Patents by Inventor Sun Wook Jung
Sun Wook Jung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240108052Abstract: An embodiment of the present disclosure discloses tobacco material including: a center portion including a flavor material; and an outer portion including a tobacco mixture, wherein the outer portion surrounds the center portion.Type: ApplicationFiled: April 12, 2022Publication date: April 4, 2024Applicant: KT&G CORPORATIONInventors: Seok Su JANG, Sun Hwan JUNG, Hyeon Tae KIM, Jun Won SHIN, Dae Nam HAN, Yong Hwan KIM, Sung Wook YOON, Seung Won LEE
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Publication number: 20230408925Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes substrate treating apparatus comprising: a treating container having an inner space; a support unit configured to support and rotate a substrate within the inner space; an exhaust duct configured to exhaust the inner space; and at least one guide member combined with the treating container and configured to guide an airflow within the inner space, and wherein the at least one guide member is arranged such that the airflow within the inner space obliquely flows with respect to a rotation direction of the substrate supported by the support unit when seen from above.Type: ApplicationFiled: May 20, 2022Publication date: December 21, 2023Inventors: SUN WOOK JUNG, KI SANG EUM, JIN HO CHOI, BYOUNG DOO CHOI, HEE MAN AHN
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Publication number: 20230207272Abstract: An exemplary embodiment of the present invention provided an apparatus for treating a substrate. The apparatus for treating the substrate includes a process chamber having a treating space therein, a support unit for supporting the substrate in the treating space, gas supply unit for supplying treating gas to the treating space, and a microwave application unit for applying microwaves to the treating gas to generate plasma, wherein the microwave application unit includes a transmission plate disposed above the support unit to radiate the microwaves to the treating space, a first waveguide disposed above the transmission plate, and a first power supply for applying the microwaves to the first waveguide, wherein the first waveguide is provided in a ring shape.Type: ApplicationFiled: November 16, 2022Publication date: June 29, 2023Applicants: SEMES CO., LTD., PUSAN NATIONAL UNIVERSITY INDUSTRY-UNIVERSITY COOPERATION FOUNDATIONInventors: Sang Jeong LEE, Yoon Seok CHOI, Sun Wook JUNG, Ho-Jun LEE, Sang Woo KIM
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Publication number: 20230207280Abstract: Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a housing having a treatment space, in which a substrate is treated, a support unit that supports the substrate in the treatment space, a shower plate having a through-hole, through which a process gas flows to the treatment space, a plasma source that excites plasma by exciting the process gas supplied to the treatment space, and a density adjusting member that adjusts a density of the plasma generated in the treatment space by changing a dielectric permittivity, and the density adjusting member is located on the shower plate.Type: ApplicationFiled: December 28, 2022Publication date: June 29, 2023Applicant: SEMES CO., LTD.Inventors: Sun Joo PARK, Kyung Seok MIN, Hyun Jong SHIM, Sun Wook JUNG, Sang Min MUN, Ho Joong SUN
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Publication number: 20230207271Abstract: The apparatus includes a process chamber having a treating space therein, a support unit for supporting the substrate in the treating space, a gas supply unit for supplying treating gas to the treating space, and a microwave application unit for applying microwaves to the treating gas to generate plasma. The microwave application unit may include first power supply for applying a first microwave, a support plate having a groove formed on an upper surface thereof and combined with the process chamber above the support unit to define the treating space, a first transmission plate inserted into the groove to radiate the first microwave to the treating space, and a first waveguide disposed to overlap with an upper portion of the first transmission plate and coupled to the first power supply, wherein a plurality of grooves may be formed along a circumferential direction in an edge region of the support plate.Type: ApplicationFiled: November 16, 2022Publication date: June 29, 2023Applicants: SEMES CO., LTD., PUSAN NATIONAL UNIVERSITY INDUSTRY-UNIVERSITY COOPERATION FOUNDATIONInventors: Yoon Seok CHOI, Sun Wook JUNG, Jong Won PARK, Ho-Jun LEE, Min Sang PARK
