Patents by Inventor Sujuan Wang

Sujuan Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240155628
    Abstract: Provided are an eNB, a UE and wireless communication methods. The eNB, in an embodiment, includes circuitry operative to fill a SPS activation/deactivation field in a DCI with a predetermined pattern of bits; and a transmitter operative to transmit the DCI to a first UE for the first UE to start periodically transmitting signals to a second UE or stop periodically transmitting signals to the second UE based on the SPS activation/deactivation field. The DCI is in a SPS format formed by adopting part or all bits of at least one field of DCI format 5 as the SPS activation/deactivation field, and information supposed to be transmitted in the at least one field is indicated with the assistance of or by RRC or MAC signaling.
    Type: Application
    Filed: January 16, 2024
    Publication date: May 9, 2024
    Inventors: LILEI WANG, SUJUAN FENG, ALEXANDER GOLITSCHEK EDLER VON ELBWART, PRATEEK BASU MALLICK, MASAYUKI HOSHINO, JOACHIM LOEHR
  • Publication number: 20240139847
    Abstract: A brazing joint, a brazing method, and a device for promoting solder rheology and gas overflow are provided. The brazing joint includes a first base metal, a second base metal, and a brazing seam located therebetween. The brazing seam is formed by filling a solder in a gap formed by welding surfaces of the first and the second base metal and melting it to connect the first and the second base metal. The brazing seam is a concave-shaped brazing seam. The gap defines a first distance and a second distance, the first distance is located at an edge of the gap, the second distance is located at the edge or an inside of the gap, the first distance is greater than the second distance, and a curved surface is formed between the location of the first distance and the location of the second distance for transition.
    Type: Application
    Filed: December 9, 2022
    Publication date: May 2, 2024
    Applicants: CHINA ACADEMY OF MACHINERY NINGBO ACADEMY OF INTELLIGENT MACHINE TOOL CO., LTD., ZHENGZHOU RESEARCH INSTITUTE OF MECHANICAL ENGINEERING CO., LTD.
    Inventors: Weimin LONG, Xiaoguo SONG, Sujuan ZHONG, Lianhui JIA, Limei JIN, Yucan FU, Yongqiang WEI, Yuchang WANG, Guoqin HUANG, Lei ZHANG, Long FU
  • Patent number: 11597048
    Abstract: A method and system for optimal control of ultra-precision cutting. The method for optimal control is based on time-precipitates-temperature characteristics of Al—Mg—Si series aluminum alloy, and includes first determining types of precipitates of machined materials, and establishing a Lifshitz-Slyozov-Wagner (LSW) model of each precipitate. A temperature range is determined corresponding to each precipitate according to the LSW model to obtain a comprehensive temperature range. A relation model is established between cutting parameters and a cutting temperature according to the LSW model. Finally the cutting parameters are optimized according to the comprehensive temperature range and the relation model, so that the cutting temperature is beyond the comprehensive temperature range to inhibit the generation of the precipitates.
    Type: Grant
    Filed: March 10, 2020
    Date of Patent: March 7, 2023
    Assignee: Guangdong University of Technology
    Inventors: Sujuan Wang, Hailong Wang, Xin Chen, Senbin Xia
  • Publication number: 20220249563
    Abstract: Provided herein are anti-DLL3 chimeric antigen receptors (CARs), DLL3 binding proteins and uses of such CARs or DLL3 binding proteins in the treatment of DLL3 associated disorders, such as small cell lung cancer.
    Type: Application
    Filed: July 17, 2020
    Publication date: August 11, 2022
    Inventors: Tao Zhao, Yuanyuan Peng, An Tang, Sujuan Wang, Shuai Yang, Wang Zhang, Shu Wu, Ruidong Hao
  • Publication number: 20220144960
    Abstract: CD30-binding moieties, chimeric antigen receptors (CARs) having these CD30-binding moieties, and uses thereof are provided. Polynucleotides encoding the CD30-binding moieties and CARs, compositions comprising CD30-binding moieties and CARs, genetically modified immune cells having a chimeric antigen receptor for use in adoptive cell therapy for treating CD30-expressing cancer or tumor in a subject in need thereof are also provided herein.
