Patents by Inventor Su Min Hwang

Su Min Hwang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Inorganic-infiltrated polymer hybrid thin film resists for advanced lithography
    Patent number: 12140865
    Abstract: The present invention provides a method that utilizes an existing infrastructure such as atomic layer deposition or similar vapor-based deposition tool or metal salt solutions based infiltration to infiltrate certain metals or metal-based precursors into resist materials to enhance the performance of the resists for the advancement of lithography techniques.
    Type: Grant
    Filed: March 4, 2020
    Date of Patent: November 12, 2024
    Assignees: Brookhaven Science Associates, LLC, Board of Regents, The University of Texas System, The Research Foundation for The State University of New York
    Inventors: Chang-Yong Nam, Aaron Stein, Ming Lu, Jiyoung Kim, Nikhil Tiwale, Su Min Hwang, Ashwanth Subramanian
  • Inorganic-Infiltrated Polymer Hybrid Thin Film Resists for Advanced Lithography
    Publication number: 20200285148
    Abstract: The present invention provides a method that utilizes an existing infrastructure such as atomic layer deposition or similar vapor-based deposition tool or metal salt solutions based infiltration to infiltrate certain metals or metal-based precursors into resist materials to enhance the performance of the resists for the advancement of lithography techniques.
    Type: Application
    Filed: March 4, 2020
    Publication date: September 10, 2020
    Inventors: Chang-Yong Nam, Aaron Stein, Ming Lu, Jiyoung Kim, Nikhil Tiwale, Su Min Hwang, Ashwanth Subramanian