Abstract: A vapor deposition apparatus for providing a deposition film on a substrate, the vapor deposition apparatus includes a plurality of first nozzle parts which injects a first raw material toward the substrate; a plurality of second nozzle parts which is alternately disposed together with the plurality of first nozzle parts and injects a second raw material toward the substrate; a diffuser unit which distributes the second raw material to the plurality of second nozzle parts; and a supply unit which supplies the second raw material to the diffuser unit.

Abstract: A vapor deposition apparatus for providing a deposition film on a substrate, the vapor deposition apparatus includes a plurality of first nozzle parts which injects a first raw material toward the substrate; a plurality of second nozzle parts which is alternately disposed together with the plurality of first nozzle parts and injects a second raw material toward the substrate; a diffuser unit which distributes the second raw material to the plurality of second nozzle parts; and a supply unit which supplies the second raw material to the diffuser unit.

Abstract: Disclosed is an apparatus for distributing gas which is capable of uniformly injecting processing gas into a plurality of gas passages being communicated with a plurality of gas distribution holes, and an apparatus for processing substrate including the same, wherein the apparatus for distributing gas may include a body including a plurality of gas passages connected with a plurality of gas distribution holes for distributing processing gas; and at least one gas injection module connected with at least one lateral surface of the body and respectively communicated with the plurality of gas passages, wherein the gas injection module firstly buffers the processing gas supplied from the external, secondly buffers the firstly buffered processing gas, and injects the buffered processing gas into the plurality of gas passages.

Abstract: Disclosed is an apparatus for distributing gas which is capable of uniformly injecting processing gas into a plurality of gas passages being communicated with a plurality of gas distribution holes, and an apparatus for processing substrate including the same, wherein the apparatus for distributing gas may include a body including a plurality of gas passages connected with a plurality of gas distribution holes for distributing processing gas; and at least one gas injection module connected with at least one lateral surface of the body and respectively communicated with the plurality of gas passages, wherein the gas injection module firstly buffers the processing gas supplied from the external, secondly buffers the firstly buffered processing gas, and injects the buffered processing gas into the plurality of gas passages.

Abstract: Disclosed is an apparatus for distributing gas which is capable of uniformly injecting processing gas into a plurality of gas passages being communicated with a plurality of gas distribution holes, and an apparatus for processing substrate including the same, wherein the apparatus for distributing gas may include a body including a plurality of gas passages connected with a plurality of gas distribution holes for distributing processing gas; and at least one gas injection module connected with at least one lateral surface of the body and respectively communicated with the plurality of gas passages, wherein the gas injection module firstly buffers the processing gas supplied from the external, secondly buffers the firstly buffered processing gas, and injects the buffered processing gas into the plurality of gas passages.

Abstract: Firing containers for firing an electrode active material include one or more through openings, and protrusions protruding from an outer surface of sidewalls of each of the firing containers. The protrusions allow adjacent firing containers to be spaced apart from each other and guide the adjacent firing containers during alignment.

Abstract: A composite metal precursor including a composite metal hydroxide represented by Formula 1 below, wherein an amount of magnesium (Mg) in the composite metal hydroxide is less than or equal to 0.005 wt %, an electrode active material formed from the same, a positive electrode including the same, and a lithium secondary battery employing the same: (A1-x-yBxCy)(OH)2??[Formula 1] wherein in Formula 1, x, y, A, B, and C are as described in the detailed description.

Abstract: A positive active material for a rechargeable lithium battery including a lithium-nickel cobalt manganese composite metal oxide; and 0.18 to 0.25 wt % of sulfur is provided.

Abstract: A composite metal precursor including a composite metal hydroxide represented by Formula 1 below, wherein an amount of magnesium (Mg) in the composite metal hydroxide is less than or equal to 0.005 wt %, an electrode active material formed from the same, a positive electrode including the same, and a lithium secondary battery employing the same: (A1-x-yBxCy)(OH)2 ??[Formula 1] wherein in Formula 1, x, y, A, B, and C are as described in the detailed description.

Abstract: Firing containers for firing an electrode active material include one or more through openings, and protrusions protruding from an outer surface of sidewalls of each of the firing containers. The protrusions allow adjacent firing containers to be spaced apart from each other and guide the adjacent firing containers during alignment.

Abstract: A positive active material for a rechargeable lithium battery including a lithium-nickel cobalt manganese composite metal oxide; and 0.18 to 0.25 wt % of sulfur is provided.