Patents by Inventor Sumio Sasaki
Sumio Sasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11322332Abstract: The present invention relates to an apparatus and method for analyzing the energy of backscattered electrons generated from a specimen. The apparatus includes: an electron beam source (101) for generating a primary electron beam; an electron optical system (102, 105, 112) configured to direct the primary electron beam to a specimen while focusing and deflecting the primary electron beam; and an energy analyzing system configured to detect an energy spectrum of backscattered electrons emitted from the specimen.Type: GrantFiled: March 1, 2019Date of Patent: May 3, 2022Assignee: Tasmit, Inc.Inventors: Makoto Kato, Sumio Sasaki, Yukihiro Tanaka, Yuichiro Yamazaki
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Publication number: 20210012999Abstract: The present invention relates to an apparatus and method for analyzing the energy of backscattered electrons generated from a specimen. The apparatus includes: an electron beam source (101) for generating a primary electron beam; an electron optical system (102, 105, 112) configured to direct the primary electron beam to a specimen while focusing and deflecting the primary electron beam; and an energy analyzing system configured to detect an energy spectrum of backscattered electrons emitted from the specimen.Type: ApplicationFiled: March 1, 2019Publication date: January 14, 2021Inventors: Makoto KATO, Sumio SASAKI, Yukihiro TANAKA, Yuichiro YAMAZAKI
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Patent number: 10515778Abstract: A scanning electron microscope includes: a retarding power source configured to apply a retarding voltage to a specimen; a combined objective lens configured to focus the primary beam on a surface of the specimen; an electrostatic deflection system configured to deflect the primary beam to direct the primary beam to each point in a field of view on the surface of the specimen; a first scintillation detector having a first scintillator configured to emit light upon incidence of secondary electrons which have been emitted from the specimen; a Wien filter configured to deflect the secondary electrons in one direction without deflecting the primary beam; and a second scintillation detector having a second scintillator configured to detect the secondary electrons deflected by the Wien filter. The second scintillator has a distal end located away from the axis of the primary beam.Type: GrantFiled: March 16, 2016Date of Patent: December 24, 2019Assignee: NGR INC.Inventors: Sumio Sasaki, Susumu Takashima, Makoto Kato, Kazufumi Kubota, Yukihiro Tanaka, Yuichiro Yamazaki
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Publication number: 20180330494Abstract: A method capable of accurately detecting a defect of a contact hole by using voltage contrast images is disclosed.Type: ApplicationFiled: May 4, 2018Publication date: November 15, 2018Inventors: Kazuto TANAKA, Sumio SASAKI, Yoshishige SATO
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Publication number: 20170271124Abstract: A scanning electron microscope includes: a retarding power source configured to apply a retarding voltage to a specimen; a combined objective lens configured to focus the primary beam on a surface of the specimen; an electrostatic deflection system configured to deflect the primary beam to direct the primary beam to each point in a field of view on the surface of the specimen; a first scintillation detector having a first scintillator configured to emit light upon incidence of secondary electrons which have been emitted from the specimen; a Wien filter configured to deflect the secondary electrons in one direction without deflecting the primary beam; and a second scintillation detector having a second scintillator configured to detect the secondary electrons deflected by the Wien filter. The second scintillator has a distal end located away from the axis of the primary beam.Type: ApplicationFiled: March 16, 2016Publication date: September 21, 2017Inventors: Sumio SASAKI, Susumu TAKASHIMA, Makoto KATO, Kazufumi KUBOTA, Yukihiro TANAKA, Yuichiro YAMAZAKI
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Patent number: 9039052Abstract: A mold structure used to form a molded object having an undercut portion includes a fixed mold as a first mold having a first molding surface for molding an obverse surface of the molded object; a slide core having an undercut molding surface used to mold the undercut portion as part of the obverse surface of the molded object; and a movable mold as a second mold having a second molding surface used to mold the reverse surface of the molded object. The first molding surface and the undercut molding surface form a cavity surface. A step is formed between the first molding surface and the second molding surface at a parting position between the fixed mold and the slide core on the cavity surface.Type: GrantFiled: October 18, 2010Date of Patent: May 26, 2015Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Hideyuki Seto, Shinichi Shimada, Shinichi Hanada, Akira Izumi, Sumio Sasaki