    Type: Application
    Filed: December 26, 2019
    Publication date: May 12, 2022
    Inventors: Shuai Yang, Sujuan Wang, Chenyu Shu, Yuanyuan Peng, Chen Hu, Shu Wu
  • Publication number: 20200290170
    Abstract: A method and system for optimal control of ultra-precision cutting. The method for optimal control is based on time-precipitates-temperature characteristics of Al—Mg—Si series aluminum alloy, and includes first determining types of precipitates of machined materials, and establishing a Lifshitz-Slyozov-Wagner (LSW) model of each precipitate. A temperature range is determined corresponding to each precipitate according to the LSW model to obtain a comprehensive temperature range. A relation model is established between cutting parameters and a cutting temperature according to the LSW model. Finally the cutting parameters are optimized according to the comprehensive temperature range and the relation model, so that the cutting temperature is beyond the comprehensive temperature range to inhibit the generation of the precipitates.
    Type: Application
    Filed: March 10, 2020
    Publication date: September 17, 2020
    Inventors: Sujuan WANG, Hailong WANG, Xin CHEN, Senbin XIA
  • Patent number: 9206120
    Abstract: The present invention discloses a clean method for preparing a D,L-methionine comprising the steps of: preparing a potassium cyanide solution using a crystallized mother solution containing potassium carbonate as an absorbing liquid to absorb hydrocyanic acid, then reacting the potassium cyanide solution with 3-methylthio propionaldehyde and an ammonium bicarbonate solution at 50-150° C. for 3-15 minutes so as to obtain a 5-(?-methylthioethyl)glycolyurea solution, then bring the 5-(?-methylthioethyl)glycolyurea solution to a temperature of 140-220° C. and subjecting to a saponification reaction for 2-5 minutes, after the completion of the saponification, reducing the temperature to 0-40° C., extracting with an organic solvent, neutralizing the water phase with CO2 and crystallizing, then filtering, washing, and drying to obtain an acceptable D,L-methionine product; bring the crystallized D,L-methionine mother solution from filtration to a temperature to 110-160° C.
    Type: Grant
    Filed: January 6, 2013
    Date of Patent: December 8, 2015
    Assignees: ZHEJIANG NHU COMPANY LTD., ZHEJIANG UNIVERSITY, SHANDONG NHU AMINO ACIDS CO., LTD.
    Inventors: Zhirong Chen, Cunchao Wang, Chuqiu Zhao, Sujuan Wang, Chengfeng Zhang, Tao Long, Xinhong Liu
  • Publication number: 20150284323
    Abstract: The present invention discloses a clean method for preparing a D,L-methionine comprising the steps of: preparing a potassium cyanide solution using a crystallized mother solution containing potassium carbonate as an absorbing liquid to absorb hydrocyanic acid, then reacting the potassium cyanide solution with 3-methylthio propionaldehyde and an ammonium bicarbonate solution at 50-150° C. for 3-15 minutes so as to obtain a 5-(?-methylthioethyl)glycolyurea solution, then bring the 5-(?-methylthioethyl)glycolyurea solution to a temperature of 140-220° C. and subjecting to a saponification reaction for 2-5 minutes, after the completion of the saponification, reducing the temperature to 0-40° C., extracting with an organic solvent, neutralising the water phase with CO2 and crystallizing, then filtering, washing, and drying to obtain an acceptable D,L-methionine product; bring the crystallized D,L-methionine mother solution from filtration to a temperature to 110-160° C.
    Type: Application
    Filed: January 6, 2013
    Publication date: October 8, 2015
    Inventors: Zhirong Chen, Cunchao Wang, Chuqiu Zhao, Sujuan Wang, Chengfeng Zhang, Tao Long, Xinhong Liu