Patents by Inventor Sumio Nakatake

Sumio Nakatake has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200339331
    Abstract: In a film packaged body (11) formed by superimposing a pair of film molded articles (1) of the present invention, wherein the film molded article (1) in which a plurality of concave or convex embossed portions (3) disposed apart from each other are formed on a surface (2a) of a film (2), wherein the film (2) is made of a plastic material capable of adding a shape according to plastic deformation, wherein the plurality of embossed portions (3) are disposed on the surface of the film (2) to form an enclosed region (4) surrounded by the plurality of embossed portions (3) and imaginary lines (4a) that connect the plurality of embossed portions (3) is formed, and the plurality of embossed portions (3) are disposed at four areas on the surface (2a) of the film (2) to form the enclosed region (4) with rectangular shape, when an object is packaged by the film molded article (1), the plurality of embossed portions (3) and imaginary lines (4a) forming the enclosed region (4) are freely folded according to a shape or a
    Type: Application
    Filed: July 9, 2020
    Publication date: October 29, 2020
    Inventors: Hiroshi Ogawa, Mitsuhide Nogami, Sumio Nakatake
  • Publication number: 20170166373
    Abstract: In a film molded article (1) of the present invention, a plurality of concave or convex embossed portions (3) disposed apart from each other are formed on a surface (2a) of a film (2), and the plurality of embossed portions (3) are disposed on the surface of the film (2) to form an enclosed region (4) surrounded by the plurality of embossed portions (3) and imaginary lines (4a) that connect the plurality of embossed portions (3).
    Type: Application
    Filed: July 29, 2015
    Publication date: June 15, 2017
    Inventors: Hiroshi Ogawa, Mitsuhide Nogami, Sumio Nakatake
  • Patent number: 7819081
    Abstract: In a plasma film forming apparatus, two first electrodes 51 connected to a power source 4 and two grounded second electrodes 52 are arranged in the order of the second electrode 52, the first electrode 51, the first electrode 51 and the second electrode 52. A first flow passage 50a formed between the central first electrodes 51 allows a raw material gas (first gas) for being formed into a film to pass therethrough. A plasma discharge space 50b of a second flow passage formed between the first and second electrodes 51, 52 on the both sides allows an excitable gas (second gas) to pass therethrough, which excitable gas is exited by plasma such that the raw material can be formed into a film, but that the excitable gas itself is merely excited but not formed into a film. Those gases are converged at a crossing part 20c between the first and second flow passages and blown off via a common blowoff passage 25a.
    Type: Grant
    Filed: October 7, 2003
    Date of Patent: October 26, 2010
    Assignee: Sekisui Chemical Co., Ltd.
    Inventors: Shinichi Kawasaki, Sumio Nakatake, Hiroya Kitahata, Setsuo Nakajima, Yuji Eguchi, Junichiro Anzai, Yoshinori Nakano
  • Publication number: 20070123041
    Abstract: [PROBLEM TO BE SOLVED]In a surface processing apparatus for spraying a processing gas onto the surface of an object to be processed through a hole-row such as a slit, the surface of the object having a large area can effectively be processed even if the hole-row is short. [MEANS FOR SOLVING] A plurality of electrode plates 11, 12 are arranged, in side-by-side relation, on a processor 1 of a plasma surface processing apparatus M. A slit-like hole-row 10a is formed between the adjacent electrode plates, and a hole-row group 100 is constituted by the side-by-side arranged hole-rows 10a. The object W is moved along the extending direction of each slit 10a by a moving mechanism 4.
    Type: Application
    Filed: June 24, 2004
    Publication date: May 31, 2007
    Applicant: SEKISUI CHEMICAL CO., LTD.
    Inventors: Junichiro Anzai, Yoshinori Nakano, Shinichi Kawasaki, Sumio Nakatake, Satoshi Mayumi, Eiji Miyamoto, Toshimasa Takeuchi
  • Publication number: 20060096539
    Abstract: In a plasma film forming apparatus, two first electrodes 51 connected to a power source 4 and two grounded second electrodes 52 are arranged in the order of the second electrode 52, the first electrode 51, the first electrode 51 and the second electrode 52. A first flow passage 50a formed between the central first electrodes 51 allows a raw material gas (first gas) for being formed into a film to pass therethrough. A plasma discharge space 50b of a second flow passage formed between the first and second electrodes 51, 52 on the both sides allows an excitable gas (second gas) to pass therethrough, which excitable gas is exited by plasma such that the raw material can be formed into a film, but that the excitable gas itself is merely excited but not formed into a film. Those gases are converged at a crossing part 20c between the first and second flow passages and blown off via a common blowoff passage 25a.
    Type: Application
    Filed: November 10, 2005
    Publication date: May 11, 2006
    Applicant: Sekisui Chemical Co., Ltd.
    Inventors: Shinichi Kawasaki, Sumio Nakatake, Hiroya Kitahata, Setsuo Nakajima, Yuji Eguchi, Junichiro Anzai, Yoshinori Nakano
  • Publication number: 20050016457
    Abstract: In a plasma film forming apparatus, two first electrodes 51 connected to a power source 4 and two grounded second electrodes 52 are arranged in the order of the second electrode 52, the first electrode 51, the first electrode 51 and the second electrode 52. A first flow passage 50a formed between the central first electrodes 51 allows a raw material gas (first gas) for being formed into a film to pass therethrough. A plasma discharge space 50b of a second flow passage formed between the first and second electrodes 51, 52 on the both sides allows an excitable gas (second gas) to pass therethrough, which excitable gas is exited by plasma such that the raw material can be formed into a film, but that the excitable gas itself is merely excited but not formed into a film. Those gases are converged at a crossing part 20c between the first and second flow passages and blown off via a common blowoff passage 25a.
    Type: Application
    Filed: October 7, 2003
    Publication date: January 27, 2005
    Inventors: Shinichi Kawasaki, Sumio Nakatake, Hiroya Kitahata, Setsuo Nakajima, Yuji Eguchi, Junichiro Anzai, Yoshinori Nakano