Patents by Inventor Su-Ting CHENG

Su-Ting CHENG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of measuring a parameter of a patterning process, metrology apparatus, target
    Patent number: 11150563
    Abstract: A technique of measuring a parameter of a patterning process is disclosed. In one arrangement, a target, formed by the patterning process, is illuminated. A sub-order diffraction component of radiation scattered from the target is detected and used to determine the parameter of the patterning process.
    Type: Grant
    Filed: December 10, 2019
    Date of Patent: October 19, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Sergei Sokolov, Sergey Tarabrin, Su-Ting Cheng, Armand Eugene Albert Koolen, Markus Franciscus Antonius Eurlings, Koenraad Remi André Maria Schreel
  • Metrology method and apparatus, computer program and lithographic system
    Patent number: 10788757
    Abstract: Disclosed is a method of mitigating for a process dependent stray light artifact on a measurement a structure. The method comprises obtaining a calibration scaling factor for the process dependent stray light artifact based on a reference angle resolved measurement and target angle resolved measurement, and a correction of an image with the obtained calibration scaling factor.
    Type: Grant
    Filed: April 9, 2019
    Date of Patent: September 29, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Su-Ting Cheng, Sergei Sokolov, Armand Eugene Albert Koolen
  • METHOD OF MEASURING A PARAMETER OF A PATTERNING PROCESS, METROLOGY APPARATUS, TARGET
    Publication number: 20200192230
    Abstract: A technique of measuring a parameter of a patterning process is disclosed. In one arrangement, a target, formed by the patterning process, is illuminated. A sub-order diffraction component of radiation scattered from the target is detected and used to determine the parameter of the patterning process.
    Type: Application
    Filed: December 10, 2019
    Publication date: June 18, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Sergei SOKOLOV, Sergey TARABRIN, Su-Ting CHENG, Armand Eugene Albert KOOLEN, Markus Franciscus Antonius EURLINGS, Koenraad Remi Andre Maria SCHREEL
  • Metrology Method and Apparatus, Computer Program and Lithographic System
    Publication number: 20190317413
    Abstract: Disclosed is a method of mitigating for a process dependent stray light artifact on a measurement a structure. The method comprises obtaining a calibration scaling factor for the process dependent stray light artifact based on a reference angle resolved measurement and target angle resolved measurement, and a correction of an image with the obtained calibration scaling factor.
    Type: Application
    Filed: April 9, 2019
    Publication date: October 17, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Su-Ting CHENG, Sergei Sokolov, Armand Eugene Albert Koolen