAL CO., LTD
    Inventors: Su Jin Lee, Gi Hong Kim, Seung Hun Lee, Seung Hyun Lee
  • Display device
    Patent number: 11183112
    Abstract: A display device includes a substrate including a first pixel region and a second pixel region having a smaller area than the first pixel region. The second pixel region is connected to the first pixel region. A first pixel is provided in the first pixel region and a second pixel is provided in the second pixel region. A first line is connected to the first pixel and a second line is connected to the second pixel. A dummy unit overlaps at least one of the first line and the second line, and compensates for a difference in load values between the first and second lines.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: November 23, 2021
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Yang Wan Kim, Sun Ja Kwon, Byung Sun Kim, Hyun Ae Park, Su Jin Lee, Jae Yong Lee
  • Liquid crystal display
    Patent number: 11175545
    Abstract: A liquid crystal display according to an exemplary embodiment of the present disclosure includes: a gate line, a data line, and a compensation voltage line disposed on an insulation substrate; a first passivation layer disposed on the gate line, the data line, and the compensation voltage line; a pixel electrode connected to the gate line and the data line, and a compensation electrode connected to the compensation voltage line, disposed on the first passivation layer; and a common electrode formed on the first passivation layer, wherein the compensation electrode overlaps at least a portion of the data line, and the compensation voltage line is formed with the same layer as the data line.
    Type: Grant
    Filed: December 9, 2014
    Date of Patent: November 16, 2021
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Sung Man Kim, Jun Ho Song, Tong Young Kim, Su Jin Lee, Yeon-Mun Jeon, Young Je Cho
  • Accident monitoring system using UWB-based real-time positioning
    Patent number: 11173607
    Abstract: An accident monitoring system based on UWB-based real-time positioning comprises a UWB tag, a plurality of UWB anchors installed around a processing line and receiving the worker's position from the UWB tag and sensing predetermined information for the processing line, an AP receiving the worker's position and the predetermined information for from the plurality of UWB anchors, a server receiving the worker's position and the predetermined information for from the AP, storing the worker's position and the predetermined information for, and determining whether the worker is in a preset access-limited area, and a programmable logic control (PLC) box, upon receiving proximity information indicating that the worker is the access-limited area from the server through the AP, controlling to stop the industrial robot, the conveyor belt, and the motor in the processing line.
    Type: Grant
    Filed: November 14, 2019
    Date of Patent: November 16, 2021
    Inventors: Jin Yong Lee, Young Kuk Kwon, Jeong Hun Lee, Young Kwang Kim, Myoung Hoon Choi, Su Jin Lee
  • EUV developer composition for forming photosensitive photoresist micropattern
    Patent number: 11169442
    Abstract: An extreme ultraviolet (EUV) developer composition for use in manufacturing a semiconductor is provided. More particularly an EUV developer composition for forming a fine pattern is provided, which is capable of forming a more uniform pattern and lowering EOP in a development process, the EUV developer composition including a water-soluble polymer represented by Chemical Formula 1, a nonionic surfactant represented by Chemical Formula 2, and an alkali compound.
    Type: Grant
    Filed: March 22, 2018
    Date of Patent: November 9, 2021
    Assignee: YOUNG CHANG CHEMICAL CO., LTD
    Inventors: Su Jin Lee, Gi Hong Kim, Seung Hun Lee, Seung Hyun Lee
  • Method and composition for improving LWR in patterning step using negative tone photoresist
    Patent number: 11169444
    Abstract: The present invention relates to a method of reducing the LWR (Line Width Roughness) of a photoresist pattern using a negative tone photoresist during the fabrication of a semiconductor, and more specifically to a composition capable of reducing LWR in order to ensure a higher pattern CDU after a negative tone development process, and a processing method using the composition, thus reducing the LWR, thereby providing better CDU than existing methods.
    Type: Grant
    Filed: April 26, 2017
    Date of Patent: November 9, 2021
    Assignee: YOUNG CHANG CHEMICAL CO., LTD
    Inventors: Su Jin Lee, Gi Hong Kim, Seung Hun Lee, Seung Hyun Lee
  • Display device
    Patent number: 11164497
    Abstract: A display device is provided. The display device comprises a display panel including a plurality of signal pads and one or more dummy pads, and at least one flexible wiring board providing signals to the signal pads, wherein a maximum bias period of signals provided to a pair of adjacent signal pads with at least one dummy pad interposed therebetween is longer than a maximum bias period of signals provided to a pair of adjacent signal pads with no dummy pad disposed therebetween.
    Type: Grant
    Filed: June 10, 2020
    Date of Patent: November 2, 2021
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Tae Hoon Kwon, Ji Hyun Ka, Byung Sun Kim, Yang Wan Kim, Hyung Jun Park, Su Jin Lee, Jae Yong Lee, Jin Tae Jeong, Seung Ji Cha
  • ORGANIC-INORGANIC HYBRID PHOTORESIST PROCESSING LIQUID COMPOSITION
    Publication number: 20210333709
    Abstract: Proposed are an organic-inorganic hybrid photoresist processing solution composition for use in a thin film formation process, a development process, and a stripping process of an organic-inorganic hybrid photoresist, and a processing method using the same. The processing solution composition includes a compound of Chemical Formula 1 and a ketone, an ester, an ether, an additive or a mixture thereof, and is superior in processing of organic materials and ability to adsorb inorganic materials, thereby minimizing the remaining inorganic material content, ultimately preventing processing defects from occurring.
