Patents by Inventor Sumant Sukdew Ramanujan OEMRAWSINGH

Sumant Sukdew Ramanujan OEMRAWSINGH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical device and associated system
    Patent number: 10712667
    Abstract: An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.
    Type: Grant
    Filed: November 16, 2017
    Date of Patent: July 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Sumant Sukdew Ramanujan Oemrawsingh, Arno Jan Bleeker, Alexander Matthijs Struycken, Engelbertus Antonius Fransiscus Van Der Pasch, Bert Pieter Van Drieënhuizen
  • An Optical Device and Associated Systems
    Publication number: 20190377267
    Abstract: An alignment system aligns a laser beam to a desired position in a reference plane and to a desired direction in the reference plane. The system diffracts the laser light into different diffraction orders that are projected onto a detection plane using different lenses. As the locations of the projections of the different diffraction orders in the detection plane respond differently to changes in position and in direction of the beam in the reference plane, the locations of the projections enable to determine how to adjust the beam so as to get the beam properly aligned. The diffraction and the projection can be implemented by a hologram.
    Type: Application
    Filed: November 16, 2017
    Publication date: December 12, 2019
    Applicant: ASML Netherlands B.V.
    Inventors: Sumant Sukdew Ramanujan OEMRAWSINGH, Arno Jan BLEEKER, Alexander Matthijs STRUYCKEN, Engelbertus Antonius Fransiscus VAN DER PASCH, Bert Pieter VAN DRIEËNHUIZEN
  • Radiation source
    Patent number: 10222702
    Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.
    Type: Grant
    Filed: January 21, 2016
    Date of Patent: March 5, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Arno Jan Bleeker, Ramon Mark Hofstra, Erik Petrus Buurman, Johannes Hubertus Josephina Moors, Alexander Matthijs Struycken, Harm-Jan Voorma, Sumant Sukdew Ramanujan Oemrawsingh, Markus Franciscus Antonius Eurlings, Peter Frans Maria Muys
  • Radiation Source
    Publication number: 20180031979
    Abstract: A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.
    Type: Application
    Filed: January 21, 2016
    Publication date: February 1, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Arno Jan BLEEKER, Ramon Mark HOFSTRA, Erik Petrus BUURMAN, Johannes Hubertus Josephina MOORS, Alexander Matthijs STRUYCKEN, Harm-Jan VOORMA, Sumant Sukdew Ramanujan OEMRAWSINGH, Markus Franciscus Antonius EURLINGS, Peter Frans Maria MUYS
  • Apparatus, a device and a device manufacturing method
    Patent number: 9778574
    Abstract: An apparatus comprising at least one sealing aperture (40) comprising a hollow part (41), having an inner surface (42), extending at an interface between different zones (50;60) of the apparatus; and a member (43) positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.
    Type: Grant
    Filed: November 4, 2014
    Date of Patent: October 3, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Sander Catharina Reinier Derks, Eric Willem Felix Casimiri, Marcel Mathijs Theodore Dierichs, Sumant Sukdew Ramanujan Oemrawsingh, Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Johannes Fransiscus Maria Velthuis, Alexander Nikolov Zdravkov, Wassim Zein Eddine
  • An Apparatus, a Device and a Device Manufacturing Method
    Publication number: 20160282723
    Abstract: An apparatus comprising at least one sealing aperture (40) comprising a hollow part (41), having an inner surface (42), extending at an interface between different zones (50;60) of the apparatus; and a member (43) positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.
    Type: Application
    Filed: November 4, 2014
    Publication date: September 29, 2016
    Applicant: ASML Nethrlands B.V.
    Inventors: Sander Catharina Reinier DERKS, Eric Willem Felix CASIMIRI, Marcel Mathijs Theodore DIERICHS, Sumant Sukdew Ramanujan OEMRAWSINGH, Wilhelmus Theodorus Anthonius VAN DEN EINDEN, Johannes Fransiscus Maria VELTHUIS, Alexander Nikolov ZDRAVKOV, Wassim ZEIN EDDINE