Patents by Inventor Su-Young Han

Su-Young Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240122069
    Abstract: The present disclosure relates to a plurality of host materials and organic electroluminescent devices comprising the same. The present disclosure may provide a plurality of host materials having a composition favorable to thermal denaturation due to a low deposition temperature, while improving hole properties and electronic properties of HOMO and LUMO, by comprising separate compounds represented by formulas 1 and 2 into a light-emitting layer. By comprising the plurality of host materials of the present disclosure, it is possible to provide an organic electroluminescent device having a lower driving voltage, higher luminous efficiency and/or longer lifetime.
    Type: Application
    Filed: November 10, 2023
    Publication date: April 11, 2024
    Inventors: Bitnari KIM, Su-Hyun LEE, So-Young JUNG, Hyo-Soon PARK, Tae-Jun HAN, Young-Jun CHO, Sang-Hee CHO
  • Patent number: 11951207
    Abstract: The present invention provides a stable liquid pharmaceutical formulation containing: an antibody or its antigen-binding fragment; a surfactant; a sugar or its derivative; and a buffer. The stable liquid pharmaceutical formulation according to the present invention has low viscosity while containing a high content of the antibody, has excellent long-term storage stability based on excellent stability under accelerated conditions and severe conditions, and may be administered subcutaneously.
    Type: Grant
    Filed: June 28, 2017
    Date of Patent: April 9, 2024
    Assignee: Celltrion Inc.
    Inventors: Joon Won Lee, Won Yong Han, Su Jung Kim, Jun Seok Oh, So Young Kim, Su Hyeon Hong, Yeon Kyeong Shin
  • Patent number: 11939425
    Abstract: The present invention relates to a polyester resin. The polyester resin is useful for bottles, sheets, multilayer sheets, stretched films and fiber applications due to excellent heat resistance and transparency, and in particular, the polyester resin has little deterioration of physical properties such as yellowing, etc., during processing. A process for making the polyester resin includes an esterification reaction between a dicarboxylic acid that includes terephthalic acid and a diol that includes isosorbide in the presence of a catalyst, followed by a polycondensation reaction on a product of the esterification reaction. In some embodiments, an initial mixing ratio of the dicarboxylic acid and the diol is between 1:1.02 and 1:1.04.
    Type: Grant
    Filed: September 23, 2020
    Date of Patent: March 26, 2024
    Assignee: SK Chemicals Co., Ltd.
    Inventors: Yoo Jin Lee, Su-Min Lee, Sung-Gi Kim, Min-Young Han, Dong-jin Han
  • Publication number: 20230290253
    Abstract: A system for controlling flight includes an aerial vehicle, which flies in at least one control area, a plurality of ground internetworking devices provided in the at least one control area to perform communication with the aerial vehicle, and a ground control station to perform communication with at least one of the ground internetworking devices depending on a position of the aerial vehicle.
    Type: Application
    Filed: September 19, 2022
    Publication date: September 14, 2023
    Inventor: Su Young Han
  • Patent number: 9651867
    Abstract: Disclosed are a compound and composition for forming a lower film, which are used in a process for forming a resist pattern by means of the directed self-assembly of a block copolymer (BCP). Also disclosed is a method for forming a lower film using same. The compound for forming a lower film of a resist pattern according to the present invention has the structure of formula 1 of claim 1.
    Type: Grant
    Filed: September 12, 2013
    Date of Patent: May 16, 2017
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Su-Young Han, Jung-Youl Lee, Jae-Woo Lee, Jae-Hyun Kim
  • Publication number: 20150286139
    Abstract: Disclosed are a compound and composition for forming a lower film, which are used in a process for forming a resist pattern by means of the directed self-assembly of a block copolymer (BCP). Also disclosed is a method for forming a lower film using same. The compound for forming a lower film of a resist pattern according to the present invention has the structure of formula 1 of claim 1.
    Type: Application
    Filed: September 12, 2013
    Publication date: October 8, 2015
    Applicant: DONGJIN SEMICHEM CO., LTD.
    Inventors: Su-Young Han, Jung-Youl Lee, Jae-Woo Lee, Jae-Hyun Kim