Patents by Inventor Sufei Shi

Sufei Shi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240175949
    Abstract: A transition metal dichalcogenides device includes a substrate, at least one layer of boron nitride, a tungsten diselenide monolayer positioned such that the at least one layer of boron nitride at least partially encapsulates the tungsten diselenide monolayer, and a plurality of electrodes. Each of the plurality of electrodes includes gold and few-layer graphene, and the at least one layer of boron nitride includes hexagonal few-layer boron nitride. The tungsten diselenide monolayer is configured to reveal excitons when at least one of a K valley and a K? valley of the tungsten diselenide monolayer is exposed to excitation photon energy and an external magnetic field. The excitons are giant valley-polarized Rydberg excitons in excited states ranging from 2 s to 11 s when the external magnetic field is in the range of about ?17 T to about 17 T.
    Type: Application
    Filed: February 5, 2024
    Publication date: May 30, 2024
    Applicant: RENSSELAER POLYTECHNIC INSTITUTE
    Inventors: Sufei Shi, Tianmeng Wang
  • Patent number: 11892529
    Abstract: A transition metal dichalcogenides device includes a substrate, a bottom layer of boron nitride, a tungsten diselenide monolayer on the bottom layer of boron nitride, a top layer of boron nitride on the tungsten diselenide monolayer such that the bottom and top layers of boron nitride at least partially encapsulate the tungsten diselenide monolayer, a source electrode on the substrate, a drain electrode on the substrate, and a top gate electrode on the top layer of boron nitride. The tungsten diselenide monolayer is configured to reveal excitons when at least one of a K valley and a K? valley of the tungsten diselenide monolayer is exposed to excitation photon energy and an external magnetic field. The excitons are giant valley-polarized Rydberg excitons in excited states ranging from 2s to 11s when the external magnetic field is in the range of about ?17 T to about 17 T.
    Type: Grant
    Filed: December 30, 2021
    Date of Patent: February 6, 2024
    Assignee: Rensselaer Polytechnic Institute
    Inventors: Sufei Shi, Tianmeng Wang
  • Publication number: 20220276325
    Abstract: A transition metal dichalcogenides device includes a substrate, a bottom layer of boron nitride, a tungsten diselenide monolayer on the bottom layer of boron nitride, a top layer of boron nitride on the tungsten diselenide monolayer such that the bottom and top layers of boron nitride at least partially encapsulate the tungsten diselenide monolayer, a source electrode on the substrate, a drain electrode on the substrate, and a top gate electrode on the top layer of boron nitride. The tungsten diselenide monolayer is configured to reveal excitons when at least one of a K valley and a K? valley of the tungsten diselenide monolayer is exposed to excitation photon energy and an external magnetic field. The excitons are giant valley-polarized Rydberg excitons in excited states ranging from 2s to 11s when the external magnetic field is in the range of about ?17 T to about 17 T.
    Type: Application
    Filed: December 30, 2021
    Publication date: September 1, 2022
    Applicant: Rensselaer Polytechnic Institute
    Inventors: Sufei Shi, Tianmeng Wang