Patents by Inventor Sun Sook Lee

Sun Sook Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11043338
    Abstract: A method of manufacturing a porous composite electrode including: preparing an ink including a carbon material and a binder; coating a substrate with the ink to manufacture a composite electrode; and irradiating the composite electrode with microwave to remove the binder and an organic material, and a method of removing an organic material of a porous composite electrode.
    Type: Grant
    Filed: November 9, 2018
    Date of Patent: June 22, 2021
    Assignee: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY
    Inventors: Sun Sook Lee, Ki-Seok An, Jongsun Lim, Sung Myung, Wooseok Song, Jin Kyu Han, Ha Kyun Jung
  • Publication number: 20190139715
    Abstract: A method of manufacturing a porous composite electrode including: preparing an ink including a carbon material and a binder; coating a substrate with the ink to manufacture a composite electrode; and irradiating the composite electrode with microwave to remove the binder and an organic material, and a method of removing an organic material of a porous composite electrode.
    Type: Application
    Filed: November 9, 2018
    Publication date: May 9, 2019
    Inventors: Sun Sook LEE, Ki-Seok AN, Jongsun LIM, Sung MYUNG, Wooseok SONG, Jin Kyu HAN, Ha Kyun JUNG
  • Publication number: 20150132488
    Abstract: The present invention relates to a graphene pattern forming method using a delamination technique employing a polymer stamp. The technique is adequate for forming a graphene pattern having a an arbitrary target pattern. According to the present invention, a portion of a graphene layer formed on a substrate is physically and selectively delaminated using the polymer stamp to simply and easily form a desired graphene pattern having a uniform line width on the substrate. Also, a portion of the graphene layer formed on the substrate is physically and selectively delaminated in a roll-to-roll manner using a rotating body stamp or by using a stamp having a large area to simply and easily form a desired graphene pattern having a uniform line width on the a substrate having a large area.
    Type: Application
    Filed: May 10, 2012
    Publication date: May 14, 2015
    Applicant: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY
    Inventors: Sun Sook Lee, Daesung Jung, Han Sun Kim, Ki-Seok An, Taek-Mo Chung, Chang Gyoun Kim, Young Kuk Lee
  • Patent number: 8030507
    Abstract: The present invention relates to novel tin amino-alkoxide complexes and a method for preparing the same, precisely novel tin amino-alkoxide complexes represented by formula 1 and useful as a precursor for tin and tin oxide thin films and a precursor for the production of nano-sized tin and tin oxide particles and a method for preparing the same. In formula 1, A is linear or branched (C2-C10) alkylene substituted or not substituted with halogen; R1 and R2 are independently linear or branched (C1-C7) alkyl substituted or not substituted with halogen.
    Type: Grant
    Filed: March 19, 2009
    Date of Patent: October 4, 2011
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Chang Gyoun Kim, Taek-Mo Chung, Young Kuk Lee, Ki-Seok An, Sun Sook Lee, Beyong Hwan Ryu, Se Jin Jang
  • Publication number: 20090275770
    Abstract: The present invention relates to novel tin amino-alkoxide complexes and a method for preparing the same, precisely novel tin amino-alkoxide complexes represented by formula 1 and useful as a precursor for tin and tin oxide thin films and a precursor for the production of nano-sized tin and tin oxide particles and a method for preparing the same. In formula 1, A is linear or branched (C2-C10) alkylene substituted or not substituted with halogen; R1 and R2 are independently linear or branched (C1-C7) alkyl substituted or not substituted with halogen.
    Type: Application
    Filed: March 19, 2009
    Publication date: November 5, 2009
    Applicant: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY
    Inventors: Chang Gyoun KIM, Taek-Mo CHUNG, Young Kuk LEE, Ki-Seok AN, Sun Sook LEE, Beyong Hwan RYU, Se Jin JANG
  • Patent number: 6982341
    Abstract: A volatile copper aminoalkoxide complex of formula (I) can form a copper thin film having an improved quality by metal organic chemical vapor deposition (MOCVD): wherein, R1, R2, R3 and R4 are each independently C1-4 alkyl optionally carrying one or more fluorine substituents; and m is an integer in the range of 1 to 3.
    Type: Grant
    Filed: March 30, 2005
    Date of Patent: January 3, 2006
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Yunsoo Kim, Chang Gyoun Kim, Taek-Mo Chung, Sun Sook Lee, Ki-Seok An, Taek Seung Yang, Hong Suk Jang