Patents by Inventor Sumit Subhash SINGH

Sumit Subhash SINGH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250126765
    Abstract: Exemplary semiconductor processing chambers may include a chamber body. The chambers may include a substrate support assembly disposed within the chamber body. The chambers may include a substrate support assembly having a support plate seated atop a support stem. The chambers may include a radio frequency (RF) shield seated atop the chamber body and extending about a peripheral edge of the support plate. The RF shield may include a lower annular member. The RF shield may include an upper annular member seated atop the lower annular member. The upper annular member may define a lip that protrudes radially outward from an outer surface of the upper annular member. Each of the lower annular member and the upper annular member may include a dielectric material.
    Type: Application
    Filed: October 13, 2023
    Publication date: April 17, 2025
    Applicant: Applied Materials, Inc.
    Inventors: Vellaichamy Nagappan, Viren Kalsekar, Vinay K. Prabhakar, Siva Chandrasekar, Satish Radhakrishnan, Rajath Kumar Lakkenahalli Hiriyannaiah, Dharma Ratnam Srichurnam, Sumit Subhash Singh
  • Publication number: 20250118577
    Abstract: Exemplary semiconductor processing systems may include a chamber body having a bottom plate. The systems may include a substrate support disposed within the chamber body. The substrate support may include a support plate and a shaft. The shaft may include a cooling hub that extends through the bottom plate. The shaft may include a ground shaft that is seated atop the cooling hub. The ground shaft may include a ceramic material. The systems may include an inner isolator coupled with a bottom of the support plate. The inner isolator may define an aperture therethrough that receives the shaft. The systems may include an outer isolator that is seated atop the inner isolator. Each of the inner isolator and the outer isolator may include a ceramic material.
    Type: Application
    Filed: October 10, 2023
    Publication date: April 10, 2025
    Applicant: Applied Materials, Inc.
    Inventors: Vellaichamy Nagappan, Viren Kalsekar, Vinay K. Prabhakar, Dharma Ratnam Srichurnam, Satish Radhakrishnan, Siva Chandrasekar, Sumit Subhash Singh, Pratap Chandran
  • Publication number: 20240186121
    Abstract: Exemplary choke plates for use in a substrate processing system may include a plate defining a first aperture through the plate and a second aperture through the plate. The second aperture may be laterally offset from the first aperture. The plate may include a flange that defines a purging inlet. The plate may include a rim defining a plurality of purging outlets that are fluidly coupled with the purging inlet. Each of the plurality of purging outlets may be fluidly coupled with the first aperture.
    Type: Application
    Filed: December 6, 2022
    Publication date: June 6, 2024
    Applicant: Applied Materials, Inc.
    Inventors: Vellaichamy Nagappan, Viren Kalsekar, Jeongmin Lee, Vinay K. Prabhakar, Pratap Chandran, Dharma Ratnam Srichurnam, Azhar Khan, Sumit Subhash Singh, Siva Chandrasekar, Satish Radhakrishnan
  • Publication number: 20230134061
    Abstract: Methods, systems, and computer programs are directed to the design of a new showerhead purge collar for a semiconductor manufacturing apparatus. The showerhead purge collar includes a top section and a bottom section coupled to the top section and concentric with the top section. The top section has a hollow center to conduct process gas and an inlet for a purge gas on a side of the top section. The bottom section has a hollow center to conduct the process gas towards a showerhead. A plenum to conduct the purge gas is defined within the showerhead purge collar, and the bottom section includes holes to exhaust the purge gas above the showerhead.
    Type: Application
    Filed: March 16, 2021
    Publication date: May 4, 2023
    Inventors: Bradley Taylor Streng, Sumit Subhash Singh
  • Publication number: 20230130557
    Abstract: Providing herein are methods of delivery of gas reactants to a processing chamber and related apparatus.
    Type: Application
    Filed: March 3, 2021
    Publication date: April 27, 2023
    Inventors: Krishna BIRRU, Leonard Wai Fung KHO, Anand CHANDRASHEKAR, Michael BOWES, Yong SUN, Xing ZHANG, Sumit Subhash SINGH