Patents by Inventor Suji Gim
Suji Gim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240124979Abstract: The present disclosure provides methods and apparatuses for supplying a process gas in a semiconductor manufacturing process. In some embodiments, the method includes heating, using one or more heating devices of the semiconductor manufacturing apparatus, a gas tank and a gas line of the semiconductor manufacturing apparatus. The method further includes filling, through the gas line, the gas tank with a reaction gas. The method further includes changing, using the one or more heating devices, a temperature of the reaction gas in the gas tank. The method further includes supplying the reaction gas from the gas tank to a process chamber of the semiconductor manufacturing apparatus. The changing of the temperature of the reaction gas includes decomposing a portion of the reaction gas into one or more materials different from the reaction gas.Type: ApplicationFiled: July 28, 2023Publication date: April 18, 2024Applicant: Sansung Electronics Co., Ltd.Inventors: Chan Kyu LIM, Yoonbon Koo, Hanhim Kang, Suji Gim, Jongkoo Lim
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Patent number: 11931683Abstract: A scrubber system may include a scrubber housing including a vertically extended cleaning space, an inflow chamber coupled to a bottom portion of the scrubber housing, and first and second inflow portions, each of which is configured to supply a gas into the inflow chamber. The inflow chamber may include a mixing space, and the mixing space may be connected to the cleaning space. The first inflow portion may include a first connection pipe coupled to the inflow chamber to provide a first connection path and the second inflow portion may include a second connection pipe coupled to the inflow chamber to provide a second connection path. The first and second connection paths may be extended toward the mixing space in opposite directions, respectively, and may be connected to opposite portions of the mixing space, respectively.Type: GrantFiled: October 15, 2021Date of Patent: March 19, 2024Assignee: Samsung Electronics Co., Ltd.Inventors: Young Seok Roh, Suji Gim, Heesub Kim, Hee Ock Park, Jongyong Bae, Sung Chul Yoon, Sunsoo Lee, Dong Keun Jeon, Jinkyoung Joo
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Patent number: 11738299Abstract: An exhaust gas processing system including a process chamber in which an exhaust gas is produced; an exhaust gas measurer receiving the exhaust gas and measuring a concentration of the exhaust gas; a solid producing gas processor receiving the exhaust gas and removing a solid producing gas contained in the exhaust gas; a gas supply supplying dilution and cooling gases to the solid producing gas processor; a processed gas measurer receiving, as a processed gas, the exhaust gas free of the solid producing gas and measuring a temperature of the processed gas and ingredients of the processed gas; and a controller receiving results of measurement of the concentration of the exhaust gas from the exhaust gas measurer and results of measurement of the temperature of the processed gas and the ingredients of the processed gas from the exhaust gas measurer and controlling the gas supply based on the measurement results.Type: GrantFiled: July 12, 2021Date of Patent: August 29, 2023Assignees: SAMSUNG ELECTRONICS CO., LTD., PureSphere Co., Ltd.Inventors: Suji Gim, Sunwoo Yook, Youngduk Ko, Youngseok Roh, Seoyoung Maeng, Jongyong Bae, Jihnkoo Lee, Jungjoon Pyeon, Jongha Hwang
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Patent number: 11660563Abstract: An apparatus for collecting a by-product, includes: a chamber provided with a gas inlet and a gas outlet and having an internal space; a heater disposed on the gas inlet side of the internal space within the chamber and varying a heating temperature in time series; a vortex forming member disposed around the heater; a plurality of first collecting members disposed below the heater; a second collecting member disposed below the first collecting member so that a plurality of second collecting members intersect each other; and a third collecting member disposed on the gas outlet side of the internal space within the chamber.Type: GrantFiled: July 20, 2021Date of Patent: May 30, 2023Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Seoyoung Maeng, Iljun Jeon, Suji Gim, Youngseok Roh, Jongyong Bae, Jungjoon Pyeon
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Publication number: 20230068823Abstract: An apparatus for trapping an exhaust material from a substrate-processing process includes: a cyclone configured to provide the exhaust material with a swirling flow, wherein the exhaust material is discharged from the substrate-processing process using a reaction gas; an atomization module for providing the cyclone with a mist to convert the exhaust material into a powder through a wet oxidation reaction, and a collector configured to collect the powder.Type: ApplicationFiled: March 30, 2022Publication date: March 2, 2023Inventors: Uihyoung LEE, Suji GIM, Hongsik PARK, Taeheon LEE
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Patent number: 11549178Abstract: An apparatus and method for treating a semiconductor process gas comprises a gas inlet allowing a treatment target gas (or gas to be treated) to flow therethrough; a catalytic reaction portion including a catalyst and configured to allow the treatment target gas to be brought into contact with the catalyst; a space velocity controller between the gas inlet and the catalytic reaction portion, the space velocity controller extending from the gas inlet in a diagonal direction in relation to the gas inlet; a differential pressure buffer portion between the space velocity controller and the catalytic reaction portion and including a filter; and a gas outlet configured to externally discharge a product formed as the treatment target gas comes into contact with the catalyst.Type: GrantFiled: October 26, 2021Date of Patent: January 10, 2023Assignees: Samsung Electronics Co., Ltd., PureSphere Co., Ltd.Inventors: Suji Gim, Sunwoo Yook, Youngduk Ko, Youngseok Roh, Seoyoung Maeng, Jongyong Bae, Jihnkoo Lee, Jungjoon Pyeon, Jongha Hwang
