Patents by Inventor Sun Kuo Lang

Sun Kuo Lang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Diaphragm for chemical mechanical polisher
    Patent number: 6582288
    Abstract: A diaphragm for a chemical mechanical polisher is composed of a rubber layer and a fiber layer. The size and shape of the diaphragm are suitably designed according to a gap and relative shifting between the rotary unit and holder to prevent creasing of the diaphragm and thereby decrease friction with a sidewall of the rotary unit and holder. The fibrous layer can improve the strength of the diaphragm in order to improve the lifetime of the diaphragm, reduce the frequency of maintenance of the polisher, and increase throughput.
    Type: Grant
    Filed: July 13, 2001
    Date of Patent: June 24, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Pei Wei Yeh, Sun Kuo Lang
  • Diaphragm for chemical mechanical polisher
    Publication number: 20020072314
    Abstract: A diaphragm for a chemical mechanical polisher is composed of a rubber layer and a fiber layer. The size and shape of the diaphragm are suitably designed according to a gap and relative shifting between the rotary unit and holder to prevent creasing of the diaphragm and thereby decrease friction with a sidewall of the rotary unit and holder. The fibrous layer can improve the strength of the diaphragm in order to improve the lifetime of the diaphragm, reduce the frequency of maintenance of the polisher, and increase throughput.
    Type: Application
    Filed: July 13, 2001
    Publication date: June 13, 2002
    Inventors: Pei Wei Yeh, Sun Kuo Lang