Abstract: Disclosed are methods of preparing a Surface Acoustic Wave (SAW) device, comprising: sequentially depositing a Cu electrode, a silicon oxide film, modifying the surface of the silicon oxide film, and then depositing a piezoelectric film, and an Al electrode on a substrate having an interdigital (IDT) electrode pattern to obtain the SAW device. In some embodiments, the Cu and Al electrodes both have IDT electrode patterns corresponding to the IDT pattern of the substrate. Because the Sezawa wave mode that is adopted is formed by coupling film thickness vibration and transverse vibration, the present invention is characterized in that a longitudinal electric field and a transverse electric field are excited through the double-layer electrodes whereby the electromechanical coupling coefficient of the SAW device can be improved by changing the coupling pattern between the electric fields and the piezoelectric film.

Abstract: A surface acoustic wave (SAW) device having a high electromechanical coupling coefficient based on double-layer electrodes and a preparation method thereof. A structure of the SAW device includes a Cu electrode, a piezoelectric film and an Al electrode on a substrate in sequence. A signal terminal of the Cu electrode is opposite to a ground terminal of the Al electrode. A ground terminal of the Cu electrode is opposite to a signal terminal of the Al electrode. Since Sezawa wave mode that is adopted is formed by coupling film thickness vibration and transverse vibration, a longitudinal electric field (in a direction of thickness of a film) and a transverse electric field (in a propagation direction of SAW) are excited through the double-layer electrodes so that the electromechanical coupling coefficient of the SAW device is improved by changing a coupling pattern between the electric fields and the piezoelectric film.