Patents by Inventor Su-youn Choi

Su-youn Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240132760
    Abstract: A UV curing adhesive composition, an adhesive film comprising the same, a polarizing film comprising the same, and a display device comprising polarizing film are described herein, wherein the UV curing adhesive composition comprises a monofunctional acrylate, a polyfunctional acrylate, a silane coupling agent, a cationic initiator, and a photosensitizer.
    Type: Application
    Filed: October 24, 2022
    Publication date: April 25, 2024
    Applicant: LG Chem, Ltd.
    Inventors: Su Youn Choi, Yoonkyung Kwon
  • Patent number: 11733444
    Abstract: The present specification relates to a method for manufacturing a polarizing plate, and an adhesive composition for a polarizing plate.
    Type: Grant
    Filed: January 23, 2020
    Date of Patent: August 22, 2023
    Inventors: Su Youn Choi, Jin Woo Kim, Yoonkyung Kwon, Dong Uk Kim
  • Publication number: 20210191020
    Abstract: The present specification relates to a method for manufacturing a polarizing plate, and an adhesive composition for a polarizing plate.
    Type: Application
    Filed: January 23, 2020
    Publication date: June 24, 2021
    Applicant: LG Chem, Ltd.
    Inventors: Su Youn Choi, Jin Woo Kim, Yoonkyung Kwon, Dong Uk Kim
  • Publication number: 20200201089
    Abstract: A polarizing plate includes a polarizer; and a protective layer provided on one surface or both surfaces of the polarizer directly adjoining the polarizer, wherein the protective layer is a cured material of a photocurable composition for a polarizing plate protective layer comprising an epoxy compound and an oxetane-based compound. An image display device includes the polarizing plate.
    Type: Application
    Filed: September 20, 2018
    Publication date: June 25, 2020
    Applicant: LG Chem, Ltd.
    Inventors: Mi So Lee, Sanghun Han, Yoonkyung Kwon, Hae Sung Cho, Eungki Lee, Jin Ah Seok, Su Youn Choi, Yoobin Kim, Jun Gu Yeo
  • Patent number: 8173729
    Abstract: The present invention relates to a photosensitive resin composition, particularly to a photosensitive resin composition for forming an interlayer organic insulating film for TFT-LCD, comprising 0.01 to 20 wt % of UV stabilizer or radical scavenger. The photosensitive resin composition of the present invention can be used for forming an interlayer organic insulating film for TFT-LCD to improve active unfilled area upon over exposure in liquid crystal photo-alignment process, can easily control resolution of pattern, and is particularly suitable for forming a planarization layer of an interlayer organic insulating film.
    Type: Grant
    Filed: March 1, 2010
    Date of Patent: May 8, 2012
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: Hyoc-min Youn, Byung-uk Kim, Ki-hyuk Koo, Tae-hoon Yeo, Joo-pyo Yun, Hong-dae Shin, Sang Hoon Lee, Dong-myung Kim, Su-youn Choi, Jin Sun Kim, Chang-Min Woo, Hong-Suk Kim
  • Publication number: 20110294243
    Abstract: A photoresist composition suitable for forming a high-resolution pattern, and a method of forming a photoresist pattern using the same. The photoresist composition includes about 10 to about 45 parts by weight of an alkali soluble binder resin including a hydroxyl group, about 0.1 to about 5 parts by weight of a photo-acid generator, about 1 to about 5 parts by weight of a cross-linker that cross-links the alkali-soluble binder resin including the hydroxyl group, about 0.3 to about 3 parts by weight of a quinone diazide compound, and a remainder of a solvent.
    Type: Application
    Filed: April 22, 2011
    Publication date: December 1, 2011
    Inventors: Woo-Seok Jeon, Jeong-Min Park, Byung-Uk Kim, Hyoc-Min Youn, Ki-Hyuk Koo, Su-Youn Choi, Jin-Sun Kim
  • Publication number: 20100222473
    Abstract: The present invention relates to a photosensitive resin composition, particularly to a photosensitive resin composition for forming an interlayer organic insulating film for TFT-LCD, comprising 0.01 to 20 wt % of UV stabilizer or radical scavenger. The photosensitive resin composition of the present invention can be used for forming an interlayer organic insulating film for TFT-LCD to improve active unfilled area upon over exposure in liquid crystal photo-alignment process, can easily control resolution of pattern, and is particularly suitable for forming a planarization layer of an interlayer organic insulating film.
    Type: Application
    Filed: March 1, 2010
    Publication date: September 2, 2010
    Applicant: DONGJIN SEMICHEM Co., Ltd.
    Inventors: Hyoc-min YOUN, Byung-uk KIM, Ki-hyuk KOO, Tae-hoon YEO, Joo-pyo YUN, Hong-dae SHIN, Sang Hoon LEE, Dong-myung KIM, Su-youn CHOI, Jin Sun KIM, Chang-Min WOO, Hong-Suk KIM