Abstract: A substrate treating apparatus includes: a chill plate; a first support part installed on the chill plate and including a first tip having a first height; and a second support part installed on the chill plate and having a height changed according to a temperature, wherein at a first temperature, a maximum height of the second support part becomes equal to or lower than a height of the first tip, such that the substrate is supported by the first tip of the first support part, and at a second temperature lower than the first temperature, the second support part becomes higher than the first tip, such that the substrate is supported by the second support part.

Abstract: There are provided a substrate treating apparatus capable of controlling the internal airflow in a space when performing heat treatment on a substrate in the corresponding space and semiconductor manufacturing equipment including the substrate treating apparatus. The substrate treating apparatus includes: a heating plate heating a substrate; a cover module covering the top of the heating plate; an intake module introducing external air into an internal space formed by the cover module; and an exhaust module discharging the air introduced into the internal space to the outside, wherein at least one of the intake module and the exhaust module controls airflow in the internal space.

Abstract: A substrate treating apparatus includes: a chill plate; a first support part installed on the chill plate and including a first tip having a first height; and a second support part installed on the chill plate and having a height changed according to a temperature, wherein at a first temperature, a maximum height of the second support part becomes equal to or lower than a height of the first tip, such that the substrate is supported by the first tip of the first support part, and at a second temperature lower than the first temperature, the second support part becomes higher than the first tip, such that the substrate is supported by the second support part.