    Type: Application
    Filed: July 5, 2019
    Publication date: October 28, 2021
    Inventors: Su Jin LEE, Seung Hun LEE, Seung Hyun LEE
  • Display device
    Patent number: 11151926
    Abstract: A display device includes a substrate including a first pixel area, a second pixel area, and a third pixel area, each of the second and third pixel areas having a smaller surface area than the first pixel area and being connected to the first pixel area, first to third pixels provided in the first to third pixel areas, respectively, first to third lines connected to the first to third pixels, respectively, a line connecting part connecting the second and third lines, and a dummy unit overlapping the line connecting part to compensate for a difference of a load value of the first line and a load value of the second line.
    Type: Grant
    Filed: May 11, 2020
    Date of Patent: October 19, 2021
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Ji Hyun Ka, Sun Ja Kwon, Tae Hoon Kwon, Byung Sun Kim, Yang Wan Kim, Hyun Ae Park, Su Jin Lee, Seung Kyu Lee, Jae Yong Lee, Jin Tae Jeong, Seung Ji Cha
  • Energy harvesting system using linear kinetic energy based on induction power generation
    Patent number: 11146089
    Abstract: According to an embodiment, there is provided an energy harvesting system using linear kinetic energy based on induction power generation. According to various embodiments, there may be provided an energy harvesting system using linear kinetic energy based on induction power generation, which may minimize the occasions of replacing or recharging the battery in battery-powered products by using the force or energy generated from a linearly reciprocating machine or device and may allow the battery to be charged when linear kinetic energy is generated and, otherwise, discharged, using an automatic battery charging/discharging system.
    Type: Grant
    Filed: November 27, 2020
    Date of Patent: October 12, 2021
    Inventors: Jin Yong Lee, Jeong Hun Lee, Su Jin Lee, Myoung Hoon Choi, Jeong Hwan Ahn
  • Display device
    Patent number: 11133373
    Abstract: Disclosed is a display device, including: a substrate including a pixel area and a peripheral area; pixels provided in the pixel area as a plurality of pixel rows and a plurality of pixel columns; data lines configured to provide a data signal; scan lines configured to provide a scan signal; first power lines configured to provide a power source to the pixel columns; and a second power line connected to the first power lines and disposed in the peripheral area. A scan line connected to an ith pixel row may apply a scan signal to the ith pixel row, and a branched line branched from the scan line may apply an initialization signal to a kth pixel row (k?i). A branched point of the scan line is disposed between a pixel most adjacent to the second power line of the ith pixel row and the second power line.
    Type: Grant
    Filed: August 10, 2020
    Date of Patent: September 28, 2021
    Inventors: Yang Wan Kim, Jae Yong Lee, Sun Ja Kwon, Hyun Ae Park, Byung Sun Kim, Su Jin Lee, Hyung Jun Park, Yu Jin Jeon
  • Display device
    Patent number: 11120737
    Abstract: A display device includes: a substrate including a first pixel region, at least one second pixel region having a smaller area than the first pixel region, the at least one second pixel region being disposed adjacent to the first pixel region, and a peripheral region surrounding the first pixel region and the second pixel region; first and second pixels respectively provided in the first and second pixel regions; first and second lines respectively connected to the first and second pixels; a dummy line connected to one of the first and second lines to extend to the peripheral region; and a first dummy part including a dummy pixel connected to the dummy line in the peripheral region.
    Type: Grant
    Filed: November 25, 2019
    Date of Patent: September 14, 2021
    Inventors: Yang Wan Kim, Su Jin Lee, Sun Ja Kwon, Byung Sun Kim, Hyun Ae Park, Hyung Jun Park, Jae Yong Lee, Yu Jin Jeon
  • Line start synchronous reluctance motor and rotor thereof
    Patent number: 11088603
    Abstract: The present invention relates to a line start synchronous reluctance motor and a rotor thereof. To this end, the present invention provides a line start synchronous reluctance motor including: a rotor; a plurality of conductor bars disposed on a side of an outer circumferential portion of the rotor; and flux barriers formed at an inner side of the rotor so as to be close to the conductor bars, wherein the flux barriers, which are formed in separate regions of a body of the rotor that are arranged to have opposite polarities, are formed to be asymmetrical to each other. Therefore, the present invention improves characteristics of the motor through the asymmetrical flux-barrier structure without changing the number of conductor bars, thereby allowing the initial starting of the motor to be smoothly performed, which is advantageous in terms of torque ripple characteristics and die casting.
