Patents by Inventor Suk-Chang Jang

Suk-Chang Jang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ETCHING APPARATUS
    Publication number: 20110139369
    Abstract: An etching apparatus that includes a number of chambers having an opening that is opened to move in or discharge a substrate, an injection member that is installed inside each chamber to inject a chemical liquid, and an interception member that is adjacently installed at the opening of each chamber and sucks gas introduced into the opening.
    Type: Application
    Filed: December 6, 2010
    Publication date: June 16, 2011
    Applicant: SAMSUNG MOBILE DISPLAY CO., LTD.
    Inventors: Suk-Chang JANG, Chang-Soo KIM, Yun-Sik HAM
  • Composition and method for removing copper-compatible resist
    Patent number: 7671002
    Abstract: A composition for removing a copper-compatible resist includes: about 0.1% to about 10% by weight of an alkylbenzenesulfonic compound; about 10% to about 99% by weight of a glycolether compound; and about 0.5% to about 5% by weight of a corrosion inhibitor.
    Type: Grant
    Filed: May 2, 2006
    Date of Patent: March 2, 2010
    Assignee: LG Display Co., Ltd.
    Inventors: Gyoo-Chul Jo, Gee-Sung Chae, Oh-Nam Kwon, Kyoung-Mook Lee, Yong-Sup Hwang, Seong-Bae Kim, Suk-Chang Jang
  • Composition and method for removing copper-compatible resist
    Patent number: 7384900
    Abstract: A composition for removing a copper-compatible resist includes about 10 to 30% by weight of an amine compound solvent, the amine compound solvent including an alkanol amine, about 10 to 80% by weight of a glycol group solvent, about 9.5 to 80% by weight of a polar solvent, and about 0.5 to 10% by weight of a corrosion inhibitor.
    Type: Grant
    Filed: August 25, 2004
    Date of Patent: June 10, 2008
    Assignee: LG Display Co., Ltd.
    Inventors: Gyoo-Chul Jo, Gee-Sung Chae, Oh-Nam Kwon, Kyoung-Mook Lee, Yong-Sup Hwang, Seong-Bae Kim, Suk-Chang Jang, Suk-ll Yoon
  • Composition and method for removing copper-compatible resist
    Publication number: 20060217278
    Abstract: A composition for removing a copper-compatible resist includes: about 0.1% to about 10% by weight of an alkylbenzenesulfonic compound; about 10% to about 99% by weight of a glycolether compound; and about 0.5% to about 5% by weight of a corrosion inhibitor.
    Type: Application
    Filed: May 2, 2006
    Publication date: September 28, 2006
    Inventors: Gyoo-Chul Jo, Gee-Sung Chae, Oh-Nam Kwon, Kyoung-Mook Lee, Yong-Sup Hwang, Seong-Bae Kim, Suk-Chang Jang
  • Composition and method for removing copper-compatible resist
    Patent number: 7091165
    Abstract: A composition for removing a copper-compatible resist includes: about 0.1% to about 10% by weight of an alkylbenzenesulfonic compound; about 10% to about 99% by weight of a glycolether compound; and about 0.5% to about 5% by weight of a corrosion inhibitor.
    Type: Grant
    Filed: October 29, 2003
    Date of Patent: August 15, 2006
    Assignees: LG.Philips LCD Co., Ltd., Dongjin Semichem Co., Ltd.
    Inventors: Gyoo-Chul Jo, Gee-Sung Chae, Oh-Nam Kwon, Kyoung-Mook Lee, Yong-Sup Hwang, Seong-Bae Kim, Suk-Chang Jang
  • Composition and method for removing copper-compatible resist
    Publication number: 20050048397
    Abstract: A composition for removing a copper-compatible resist includes about 10 to 30% by weight of an amine compound solvent, the amine compound solvent including an alkanol amine, about 10 to 80% by weight of a glycol group solvent, about 9.5 to 80% by weight of a polar solvent, and about 0.5 to 10% by weight of a corrosion inhibitor.
    Type: Application
    Filed: August 25, 2004
    Publication date: March 3, 2005
    Inventors: Gyoo-Chul Jo, Geo-Sung Chae, Oh-Nam Kwon, Kyoung-Mook Lee, Yong-Sup Hwang, Seong-Bae Kim, Suk-Chang Jang, Suk-Il Yoon
  • Composition and method for removing copper-compatible resist
    Publication number: 20040127374
    Abstract: A composition for removing a copper-compatible resist includes: about 0.1% to about 10% by weight of an alkylbenzenesulfonic compound; about 10% to about 99% by weight of a glycolether compound; and about 0.5% to about 5% by weight of a corrosion inhibitor.
    Type: Application
    Filed: October 29, 2003
    Publication date: July 1, 2004
    Inventors: Gyoo Chul Jo, Gee-Sung Chae, Oh-Nam Kwon, Kyoung-Mook Lee, Yong-Sup Hwang, Seong-Bae Kim, Suk-Chang Jang