Patents by Inventor Suhail Kizhakkeveettil SIDDIQUE

Suhail Kizhakkeveettil SIDDIQUE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11059205
    Abstract: A method for fabricating nanoporous polymer thin film includes steps as follows. A polymer thin film is provided, wherein a polymer solution including a polymer is coated on a substrate to form the polymer thin film. A swelling and annealing process is provided, wherein the polymer thin film is disposed inside a chamber with a vapor of a first solvent, the polymer thin film is swollen and annealed to form a swollen polymer thin film, and the swollen polymer thin film includes the polymer and the first solvent. A freezing process is provided, wherein the swollen polymer thin film is cooled to a temperature less than or equal to a crystallization temperature of the first solvent to crystallize the first solvent. A first solvent removing process is provided, wherein the first solvent is removed with a second solvent, such that a nanoporous polymer thin film is obtained.
    Type: Grant
    Filed: August 17, 2018
    Date of Patent: July 13, 2021
    Assignee: NATIONAL TSING HUA UNIVERSITY
    Inventors: Rong-Ming Ho, Mohan Raj Krishnan, Suhail Kizhakkeveettil Siddique, Yu-Cheng Chien
  • Publication number: 20190255745
    Abstract: A method for fabricating nanoporous polymer thin film includes steps as follows. A polymer thin film is provided, wherein a polymer solution including a polymer is coated on a substrate to form the polymer thin film. A swelling and annealing process is provided, wherein the polymer thin film is disposed inside a chamber with a vapor of a first solvent, the polymer thin film is swollen and annealed to form a swollen polymer thin film, and the swollen polymer thin film includes the polymer and the first solvent. A freezing process is provided, wherein the swollen polymer thin film is cooled to a temperature less than or equal to a crystallization temperature of the first solvent to crystallize the first solvent. A first solvent removing process is provided, wherein the first solvent is removed with a second solvent, such that a nanoporous polymer thin film is obtained.
    Type: Application
    Filed: August 17, 2018
    Publication date: August 22, 2019
    Inventors: Rong-Ming HO, Mohan Raj KRISHNAN, Suhail Kizhakkeveettil SIDDIQUE, Yu-Cheng CHIEN