Patents by Inventor Subrahmanyam Pilla

Subrahmanyam Pilla has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7728274
    Abstract: A viewing system configured to combine multiple spectral images of a scene, the system includes a spectral beam separator configured to split an incoming beam of radiation into a first and a second beam of radiation, the first beam of radiation including radiations substantially in a first spectral band and the second beam of radiation including radiations substantially in a second spectral band; an image intensifier configured to intensify the second beam of radiation, the image intensifier including a photocathode configured to produce a flux of photoelectrons with substantially increased efficiency when exposed to the second beam of radiation, the photocathode constructed and arranged to substantially absorb all the radiations in the second beam of radiation; a current amplifier configured to amplify the flux of photoelectrons; and a display system configured to display an image of the scene in the second spectral band based on the amplified flux of electrons simultaneously with an image of the scene in th
    Type: Grant
    Filed: March 30, 2007
    Date of Patent: June 1, 2010
    Inventors: Subrahmanyam Pilla, Srinivas Kadiyala
  • Publication number: 20080237771
    Abstract: A viewing system configured to combine multiple spectral images of a scene, the system includes a spectral beam separator configured to split an incoming beam of radiation into a first and a second beam of radiation, the first beam of radiation including radiations substantially in a first spectral band and the second beam of radiation including radiations substantially in a second spectral band; an image intensifier configured to intensify the second beam of radiation, the image intensifier including a photocathode configured to produce a flux of photoelectrons with substantially increased efficiency when exposed to the second beam of radiation, the photocathode constructed and arranged to substantially absorb all the radiations in the second beam of radiation; a current amplifier configured to amplify the flux of photoelectrons; and a display system configured to display an image of the scene in the second spectral band based on the amplified flux of electrons simultaneously with an image of the scene in th
    Type: Application
    Filed: March 30, 2007
    Publication date: October 2, 2008
    Inventors: Subrahmanyam Pilla, Srinivas Kadiyala
  • Publication number: 20060017049
    Abstract: The present invention relates to a various systems for generating and directing electron flow, and related methods, manufacturing techniques and related componentry, such as can be used in lithography, microscopy and other applications. In one embodiment, the present invention involves a system that includes an electron source having a plurality of independently-actuatable emission surfaces each of which is capable of emitting electrons, and an optical column adjacent to the electron source through which the emitted electrons pass. The optical column includes a plurality of actuatable electrodes that are capable of influencing paths taken by the emitted electrons.
    Type: Application
    Filed: July 22, 2005
    Publication date: January 26, 2006
    Inventor: Subrahmanyam Pilla