Patents by Inventor Sun Kwon Lim

Sun Kwon Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Group IV metal precursors and a method of chemical vapor deposition using the same
    Patent number: 6689427
    Abstract: An organometallic precursor of a formula M(L)2 for use in formation of metal oxide thin films, in which M is a group IV metal ion having a charge of +4 and L is a tridentate ligand having a charge of −2, the ligand being represented by the following formula (I): wherein each of R1 and R2, independently, is a linear or branched C1-8 alkyl group; and R3 is a linear or branched C1-8 alkylene group. Also disclosed is a chemical vapor deposition method wherein a metal oxide thin film is formed on a substrate using the organometallic precursor. The precursor exhibits excellent volatility, thermal property and hydrolytic stability and is particularly suitable for the deposition of a multi-component metal oxide thin film containing a group IV metal such as titanium.
    Type: Grant
    Filed: August 22, 2001
    Date of Patent: February 10, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yo Sep Min, Young Jin Cho, Dae Sig Kim, Ik Mo Lee, Sun Kwon Lim, Wan In Lee, Bo Hyun Choi
  • Novel group IV metal precursors and a method of chemical vapor deposition using the same
    Publication number: 20020058843
    Abstract: An organometallic precursor of a formula M(L)2 for use in formation of metal oxide thin films, in which M is a group IV metal ion having a charge of +4 and L is a tridentate ligand having a charge of −2, the ligand being represented by the following formula (I): 1
    Type: Application
    Filed: August 22, 2001
    Publication date: May 16, 2002
    Inventors: Yo Sep Min, Young Jin Cho, Dae Sig Kim, Ik Mo Lee, Sun Kwon Lim, Wan In Lee, Bo Hyun Choi