Patents by Inventor Suwoong Kim

Suwoong Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymers, underlayer coating compositions comprising the same, and patterning methods
    Patent number: 11567409
    Abstract: A polymer comprising a first repeating unit including an amino group protected by an alkoxycarbonyl group; a second repeating unit including a nucleophilic group; and a third repeating unit including a crosslinkable group, wherein the first repeating unit, the second repeating unit, and the third repeating unit are different from each other.
    Type: Grant
    Filed: April 17, 2020
    Date of Patent: January 31, 2023
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Jung June Lee, Suwoong Kim, Min Kyung Jang, Jin Hong Park, Jae Hwan Sim, Jae Bong Lim
  • COMPOSITION FOR PHOTORESIST UNDERLAYER
    Publication number: 20220397827
    Abstract: A photoresist underlayer composition, comprising: a first polymer comprising a crosslinkable group; a second polymer comprising: a first repeating unit comprising a repeating unit comprising a photoacid generator, and a second repeating unit comprising a hydroxy-substituted C1-30 alkyl group, a hydroxy-substituted C3-30 cycloalkyl group, or a hydroxy-substituted C6-30 aryl group; an acid catalyst; and a solvent.
    Type: Application
    Filed: May 28, 2021
    Publication date: December 15, 2022
    Inventors: Jung June Lee, Jae Hwan Sim, Suwoong Kim, Jin Hong Park, Bhooshan Popere
  • POLYMERS, UNDERLAYER COATING COMPOSITIONS COMPRISING THE SAME, AND PATTERNING METHODS
    Publication number: 20210324122
    Abstract: A polymer comprising a first repeating unit including an amino group protected by an alkoxycarbonyl group; a second repeating unit including a nucleophilic group; and a third repeating unit including a crosslinkable group, wherein the first repeating unit, the second repeating unit, and the third repeating unit are different from each other.
    Type: Application
    Filed: April 17, 2020
    Publication date: October 21, 2021
    Inventors: Jung June Lee, Suwoong Kim, Min Kyung Jang, Jin Hong Park, Jae Hwan Sim, Jae Bong Lim
  • COATING COMPOSITION FOR PHOTORESIST UNDERLAYER
    Publication number: 20210200093
    Abstract: A coating composition comprising a crosslinkable polyester polymer comprising an isocyanurate group and a crosslinkable group; a crosslinker; and an acid catalyst, wherein at least one of the crosslinkable polyester polymer and the crosslinker comprises an iodine-containing polymer.
    Type: Application
    Filed: December 30, 2020
    Publication date: July 1, 2021
    Inventors: Jin Hong Park, Yoo-Jin Ghang, Suwoong Kim, You Rim Shin, Jung June Lee, Jae Hwan Sim
  • COATING COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY PROCESS
    Publication number: 20200133126
    Abstract: A monomer represented by Chemical Formula (1): wherein, X, Y, and Z are the same as described in the specification, and the polymer including repeat units derived from the monomer.
    Type: Application
    Filed: October 31, 2018
    Publication date: April 30, 2020
    Inventors: Jae Hwan Sim, Suwoong Kim, Jin Hong Park, Myung Yeol Kim, Yoo-Jin Ghang, Jae-Bong Lim