Abstract: An image sensor includes a first active region including a first floating diffusion region, a first transistor active region, and a first isolation structure for electrically isolating the first floating diffusion region from the first transistor active region, wherein the first isolation structure comprises a first P-type doped region disposed on one corner of the first active region and a second P-type doped region disposed in a center of the first active region, the first P-typed doped region and the second P-type doped region being electrically coupled to each other.

Abstract: An image sensing device includes a semiconductor substrate, a plurality of photoelectric conversion elements supported by the semiconductor substrate, each photoelectric conversion elements configured to generate an electrical signal corresponding to incident light by performing a photoelectric conversion of the incident light, a plurality of color filters disposed over the semiconductor substrate to filter incident light to be received by the photoelectric conversion elements, each color filter configured to allow light having a specific color to pass therethrough, and a grid structure disposed between the color filters and structured to include asymmetric sidewalls that are shaped based on colors of adjacent color filters.

Abstract: An image sensor is provided to include an active region which comprises: a floating diffusion region; a transfer transistor gate region; transistor active regions; and a well-tap region. The transfer transistor gate region may have a diagonal bar shape to isolate the floating diffusion region in a first corner of the active region. The well-tap region may be positioned between the transfer transistor gate region and the transistor active regions, and isolate the transfer transistor gate region from the transistor active regions.

Abstract: An image sensing device includes a pixel array including a plurality of unit pixels consecutively arranged and structured to generate an electrical signal in response to incident light by performing photoelectric conversion of the incident light. The unit pixels are isolated from each other by first device isolation structures. Each of the unit pixels includes a photoelectric conversion element structured to generate photocharges by performing photoelectric conversion of the incident light, a floating diffusion region structured to receive the photocharges, a transfer transistor structured to transfer the photocharges generated by the photoelectric conversion element to the floating diffusion region, and a well tap region structured to apply a bias voltage to a well region. The well tap region is disposed at a center portion of a corresponding unit pixel.

Abstract: An image sensing device includes a pixel array including a plurality of unit pixels consecutively arranged and structured to generate an electrical signal in response to incident light by performing photoelectric conversion of the incident light. The unit pixels are isolated from each other by first device isolation structures. Each of the unit pixels includes a photoelectric conversion element structured to generate photocharges by performing photoelectric conversion of the incident light, a floating diffusion region structured to receive the photocharges, a transfer transistor structured to transfer the photocharges generated by the photoelectric conversion element to the floating diffusion region, and a well tap region structured to apply a bias voltage to a well region. The well tap region is disposed at a center portion of a corresponding unit pixel.

Abstract: An image sensing device is provided to include a substrate layer structured to include a plurality of photoelectric conversion that respond to incident light to generate electrons, and a plurality of floating diffusion regions coupled to the plurality of photoelectric conversion regions, respectively, and structured to store the electrons generated by the plurality of photoelectric conversion regions, respectively; a first dielectric layer disposed over the substrate layer; and a second dielectric layer disposed over the first dielectric layer, and configured to include a plurality of metal lines and a pixel transistor. The pixel transistor includes a gate electrode configured to receive a control signal for the pixel transistor; a channel region formed under the gate electrode; and an insulation layer between the gate electrode and the channel region to isolate the gate electrode and the channel region from each other, and isolate adjacent metal lines from each other.

Abstract: An image sensing device includes a semiconductor substrate, a plurality of photoelectric conversion elements supported by the semiconductor substrate, each photoelectric conversion elements configured to generate an electrical signal corresponding to incident light by performing a photoelectric conversion of the incident light, a plurality of color filters disposed over the semiconductor substrate to filter incident light to be received by the photoelectric conversion elements, each color filter configured to allow light having a specific color to pass therethrough, and a grid structure disposed between the color filters and structured to include asymmetric sidewalls that are shaped based on colors of adjacent color filters.

Abstract: An image sensing device includes a pixel array including a plurality of unit pixels consecutively arranged and structured to generate an electrical signal in response to incident light by performing photoelectric conversion of the incident light. The unit pixels are isolated from each other by first device isolation structures. Each of the unit pixels includes a photoelectric conversion element structured to generate photocharges by performing photoelectric conversion of the incident light, a floating diffusion region structured to receive the photocharges, a transfer transistor structured to transfer the photocharges generated by the photoelectric conversion element to the floating diffusion region, and a well tap region structured to apply a bias voltage to a well region. The well tap region is disposed at a center portion of a corresponding unit pixel.

Abstract: An image sensor may include a photosensing region in a substrate and configured to generate photoelectrons in response to an incident light on the photodiode region, conductive bias patterns disposed to be spaced apart from one another and surrounding the photosensing region, and pixel isolation patterns that are spaced apart from and disposed in a periphery of the conductive bias patterns.

Abstract: An image sensor is disclosed. The image sensor may include a photosensing region in a substrate and configured to generate photoelectrons in response to incident light on the photosensing region; bias patterns arranged to surround the photosensing region and including a conductive material; a floating diffusion region at a center of the photosensing region to store photoelectrons generated by the photosensing region; and transfer gates that partially overlap with the floating diffusion region and are operable to transfer photoelectrons generated by the photosensing region to the floating diffusion region. The photosensing region and the bias patterns are electrically isolated from one another.

Abstract: An image sensor is provided to include an active region which comprises: a floating diffusion region; a transfer transistor gate region; transistor active regions; and a well-tap region. The transfer transistor gate region may have a diagonal bar shape to isolate the floating diffusion region in a first corner of the active region. The well-tap region may be positioned between the transfer transistor gate region and the transistor active regions, and isolate the transfer transistor gate region from the transistor active regions.

Abstract: An image sensor includes a first active region including a first floating diffusion region, a first transistor active region, and a first isolation structure for electrically isolating the first floating diffusion region from the first transistor active region, wherein the first isolation structure comprises a first P-type doped region disposed on one corner of the first active region and a second P-type doped region disposed in a center of the first active region, the first P-typed doped region and the second P-type doped region being electrically coupled to each other.

Abstract: An image sensor is disclosed. The image sensor may include a photosensing region in a substrate and configured to generate photoelectrons in response to incident light on the photosensing region; bias patterns arranged to surround the photosensing region and including a conductive material; a floating diffusion region at a center of the photosensing region to store photoelectrons generated by the photosensing region; and transfer gates that partially overlap with the floating diffusion region and are operable to transfer photoelectrons generated by the photosensing region to the floating diffusion region. The photosensing region and the bias patterns are electrically isolated from one another.

Abstract: An image sensor may include a photosensing region in a substrate and configured to generate photoelectrons in response to an incident light on the photodiode region, conductive bias patterns disposed to be spaced apart from one another and surrounding the photosensing region, and pixel isolation patterns that are spaced apart from and disposed in a periphery of the conductive bias patterns.

Abstract: Disclosed herein is a method of preparing a highly sinterable calcium phosphate-based ceramic powder and a compact thereof. The calcium phosphate-based ceramic powder and compact thereof according to the present invention are advantageous in that they are very biocompatible and economical because they are prepared using natural materials, have nano-sized particles, and are highly sinterable, and thus can be used for bone substitute materials.