Patents by Inventor Sun-Jong Ryoo

Sun-Jong Ryoo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7442745
    Abstract: The present invention relates to an aminomethyl polystyrene resin wherein aminomethyl group is grafted only on the surface of polystyrene resin, and a preparation process for the same. More particularly, the present invention is directed to a process for preparing aminomethyl polystyrene resin wherein aminomethyl group is grafted only on the surface of polystyrene resin, which comprises a step for grafting amidomethyl group to surface of polystyrene resin and a step for hydrolysis of the amidomethyl group grafted on the surface of polystyrene resin.
    Type: Grant
    Filed: February 8, 2006
    Date of Patent: October 28, 2008
    Assignee: BeadTech Inc.
    Inventors: Yoon-Sik Lee, Sun-Jong Ryoo, Tae-Kyung Lee
  • Publication number: 20060189766
    Abstract: The present invention relates to an aminomethyl polystyrene resin wherein aminomethyl group is grafted only on the surface of polystyrene resin, and a preparation process for the same. More particularly, the present invention is directed to a process for preparing aminomethyl polystyrene resin wherein aminomethyl group is grafted only on the surface of polystyrene resin, which comprises a step for grafting amidomethyl group to surface of polystyrene resin and a step for hydrolysis of the amidomethyl group grafted on the surface of polystyrene resin.
    Type: Application
    Filed: February 8, 2006
    Publication date: August 24, 2006
    Inventors: Yoon-Sik Lee, Sun-Jong Ryoo, Tao-Kyung Lee
  • Patent number: 6875822
    Abstract: The present invention relates to a process for preparing tritylated polystyrene resin. More particularly, the present invention is directed to a process for preparing tritylated polystyrene resins, comprising a step for tritylating polystyrene by reacting polystyrene resin with benzophenone dichloride or substituted benzophenone dichloride to introduce trityl group on the benzene moiety of the polystyrene.
    Type: Grant
    Filed: November 22, 2002
    Date of Patent: April 5, 2005
    Assignee: Beadtech, Inc.
    Inventors: Sun-Jong Ryoo, Tae-kyung Lee, Ju-Han Kim
  • Publication number: 20030105243
    Abstract: The present invention relates to a process for preparing tritylated polystyrene resin. More particularly, the present invention is directed to a process for preparing tritylated polystyrene resins, comprising a step for tritylating polystyrene by reacting polystyrene resin with benzophenone dichloride or substituted benzophenone dichloride to introduce trityl group on the benzene moiety of the polystyrene.
    Type: Application
    Filed: November 22, 2002
    Publication date: June 5, 2003
    Inventors: Sun-Jong Ryoo, Tae-Kyung Lee, Ju-Han Kim