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Publication number: 20120200097Abstract: A mold structure used to form a molded object having an undercut portion includes a fixed mold as a first mold having a first molding surface for molding an obverse surface of the molded object; a slide core having an undercut molding surface used to mold the undercut portion as part of the obverse surface of the molded object; and a movable mold as a second mold having a second molding surface used to mold the reverse surface of the molded object. The first molding surface and the undercut molding surface form a cavity surface. A step is formed between the first molding surface and the second molding surface at a parting position between the fixed mold and the slide core on the cavity surface.Type: ApplicationFiled: October 18, 2010Publication date: August 9, 2012Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Hideyuki Seto, Shinichi Shimada, Shinichi Hanada, Akira Izumi, Sumio Sasaki
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Patent number: 7592604Abstract: The present invention provides a charged particle beam apparatus capable of preventing the charging-up of the specimen without using a large-scale facility. A scanning electron microscope 100 illuminates a specimen 21 with a charged particle beam via a charged particle optical system arranged in a column. According to the present invention, the scanning electron microscope 100 has a charge preventive member 110 disposed between the objective lens 14 and the specimen 21. The charge preventive member 110 has an electrically conductive portion and an opening 113 to transmit the charged particle beam. The charge preventive member 110 is formed so as to partly cover the charged particle optical system when viewed from the charged particle beam irradiation spot on the specimen. In addition, the charge preventive member 110 has gas inflow paths 114 and 115 formed therein. These gas inflow paths have gas injection outlets 116 formed to inject gas toward the charged particle beam irradiation spot on the specimen.Type: GrantFiled: December 13, 2006Date of Patent: September 22, 2009Assignee: Topcon CorporationInventors: Hirotami Koike, Shinichi Okada, Akira Higuchi, Masahiro Inoue, Masahiro Yamamoto, Sumio Sasaki
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Publication number: 20070246651Abstract: The present invention provides a charged particle beam apparatus capable of preventing the charging-up of the specimen without using a large-scale facility. A scanning electron microscope 100 illuminates a specimen 21 with a charged particle beam via a charged particle optical system arranged in a column. According to the present invention, the scanning electron microscope 100 has a charge preventive member 110 disposed between the objective lens 14 and the specimen 21. The charge preventive member 110 has an electrically conductive portion and an opening 113 to transmit the charged particle beam. The charge preventive member 110 is formed so as to partly cover the charged particle optical system when viewed from the charged particle beam irradiation spot on the specimen. In addition, the charge preventive member 110 has gas inflow paths 114 and 115 formed therein. These gas inflow paths have gas injection outlets 116 formed to inject gas toward the charged particle beam irradiation spot on the specimen.Type: ApplicationFiled: December 13, 2006Publication date: October 25, 2007Inventors: Hirotami Koike, Shinichi Okada, Akira Higuchi, Masahiro Inoue, Masahiro Yamamoto, Sumio Sasaki
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Patent number: 4851097Abstract: The present invention relates to an apparatus for repairing a pattern film of a photomask, reticle, X-ray mask, semiconductor, etc. In the apparatus, a focused ion beam is applied to an excess portion of a pattern film which is formed on a substrate. The excess portion of the pattern film is removed by means of ion sputtering. For repairing an excess portion of the pattern film, an etching gas is provided to a position that is being irradiated with the scanning focused ion beam thereby increasing the reliability of repairing and carrying out repair of the excess portion of the pattern film with good quality. Further, the removal speed of the excess portion film is improved.Type: GrantFiled: December 24, 1987Date of Patent: July 25, 1989Assignee: Seiko Instruments Inc.Inventors: Osamu Hattori, Anton Yasaka, Yoshitomo Nakagawa, Mitsuyoshi Sato, Sumio Sasaki