Patents by Inventor SuEun Chung

SuEun Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Image processing-based lithography system and method of coating target object
    Patent number: 9856564
    Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
    Type: Grant
    Filed: January 28, 2016
    Date of Patent: January 2, 2018
    Assignee: SNU R&DB FOUNDATION
    Inventors: Sunghoon Kwon, Sueun Chung, Seungah Lee, Jisung Jang, Sangkwon Han
  • IMAGE PROCESSING-BASED LITHOGRAPHY SYSTEM AND METHOD OF COATING TARGET OBJECT
    Publication number: 20160145744
    Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
    Type: Application
    Filed: January 28, 2016
    Publication date: May 26, 2016
    Applicant: SNU R&DB FOUNDATION
    Inventors: Sunghoon KWON, Sueun CHUNG, Seungah LEE, Jisung JANG, Sangkwon HAN
  • Image processing-based lithography system and method of coating target object
    Patent number: 9323159
    Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
    Type: Grant
    Filed: March 29, 2012
    Date of Patent: April 26, 2016
    Assignee: SNU R&DB FOUNDATION
    Inventors: Sung Hoon Kwon, Sueun Chung, Seungah Lee, Jisung Jang, Sangkwon Han
  • Fluidic channel system and method for fabricating fine structure
    Patent number: 8408892
    Abstract: A fluidic channel system is provided. The fluidic channel system includes a light projection apparatus, a fluidic channel, and a rail. The light projection apparatus provides light. A photocurable fluid, which is selectively cured by the light, flows inside the fluidic channel. A fine structure which is to be formed by curing the photocurable fluid moves along the rail.
    Type: Grant
    Filed: October 1, 2008
    Date of Patent: April 2, 2013
    Assignee: SNU R&DB Foundation
    Inventors: Sunghoon Kwon, JiYun Kim, Wook Park, HyunSung Park, SeungAh Lee, SuEun Chung
  • IMAGE PROCESSING-BASED LITHOGRAPHY SYSTEM AND METHOD OF COATING TARGET OBJECT
    Publication number: 20120236278
    Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
    Type: Application
    Filed: March 29, 2012
    Publication date: September 20, 2012
    Applicant: SNU R&DB FOUNDATION
    Inventors: Sung Hoon KWON, Sueun Chung, Seungah Lee, Jisung Jang, Sangkwon Han
  • Optofluidic lithography system, method of manufacturing two-layered microfluidic channel, and method of manufacturing three-dimensional microstructures
    Patent number: 8246889
    Abstract: An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.
    Type: Grant
    Filed: September 8, 2009
    Date of Patent: August 21, 2012
    Assignee: SNU R&DB Foundation
    Inventors: Sunghoon Kwon, SeungAh Lee, Wook Park, SuEun Chung
  • COMPOSITE FILM FOR LIGHT-EMITTING APPARATUS, LIGHT-EMITTING APPARATUS AND METHOD FOR PRODUCING THE COMPOSITE FILM
    Publication number: 20120182714
    Abstract: Provided is a composite film used for a light emitting apparatus including a light emitting device. The composite film includes a fluorescent layer including phosphors and an optical plate disposed on the fluorescent layer, and diffusing, reducing or mixing at least one of light emitted by the light emitting device, light emitted by the phosphors and a combination thereof.
    Type: Application
    Filed: March 28, 2012
    Publication date: July 19, 2012
    Applicant: SNU R&DB FOUNDATION
    Inventors: Sunghoon KWON, Sueun Chung, Seungah Lee, Jisung Jang, Sangkwon Han
  • FLUIDIC CHANNEL SYSTEM AND METHOD FOR FABRICATING FINE STRUCTURE
    Publication number: 20110006464
    Abstract: A fluidic channel system is provided. The fluidic channel system includes a light projection apparatus, a fluidic channel, and a rail. The light projection apparatus provides light. A photocurable fluid, which is selectively cured by the light, flows inside the fluidic channel. A fine structure which is to be formed by curing the photocurable fluid moves along the rail.
    Type: Application
    Filed: October 1, 2008
    Publication date: January 13, 2011
    Inventors: Sunghoon Kwon, JiYun Kim, Wook Park, HyunSung Park, SeungAh Lee, SuEun Chung
  • OPTOFLUIDIC LITHOGRAPHY SYSTEM, METHOD OF MANUFACTURING TWO-LAYERED MICROFLUIDIC CHANNEL, AND METHOD OF MANUFACTURING THREE-DIMENSIONAL MICROSTRUCTURES
    Publication number: 20100060875
    Abstract: An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.
    Type: Application
    Filed: September 8, 2009
    Publication date: March 11, 2010
    Inventors: Sunghoon Kwon, SeungAh Lee, Wook Park, SuEun Chung
  • SELF-ASSEMBLING METHOD AND STRUCTURE
    Publication number: 20100056720
    Abstract: Disclosed are compositions and methods for self-assembling polymeric particles by using biological binders attached to subunits of a multi-sectioned polymeric particle.
    Type: Application
    Filed: August 27, 2008
    Publication date: March 4, 2010
    Inventors: Sunghoon Kwon, Sueun Chung