Patents by Inventor Sun-Wen JUAN

Sun-Wen JUAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240317926
    Abstract: A zwitterionic resin is manufactured by a manufacturing method which includes the following steps. A first thermal process is performed on a first crosslinking agent and a choline having hydroxyl group or amino group to form a first mixture, in which the first crosslinking agent includes an isocyanate group. A second thermal process is performed on the first mixture, a second crosslinking agent, a chain extender, and an amino acid to form the zwitterionic resin, in which the chain extender includes a polyol.
    Type: Application
    Filed: May 30, 2024
    Publication date: September 26, 2024
    Inventors: Chen-Shou HSU, Sun-Wen JUAN, Chun-Hung LIN
  • Patent number: 12043696
    Abstract: A zwitterionic resin is manufactured by a manufacturing method which includes the following steps. A first thermal process is performed on a first crosslinking agent and a choline having hydroxyl group or amino group to form a first mixture, in which the first crosslinking agent includes an isocyanate group. A second thermal process is performed on the first mixture, a second crosslinking agent, a chain extender, and an amino acid to form the zwitterionic resin, in which the chain extender includes a polyol.
    Type: Grant
    Filed: July 1, 2022
    Date of Patent: July 23, 2024
    Assignee: TAIWAN TEXTILE RESEARCH INSTITUTE
    Inventors: Chen-Shou Hsu, Sun-Wen Juan, Chun-Hung Lin
  • Patent number: 11993674
    Abstract: A functional resin material is manufactured by the following reagents including a polyol, a polyamine, a first cross-linking agent, a second cross-linking agent, and a nanocellulose. Each of the first cross-linking agent and the second cross-linking agent includes an isocyanate block.
    Type: Grant
    Filed: September 23, 2020
    Date of Patent: May 28, 2024
    Assignee: TAIWAN TEXTILE RESEARCH INSTITUTE
    Inventors: Sun-Wen Juan, Chun-Hung Lin, Yi-Ching Sung
  • Patent number: 11746466
    Abstract: A water-repellent fabric includes a base cloth and a water-repellent resin. The water-repellent resin is disposed on the base cloth, in which a method of fabricating the water-repellent resin includes the following steps. A first thermal process is performed to mix a polyol, a cross-linking agent, and a choline to form a first mixture, in which a reaction temperature of the first thermal process is between 90° C. and 120° C. A second thermal process is performed to mix the first mixture and a water repellent to form the water-repellent resin, in which the water repellent includes a hydroxyl group, an amino group, or combinations thereof, and a reaction temperature of the second thermal process is between 120° C. and 150° C.
    Type: Grant
    Filed: January 3, 2022
    Date of Patent: September 5, 2023
    Assignee: TAIWAN TEXTILE RESEARCH INSTITUTE
    Inventors: Chen-Shou Hsu, Sun-Wen Juan, Chun-Hung Lin
  • Publication number: 20230174706
    Abstract: A zwitterionic resin is manufactured by a manufacturing method which includes the following steps. A first thermal process is performed on a first crosslinking agent and a choline having hydroxyl group or amino group to form a first mixture, in which the first crosslinking agent includes an isocyanate group. A second thermal process is performed on the first mixture, a second crosslinking agent, a chain extender, and an amino acid to form the zwitterionic resin, in which the chain extender includes a polyol.
    Type: Application
    Filed: July 1, 2022
    Publication date: June 8, 2023
    Inventors: Chen-Shou HSU, Sun-Wen JUAN, Chun-Hung LIN
  • Publication number: 20220389256
    Abstract: A digital printed fabric includes a base cloth and a digital printing ink disposed on the base cloth, and a manufacturing method for the digital printing ink includes the following steps. A first thermal process including mixing a dye, a crosslinking agent, and a polyol is performed, such that a polymer dye is formed, in which a reaction temperature of the first thermal process is between 70° C. and 90° C. A second thermal process including mixing the polymer dye and an aqueous bridging agent is performed, such that a first mixture is formed, in which a reaction temperature of the second thermal process is between 90° C. and 120° C. A third thermal process including mixing the first mixture and a chain extender is performed, such that the digital printing ink is formed, in which a reaction temperature of the third thermal process is between 120° C. and 150° C.
