Patents by Inventor Su-Young Han

Su-Young Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SYSTEM AND METHOD FOR CONTROLLING FLIGHT
    Publication number: 20230290253
    Abstract: A system for controlling flight includes an aerial vehicle, which flies in at least one control area, a plurality of ground internetworking devices provided in the at least one control area to perform communication with the aerial vehicle, and a ground control station to perform communication with at least one of the ground internetworking devices depending on a position of the aerial vehicle.
    Type: Application
    Filed: September 19, 2022
    Publication date: September 14, 2023
    Inventor: Su Young Han
  • Compound and composition for forming lower film of resist pattern, and method for forming lower film using same
    Patent number: 9651867
    Abstract: Disclosed are a compound and composition for forming a lower film, which are used in a process for forming a resist pattern by means of the directed self-assembly of a block copolymer (BCP). Also disclosed is a method for forming a lower film using same. The compound for forming a lower film of a resist pattern according to the present invention has the structure of formula 1 of claim 1.
    Type: Grant
    Filed: September 12, 2013
    Date of Patent: May 16, 2017
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Su-Young Han, Jung-Youl Lee, Jae-Woo Lee, Jae-Hyun Kim
  • Compound and Composition for Forming Lower Film of Resist Pattern, and Method for Forming Lower Film Using Same
    Publication number: 20150286139
    Abstract: Disclosed are a compound and composition for forming a lower film, which are used in a process for forming a resist pattern by means of the directed self-assembly of a block copolymer (BCP). Also disclosed is a method for forming a lower film using same. The compound for forming a lower film of a resist pattern according to the present invention has the structure of formula 1 of claim 1.
    Type: Application
    Filed: September 12, 2013
    Publication date: October 8, 2015
    Applicant: DONGJIN SEMICHEM CO., LTD.
    Inventors: Su-Young Han, Jung-Youl Lee, Jae-Woo Lee, Jae-Hyun Kim