    Type: Grant
    Filed: December 13, 2017
    Date of Patent: August 10, 2021
    Assignee: HYOSUNG HEAVY INDUSTRIES CORPORATION
    Inventors: Su Jin Lee, Liang Fang
  • DISPLAY DEVICE
    Publication number: 20210242301
    Abstract: A display device includes a substrate having a pixel area with at least a first rounded corner portion and first to third non-pixel areas arranged sequentially along an outer circumference of the pixel area. An internal circuit in the first non-pixel area has a first end portion adjacent to the first rounded corner portion of the pixel area. The first end portion of the internal circuit is rounded in accordance with the first rounded corner portion. A plurality of routing wires are in the third non-pixel area below the pixel area. The routing wires extending to the pixel area via the second non-pixel area and the first non-pixel area. The routing wires include at least a first routing wire connected to the pixel area passing an area of the first end portion of the internal circuit.
    Type: Application
    Filed: April 23, 2021
    Publication date: August 5, 2021
    Applicant: Samsung Display Co., Ltd.
    Inventors: Seung Kyu LEE, Yang Wan KIM, Sun Ja KWON, Byung Sun KIM, Hyun Ae PARK, Su Jin LEE, Jae Yong LEE, Tae Hoon KWON, Seung Ji CHA
  • DISPLAY DEVICE AND DRIVING METHOD THEREOF
    Publication number: 20210233472
    Abstract: A display device includes a first pixel area having first pixels and a second pixel area having second pixels. Each first pixel includes a driving transistor initialized to a voltage of a first initialization power supply. Each second pixel includes a driving transistor initialized to a voltage of a second initialization power supply. The first initialization power supply and the second initialization power supply are set to different voltages. The first pixel area and the second pixel area have different widths.
    Type: Application
    Filed: April 13, 2021
    Publication date: July 29, 2021
    Inventors: Yang Wan Kim, Sun Ja Kwon, Byung Sun Kim, Hyun Ae Park, Hyung Jun Park, Su Jin Lee, Jae Yong Lee, Yu Jin Jeon
  • Organic light emitting compounds and organic light emitting devices including the same
    Patent number: 11075343
    Abstract: Disclosed is an organic light emitting compound represented by Formula 1: HAr1—(L)n—HAr2??(1); an organic light emitting device including the organic light emitting compound of Formula 1: and an organic light emitting device including the organic light emitting compound of Formula 1 as a first compound and a second compound represented by Formula 2: HAr3—(L)n—HAr4??(2) .
    Type: Grant
    Filed: January 13, 2017
    Date of Patent: July 27, 2021
    Assignee: SFC CO., LTD.
    Inventors: Se-jin Lee, Taejung Yu, Seok-bae Park, Byung-sun Yang, Su-Jin Lee, Bong-Hyang Lee, Yeongtae Choi
  • PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET LITHOGRAPHY, AND METHOD FOR FORMING PATTERN BY USING SAME
    Publication number: 20210214649
    Abstract: A processing solution composition for reducing collapse of a polyhydroxystyrene-containing photoresist pattern defined by an extreme-ultraviolet exposure source and a method of forming a pattern using the same are proposed. The processing solution composition includes 0.0001 to 1 wt % of a nonionic surfactant having an HLB (Hydrophilic-Lipophilic Balance) value of 9 to 16, 0.0001 to 1 wt % of an alkaline material selected from the group consisting of tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, and mixtures thereof, and 98 to 99.9998 wt % of water, and is effective at reducing the collapse of a polyhydroxystyrene-containing photoresist pattern defined by an extreme-ultraviolet exposure source.
    Type: Application
    Filed: May 22, 2019
    Publication date: July 15, 2021
    Inventors: Su Jin LEE, Seung Hun LEE, Seung Hyun LEE
  • CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING PATTERN PROFILE
    Publication number: 20210216013
    Abstract: Proposed is a photoresist composition for a KrF light source, which exhibits a vertical profile compared to conventional KrF positive photoresists by adding a resin capable of increasing transmittance in order to form a semiconductor pattern, particularly a chemically amplified positive photoresist composition for improving a pattern profile, which includes, based on the total weight of the composition, 5 to 60 wt % of a polymer resin, 0.1 to 10 wt % of a transmittance-increasing resin additive represented by Chemical Formula 1, 0.05 to 10 wt % of a photoacid generator, 0.01 to 5 wt % of an acid diffusion inhibitor, and the remainder of a solvent, thus making it possible to provide a composition exhibiting a vertical profile, enhanced sensitivity and a superior processing margin compared to conventional positive photoresists.
    Type: Application
    Filed: May 22, 2019
    Publication date: July 15, 2021
    Inventors: Su Jin LEE, Young Cheol CHOI, Seung Hun LEE, Seung Hyun LEE
  • Display device
    Patent number: 11056054
    Abstract: A display device includes a substrate including a first pixel region and a second pixel region having a smaller area than the first pixel region. The second pixel region is connected to the first pixel region. A first pixel is provided in the first pixel region and a second pixel is provided in the second pixel region. A first line is connected to the first pixel and a second line is connected to the second pixel. A dummy unit overlaps at least one of the first line and the second line, and compensates for a difference in load values between the first and second lines.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: July 6, 2021
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Yang Wan Kim, Sun Ja Kwon, Byung Sun Kim, Hyun Ae Park, Su Jin Lee, Jae Yong Lee