Patents by Inventor Sumio Nomoto

Sumio Nomoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming patterns by plasma etching
    Patent number: 4377734
    Abstract: Ions of a metal which becomes passive under the presence of oxygen with regard to plasma etching are implanted into selected portions of the surface of a workpiece, after which the workpiece is subjected to plasma etching with a reaction gas mixed with oxygen, whereby that layer which has been rendered passive acts as a mask, and an etched pattern is formed.
    Type: Grant
    Filed: October 9, 1980
    Date of Patent: March 22, 1983
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Yoji Mashiko, Hirozo Takano, Haruhiko Abe, Sotoju Asai, Kazuo Mizuguchi, Sumio Nomoto
  • Method for forming a fine pattern of an aluminum film
    Patent number: 4314874
    Abstract: A thin aluminum film 3 is formed on the top surface of a substrate 2, 1. Selected areas of the aluminum film are irradiated by an oxygen ion beam 6 to form implanted regions 7. The surface is then plasma etched, with the oxygen ion implanted regions serving as a mask to thereby prevent the removal of the underlying areas of the aluminum film.
    Type: Grant
    Filed: September 24, 1980
    Date of Patent: February 9, 1982
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Haruhiko Abe, Yoji Mashiko, Hiroshi Harada, Sotoju Asai, Kazuo Mizuguchi, Sumio Nomoto