Patents by Inventor Sun-Mi HAHM

Sun-Mi HAHM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150241774
    Abstract: A photoresist composition may include a novolak resin, a diazide-based photo-sensitizer, and a solvent. The novolak resin may be prepared by a condensation reaction of a monomer mixture including a cresol mixture, xylenol, and salicylaldehyde. Methods of manufacturing a display substrate using the photoresist composition are also provided.
    Type: Application
    Filed: October 28, 2014
    Publication date: August 27, 2015
    Inventors: Jeong-Won KIM, Jin-Ho JU, Dong-Min KIM, Seung-Ki KIM, Kwang-Woo PARK, Sun-Mi HAHM