Patents by Inventor Sudhakar Mahalingam

Sudhakar Mahalingam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11810754
    Abstract: A system and method for optimizing a ribbon ion beam in a beam line implantation system is disclosed. The system includes a calibration sensor disposed in the beam line after the mass analyzer. The calibration sensor is able to measure both the total current of the ribbon ion beam, as well as provide information about its vertical position. Information from the calibration sensor can then be utilized by a controller to adjust various parameters to improve the density as well as the vertical position. In some embodiments, the calibration sensor may include a plurality of Faraday sensors, where, both the total current and the vertical position of the ion beam can be determined. Furthermore, the focus of the ion beam can be estimated based on the distribution of the current in the height direction.
    Type: Grant
    Filed: December 9, 2021
    Date of Patent: November 7, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Eric D. Hermanson, Nevin Clay, Antonella Cucchetti, Philip Layne, Sudhakar Mahalingam, Michael Simmons
  • Publication number: 20230187171
    Abstract: A system and method for optimizing a ribbon ion beam in a beam line implantation system is disclosed. The system includes a calibration sensor disposed in the beam line after the mass analyzer. The calibration sensor is able to measure both the total current of the ribbon ion beam, as well as provide information about its vertical position. Information from the calibration sensor can then be utilized by a controller to adjust various parameters to improve the density as well as the vertical position. In some embodiments, the calibration sensor may include a plurality of Faraday sensors, where, both the total current and the vertical position of the ion beam can be determined. Furthermore, the focus of the ion beam can be estimated based on the distribution of the current in the height direction.
    Type: Application
    Filed: December 9, 2021
    Publication date: June 15, 2023
    Inventors: Eric D. Hermanson, Nevin Clay, Antonella Cucchetti, Philip Layne, Sudhakar Mahalingam, Michael Simmons
  • Patent number: 11651932
    Abstract: An ion source capable of extracting a ribbon ion beam with improved vertical angular uniformity is disclosed. The extraction plate and extraction optics are designed such that there is at least one non-uniform gap between adjacent components. A non-uniform gap may be effective in reducing angular spread non-uniformity of the extracted ribbon ion beam. Specifically, for a given gap in the Z direction, ions extracted from regions with lower plasma density may have more vertical angular spread. A larger gap in the Z direction between components in this region may make the vertical angular spread closer to the vertical angular spread of ions extracted from regions with higher plasma density. The non-uniform gap may be created by having an extraction plate that is flat or curved and electrodes that are flat, convex or concave. In certain embodiments, the non-uniform gap is located between the extraction plate and the suppression electrode.
    Type: Grant
    Filed: October 26, 2021
    Date of Patent: May 16, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Alexandre Likhanskii, Jay T. Scheuer, Sudhakar Mahalingam, Nevin Clay
  • Publication number: 20230131410
    Abstract: An ion source capable of extracting a ribbon ion beam with improved vertical angular uniformity is disclosed. The extraction plate and extraction optics are designed such that there is at least one non-uniform gap between adjacent components. A non-uniform gap may be effective in reducing angular spread non-uniformity of the extracted ribbon ion beam. Specifically, for a given gap in the Z direction, ions extracted from regions with lower plasma density may have more vertical angular spread. A larger gap in the Z direction between components in this region may make the vertical angular spread closer to the vertical angular spread of ions extracted from regions with higher plasma density. The non-uniform gap may be created by having an extraction plate that is flat or curved and electrodes that are flat, convex or concave. In certain embodiments, the non-uniform gap is located between the extraction plate and the suppression electrode.
    Type: Application
    Filed: October 26, 2021
    Publication date: April 27, 2023
    Inventors: Alexandre Likhanskii, Jay T. Scheuer, Sudhakar Mahalingam, Nevin Clay