Abstract: The present invention relates to a composition for preventing, improving, or treating diseases related to advanced glycation end products, comprising an indole derivative or a pharmaceutically acceptable salt thereof. Specifically, the composition of the present invention possesses the effect of trapping methylglyoxal (MGO), which is a main precursor of advanced glycation end products, and thus can be effectively used for preventing, improving, or treating diseases related to advanced glycation end products.

Abstract: The present invention relates to a novel indole derivative and a use thereof. The novel indole derivative according to the present invention traps methylglyoxal (MGO), which is a main precursor of advanced glycation end products, and thus can be effectively used for preventing, improving, or treating diseases related to advanced glycation end products.

Abstract: A method of forming a contact structure in a semiconductor device is provided. In this method, a semiconductor layer, an ohmic metal layer, and a barrier metal layer are formed on the surface of a semiconductor substrate on which a metal contact hole has been formed. A compound material layer having a uniform thickness is formed on the bottom, sidewalls and lower corners of the contact hole by thermally reacting the semiconductor layer with the ohmic metal layer. Accordingly, when the contact hole exposes an impurity layer and portions of an isolation layer adjacent to the impurity layer, the junction leakage current characteristics of the impurity layer and a contact resistance are improved.

Abstract: Methods of forming integrated circuit memory devices, such as DRAM memory cells, include the steps of simultaneously forming storage electrode and bit line contact regions of first conductivity type in a semiconductor region of second conductivity type. The contact regions preferably receive a double dose of first conductivity type dopants. This double dose compensates for etching damage caused during processing and improves the memory cell's refresh characteristics. The preferred methods of forming DRAM memory cells include the steps of forming an electrically insulating layer on a face of a semiconductor substrate containing a region of second conductivity type therein (e.g., P-type) extending to the face, and then forming a word line (or segment thereof) on the electrically insulating layer, opposite the region of second conductivity type.

Abstract: A method for forming an electrode for an integrated circuit device includes the steps of forming a first insulating layer on a semiconductor substrate and forming a conductive mesa on the first insulating layer. The insulating layer has a contact hole therein exposing a portion of the substrate, and the conductive mesa covers and extends into the contact hole so that the conductive mesa is electrically connected to the substrate. A second insulating layer is formed on the first insulating layer wherein the second insulating layer surrounds the conductive mesa and wherein the second insulating layer has a second thickness greater than the first thickness. Accordingly, sidewalls of the second insulating layer are exposed adjacent the conductive mesa. Spacers are formed on the conductive mesa along the sidewalls of the second insulating layer, and the conductive mesa is etched using the second insulating layer and the spacers as an etching mask.