Patents by Inventor Subbareddy Kanagasabapathy

Subbareddy Kanagasabapathy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fluorinated Si-polymers and photoresists comprising same
    Publication number: 20040224255
    Abstract: Photoimageable compositions are provided that contain Si-polymers that have a specified ratio of fluorine atoms to Si atoms. Preferred photoresists of the invention can exhibit enhanced resistance to plasma etchants.
    Type: Application
    Filed: February 23, 2004
    Publication date: November 11, 2004
    Inventors: Subbareddy Kanagasabapathy, George G. Barclay, Gerhard Pohlers
  • Photoresists containing Si-polymers
    Publication number: 20040209187
    Abstract: In a first aspect, silicon polymers are provided that have controlled ratio of silanol (Si—OH) moieties:Si atoms and/or a controlled amount of alkaline aqueous-solubilizing groups. Si-polymers of the invention are particularly useful as a photoresist resin component. In a further aspect, halogenated sulfonamide and thiol compounds and Si-containing polymers comprising such reacted monomers are provided.
    Type: Application
    Filed: October 21, 2003
    Publication date: October 21, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Subbareddy Kanagasabapathy
  • Photoimageable composition
    Patent number: 6803171
    Abstract: Disclosed are photoimageable compositions containing silsesquioxane binder polymers and photoactive compounds, methods of forming relief images using such compositions and methods of manufacturing electronic devices using such compositions. Such compositions are useful as photoresists and in the manufacture of optoelectronic devices.
    Type: Grant
    Filed: May 8, 2002
    Date of Patent: October 12, 2004
    Assignee: Shipley Company L.L.C.
    Inventors: Dana A. Gronbeck, George G. Barclay, Leo L. Linehan, Kao Xiong, Subbareddy Kanagasabapathy
  • Photoresists containing sulfonamide component
    Publication number: 20040161698
    Abstract: Photoresist compositions that contain one or more components having sulfonamide and Si substitution. Preferred photoresist compositions of the invention contain an Si-polymer such as a silsesquioxane that has sulfonamide substitution and may be employed in multilayer resist systems. In preferred aspects, the Si-polymer has both sulfonamide substitution as well as moieties that can provide contrast upon exposure to photogenerated acid.
    Type: Application
    Filed: October 21, 2003
    Publication date: August 19, 2004
    Applicant: Shipley Company L.L.C.
    Inventors: Subbareddy Kanagasabapathy, George G. Barclay
  • Transition metal superoxides
    Patent number: 6765076
    Abstract: Transition metal superoxides of formula M(O2)n, where M is a transition metal and n is equal to the valence of M, may be used as initiators for free radical polymerization, optionally, under conditions of living polymerization, with or without chain transfer agents. Polymers produced have a narrow molecular weight distribution and low polydispersity indexes when chain transfer agents and/or molecular weight controlling agents are used.
    Type: Grant
    Filed: March 20, 2002
    Date of Patent: July 20, 2004
    Assignee: Rensselaer Polytechnic Institute
    Inventors: Brian C. Benicewicz, Subbareddy Kanagasabapathy, Arumugam Sudalai
  • Processes for producing silane monomers and polymers and photoresist compositions comprising same
    Publication number: 20030219676
    Abstract: The invention includes new Si-containing monomers, polymers containing such monomers and photoresists that contain the polymers. Synthetic methods of the invention include reacting a vinyl carbocyclic aryl ester compound with a reactive silane compound to provide the monomer.
    Type: Application
    Filed: March 3, 2003
    Publication date: November 27, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Subbareddy Kanagasabapathy, Matthew A. King
  • Transition metal superoxides
    Publication number: 20030060577
    Abstract: Transition metal superoxides of formula M(O2)n, where M is a transition metal and n is equal to the valence of M, may be used as initiators for free radical polymerization, optionally, under conditions of living polymerization, with or without chain transfer agents. Polymers produced have a narrow molecular weight distribution and low polydispersity indexes when chain transfer agents and/or molecular weight controlling agents are used.
    Type: Application
    Filed: March 20, 2002
    Publication date: March 27, 2003
    Applicant: Rensselaer Polytechnic Institute
    Inventors: Brian C. Benicewicz, Subbareddy Kanagasabapathy, Arumugam Sudalai