Patents by Inventor Sumsung Electronics Co., Ltd.

Sumsung Electronics Co., Ltd. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130136228
    Abstract: A medical imaging apparatus provided with a position recognition member, capable of achieving a precise position recognition without an additional calibration process and preventing the position recognition errors on account of a long term use of components includes an X-ray generating portion configured to generate X-rays and transmit the X-rays, an X-ray detecting portion configured to detect the X-rays transmitted from the X-ray generating portion, a moving portion provided on at least one of the X-ray generating portion and the X-ray detecting portion to move the at least one of the X-ray generating portion and the X-ray detecting portion, and a position recognition member comprising a bar code portion configured to recognize a position of the at least one of the X-ray generating portion and the X-ray detecting portion, which move along the moving portion, and a bar code reader portion to recognize the bar code portion.
    Type: Application
    Filed: November 26, 2012
    Publication date: May 30, 2013
    Applicant: Samsung Electronics Co., Ltd.
    Inventor: Sumsung Electronics Co., Ltd.
  • Publication number: 20130126880
    Abstract: A method of forming polysilicon, a thin film transistor (TFT) using the polysilicon, and a method of fabricating the TFT are disclosed. The method of forming the polysilicon comprises: forming an insulating layer on a substrate; forming a first electrode and a second electrode on the insulating layer; forming at least one heater layer on the insulating layer so as to connect the first electrode and the second electrode; forming an amorphous material layer containing silicon on the heater layer(s); forming a through-hole under the heater layer(s) by etching the insulating layer; and crystallizing the amorphous material layer into a polysilicon layer by applying a voltage between the first electrode and the second electrode so as to heat the heater layer(s).
    Type: Application
    Filed: December 13, 2012
    Publication date: May 23, 2013
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventor: Sumsung Electronics Co., Ltd.