Patents by Inventor Su Oh

Su Oh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060194358
    Abstract: A tunable semiconductor laser including a Fabry-Perot filter and an electrode array is disclosed. The propagation direction of the light beam in the cavity can be consecutively shifted applying electric field or current to the electrode and tuning can consecutively performed over the wide wavelength band by the consecutive shift of the angle of the intra cavity laser beam.
    Type: Application
    Filed: April 27, 2006
    Publication date: August 31, 2006
    Inventors: Sahng Park, Moon Park, Ji Lee, Su Oh, Kyong Kim
  • Publication number: 20060126157
    Abstract: Provided is a monolithic integrated semiconductor broad band light source. In the monolithic integrated semiconductor broad band light source, an electro absorption modulator, a semiconductor optical amplifier, and a light emitting diode are integrated on an InP substrate. Ions are implanted among the electro absorption modulator, the semiconductor optical amplifier, and the light emitting diode to electrically insulate the electro absorption modulator, the semiconductor optical amplifier, and the light emitting diode from one another. Electrodes independently implant currents into the electro absorption modulator, the semiconductor optical amplifier, and the light emitting diode. In particular, it is important to form a current intercepting layer and electrically insulate electrodes from one another but optically connect the electrodes in terms of performance of the monolithic integrated semiconductor broad band light source.
    Type: Application
    Filed: December 8, 2005
    Publication date: June 15, 2006
    Inventors: Moon Park, Sahang Park, Su Oh, Sung Kim, Kwang Oh, Yong Baek, Gyung Kim
  • Publication number: 20060127093
    Abstract: A channel switching function is added to a wavelength division multiplexing passive optical network (WDM-PON) system, which is an access optical network system, and the potential transmission rate is increased by combining wide wavelength tunable lasers and a time division multiplexing (TDM) data structure and properly using the necessary optical components. In addition, when the wavelength of a light source or an arrayed waveguide grating (AWG) changes, the wavelength is traced and the magnitude of a transmitted signal is maximized without an additional detour line using a loop-back network structure. Furthermore, fewer thermo-electric controllers (TECs) are required for stabilizing the temperature of an optical line terminal (OLT) using wavelength tunable lasers, each laser electrically changing its wavelength.
    Type: Application
    Filed: October 17, 2005
    Publication date: June 15, 2006
    Inventors: Sahng Park, Su Oh, Kwang Choi, Moon Park, Yong Baek, Kwang Oh
  • Publication number: 20050141571
    Abstract: Provided is a coherent tuning apparatus capable of continuously tuning wavelength of light over a wide band of wavelength at high speed and outputting high power, the apparatus including an optical waveguide through which spatially coherent light passes, an electrode array for changing a direction of the light passing through the optical waveguide by applying electric field or current to a portion of the optical waveguide, and a wavelength selection optical element unit for selecting a specific wavelength of the light.
    Type: Application
    Filed: August 24, 2004
    Publication date: June 30, 2005
    Inventors: Sahnggi Park, Moon Park, Ki Kim, Su Oh, Ji Lee, Chul Lee
  • Publication number: 20050142849
    Abstract: A method of forming metal wirings for a semiconductor device. A first etch stop layer, an dielectric layer, a second etch stop layer, and a wiring layer are deposited on a semiconductor substrate. A hole is formed by etching the wiring layer, the first etch stop layer, and the dielectric layer. A trench is formed by etching the wiring layer. The exposed first and second etch stop layers are removed after removal of the trench pattern. A barrier metal layer is deposited on inner walls of the hole and the trench. Grooves are formed on the barrier metal layer. A metal seed layer is deposited on the barrier metal layer. A metal thin layer is deposited inside the hole and the trench. The metal thin layer, the metal seed layer, and the barrier metal layer on the wiring layer are removed.
    Type: Application
    Filed: December 30, 2004
    Publication date: June 30, 2005
    Applicant: DongbuAnam Semiconductor Inc.
    Inventor: Su Oh