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Publication number: 20220226868Abstract: A scrubber system may include a scrubber housing including a vertically extended cleaning space, an inflow chamber coupled to a bottom portion of the scrubber housing, and first and second inflow portions, each of which is configured to supply a gas into the inflow chamber. The inflow chamber may include a mixing space, and the mixing space may be connected to the cleaning space. The first inflow portion may include a first connection pipe coupled to the inflow chamber to provide a first connection path and the second inflow portion may include a second connection pipe coupled to the inflow chamber to provide a second connection path. The first and second connection paths may be extended toward the mixing space in opposite directions, respectively, and may be connected to opposite portions of the mixing space, respectively.Type: ApplicationFiled: October 15, 2021Publication date: July 21, 2022Applicants: Samsung Electronics Co., Ltd., Global Standard Technology Co.,LTDInventors: Young Seok ROH, Suji GIM, Heesub KIM, Hee Ock PARK, Jongyong BAE, Sung Chul YOON, Sunsoo LEE, Dong Keun JEON, Jinkyoung JOO
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Publication number: 20220205094Abstract: An apparatus and method for treating a semiconductor process gas comprises a gas inlet allowing a treatment target gas (or gas to be treated) to flow therethrough; a catalytic reaction portion including a catalyst and configured to allow the treatment target gas to be brought into contact with the catalyst; a space velocity controller between the gas inlet and the catalytic reaction portion, the space velocity controller extending from the gas inlet in a diagonal direction in relation to the gas inlet; a differential pressure buffer portion between the space velocity controller and the catalytic reaction portion and including a filter; and a gas outlet configured to externally discharge a product formed as the treatment target gas comes into contact with the catalyst.Type: ApplicationFiled: October 26, 2021Publication date: June 30, 2022Applicants: Samsung Electronics Co., Ltd., PureSphere Co.,Ltd.Inventors: Suji GIM, Sunwoo YOOK, Youngduk KO, Youngseok ROH, Seoyoung MAENG, Jongyong BAE, Jihnkoo LEE, Jungjoon PYEON, Jongha HWANG
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Publication number: 20220203290Abstract: An exhaust gas processing system including a process chamber in which an exhaust gas is produced; an exhaust gas measurer receiving the exhaust gas and measuring a concentration of the exhaust gas; a solid producing gas processor receiving the exhaust gas and removing a solid producing gas contained in the exhaust gas; a gas supply supplying dilution and cooling gases to the solid producing gas processor; a processed gas measurer receiving, as a processed gas, the exhaust gas free of the solid producing gas and measuring a temperature of the processed gas and ingredients of the processed gas; and a controller receiving results of measurement of the concentration of the exhaust gas from the exhaust gas measurer and results of measurement of the temperature of the processed gas and the ingredients of the processed gas from the exhaust gas measurer and controlling the gas supply based on the measurement results.Type: ApplicationFiled: July 12, 2021Publication date: June 30, 2022Applicant: PureSphere Co., Ltd.Inventors: Suji GIM, Sunwoo YOOK, Youngduk KO, Youngseok ROH, Seoyoung MAENG, Jongyong BAE, Jihnkoo LEE, Jungjoon PYEON, Jongha HWANG
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Publication number: 20220195603Abstract: A reaction gas supply system includes a reaction chamber configured to process a substrate using a reaction gas, a mass flow controller (MFC) configured to control an amount of the reaction gas supplied to the reaction chamber, a tank between the reaction chamber and the MFC, the tank having a cylindrical inner space configured to store the reaction gas, and an outlet portion configured to discharge the reaction gas from the tank, and a valve between the tank and the reaction chamber, the outlet portion of the tank having a gradually decreasing diameter toward the valve.Type: ApplicationFiled: July 28, 2021Publication date: June 23, 2022Inventors: Jungjoon PYEON, Seoyoung MAENG, Iljun JEON, Suji GIM, Youngseok ROH, Jongyong BAE
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Publication number: 20220143543Abstract: An apparatus for collecting a by-product, includes: a chamber provided with a gas inlet and a gas outlet and having an internal space; a heater disposed on the gas inlet side of the internal space within the chamber and varying a heating temperature in time series; a vortex forming member disposed around the heater; a plurality of first collecting members disposed below the heater; a second collecting member disposed below the first collecting member so that a plurality of second collecting members intersect each other; and a third collecting member disposed on the gas outlet side of the internal space within the chamber.Type: ApplicationFiled: July 20, 2021Publication date: May 12, 2022Applicant: Samsung Electronics Co., Ltd.Inventors: Seoyoung Maeng, Iljun Jeon, Suji Gim, Youngseok Roh, Jongyong Bae, Jungjoon Pyeon