    Type: Application
    Filed: May 16, 2022
    Publication date: December 8, 2022
    Inventors: Sun-Wen JUAN, Chun-Hung LIN, Jung-Yu TSAI, Chia-Yi LIN
  • Patent number: 11486088
    Abstract: An anti-staining fabric includes a base cloth and an anti-staining resin. The anti-staining resin is disposed on the base cloth, in which a method of fabricating the anti-staining resin includes the following steps. A first thermal process is performed to mix a polyol, a cross-linking agent, and a choline to form a first mixture, in which a reaction temperature of the first thermal process is between 90° C. and 120° C. A second thermal process is performed to mix the first mixture and a chain extender to form the anti-staining resin, in which the chain extender includes a first reagent and a second reagent, and a reaction temperature of the second thermal process is between 120° C. and 150° C.
    Type: Grant
    Filed: January 8, 2021
    Date of Patent: November 1, 2022
    Assignee: TAIWAN TEXTILE RESEARCH INSTITUTE
    Inventors: Chen-Shou Hsu, Sun-Wen Juan, Chun-Hung Lin
  • Publication number: 20220235517
    Abstract: A water-repellent fabric includes a base cloth and a water-repellent resin. The water-repellent resin is disposed on the base cloth, in which a method of fabricating the water-repellent resin includes the following steps. A first thermal process is performed to mix a polyol, a cross-linking agent, and a choline to form a first mixture, in which a reaction temperature of the first thermal process is between 90° C. and 120° C. A second thermal process is performed to mix the first mixture and a water repellent to form the water-repellent resin, in which the water repellent includes a hydroxyl group, an amino group, or combinations thereof, and a reaction temperature of the second thermal process is between 120° C. and 150° C.
    Type: Application
    Filed: January 3, 2022
    Publication date: July 28, 2022
    Inventors: Chen-Shou HSU, Sun-Wen JUAN, Chun-Hung LIN
  • Publication number: 20220162797
    Abstract: The present disclosure provides a moisture-sensed deforming fabric which includes a base cloth and a moisture-sensed shrinking ink. The moisture-sensed shrinking ink is jetted on one of surfaces of the base cloth by a digital printing process, and the moisture-sensed shrinking ink forms a hydrophilic region on the surface of the base cloth.
    Type: Application
    Filed: June 15, 2021
    Publication date: May 26, 2022
    Inventors: Chia-Yi LIN, Sun-Wen JUAN, Jung-Yu TSAI, Chun-Hung LIN
  • Publication number: 20220162459
    Abstract: A moisture-sensed shrinking ink applied to a digital printing process for fabric has a viscosity between 2.5 cP and 10.0 cP and a surface tension between 22 dyne/cm and 32 dyne/cm, in which the moisture-sensed shrinking ink includes 15 parts by weight to 35 parts by weight of a moisture-sensed shrinking resin and 65 parts by weight to 85 parts by weight of water.
    Type: Application
    Filed: May 5, 2021
    Publication date: May 26, 2022
    Inventors: Sun-Wen JUAN, Chia-Yi LIN, Chun-Hung LIN, Jung-Yu TSAI
  • Publication number: 20220010050
    Abstract: A functional resin material is manufactured by the following reagents including a polyol, a polyamine, a first cross-linking agent, a second cross-linking agent, and a nanocellulose. Each of the first cross-linking agent and the second cross-linking agent includes an isocyanate block.
    Type: Application
    Filed: September 23, 2020
    Publication date: January 13, 2022
    Inventors: Sun-Wen JUAN, Chun-Hung LIN, Yi-Ching SUNG
  • Publication number: 20220010484
    Abstract: An anti-staining fabric includes a base cloth and an anti-staining resin. The anti-staining resin is disposed on the base cloth, in which a method of fabricating the anti-staining resin includes the following steps. A first thermal process is performed to mix a polyol, a cross-linking agent, and a choline to form a first mixture, in which a reaction temperature of the first thermal process is between 90° C. and 120° C. A second thermal process is performed to mix the first mixture and a chain extender to form the anti-staining resin, in which the chain extender includes a first reagent and a second reagent, and a reaction temperature of the second thermal process is between 120° C. and 150° C.
    Type: Application
    Filed: January 8, 2021
    Publication date: January 13, 2022
    Inventors: Chen-Shou HSU, Sun-Wen JUAN, Chun-Hung LIN