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Publication number: 20230161265Abstract: Disclosed is a method of determining a process window within a process space comprising obtaining contour data relating to features to be provided to a substrate across a plurality of layers, for each of a plurality of process conditions associated with providing the features across said plurality of layers and failure mode data describing constraints on the contour data across the plurality of layers. The failure mode data is applied to the contour data to determine a failure count for each process condition; and the process window is determined by associating each process condition to its corresponding failure count. Also disclosed is a method of determining an actuation constrained subspace of the process window based on actuation constraints imposed by the plurality of actuators.Type: ApplicationFiled: January 20, 2023Publication date: May 25, 2023Applicant: ASML Netherlands B.V.Inventors: Pioter NIKOLSKI, Thomas THEEUWES, Antonio CORRADI, Duan-Fu Stephen HSU, Sun Wook JUNG
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Patent number: 11656557Abstract: An apparatus for treating a substrate includes a processing container having an inner space; a support unit having a support plate configured to support and rotate the substrate in the inner space; a liquid supply unit configured to supply treating liquid to the substrate supported by the support unit; and an exhaust unit configured to exhaust an air flow in the inner space, wherein the exhaust unit includes an air flow guide duct guiding a flow direction of an air flow flowing on the substrate to an outer side of the substrate due to a rotation of the substrate supported by the support unit, and the air flow guide duct having an inlet into which an air flow is introduced, the inlet provided at a substantially same level with the substrate supported by the support unit.Type: GrantFiled: November 22, 2021Date of Patent: May 23, 2023Assignee: SEMES CO., LTD.Inventors: Ki Sang Eum, Jung Yul Lee, Sun Wook Jung, Yang Yeol Ryu
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Publication number: 20230124184Abstract: The inventive concept provides an antenna member. In an embodiment, the antenna member includes a first coil and a second coil which have a rotational symmetry to each other, and wherein the first coil includes a first supply terminal applied with a current and a first ground terminal connected to the ground, the second coil includes a second supply terminal applied with the current and a second ground terminal connected to the ground, and wherein the first coil and the second coil each include a first portion having an arc-shape and a second portion having an arc-shape which as a whole form one winding, and when seen from a side, the second portion has a relatively lower height than the first portion, and the second portion of the second coil is positioned below the first portion of the first coil, and the second portion of the first coil is positioned below the first portion of the second coil.Type: ApplicationFiled: October 18, 2022Publication date: April 20, 2023Applicant: SEMES CO., LTD.Inventors: Yoon Seok CHOI, Yun Sang KIM, Sun Wook JUNG
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Publication number: 20230081182Abstract: The inventive concept provides a substrate treating apparatus. In an embodiment the substrate treating apparatus includes a process chamber having a treating space therein for treating a substrate; a substrate support unit configured to support the substrate in the treating space; and a microwave application unit configured to apply a microwave to the treating space, and wherein the microwave application unit comprises a microwave power generator based on a solid state device.Type: ApplicationFiled: September 7, 2022Publication date: March 16, 2023Applicant: SEMES CO., LTD.Inventors: Yoon Seok CHOI, Yun Sang KIM, Sun Wook JUNG
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Publication number: 20220165589Abstract: An apparatus for treating a substrate, the apparatus comprising: a processing container having an inner space; a support unit having a support plate configured to support and rotate the substrate in the inner space; a liquid supply unit supplying treating liquid to the substrate supported by the support unit; and an exhaust unit exhausting an air flow in the inner space, wherein the processing container includes a bottom wall and a side wall extending from the outside end of the bottom wall, the processing container including a first gas-liquid separator provided at the side wall.Type: ApplicationFiled: November 23, 2021Publication date: May 26, 2022Inventors: Ki Sang EUM, Jin Ho CHOI, Byoung Doo CHOI, Seung Han LEE, Sun Wook JUNG, Si Eun KIM
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Publication number: 20220163891Abstract: An apparatus for treating a substrate includes a treating vessel having an inner space, a support unit that supports and rotates the substrate in the inner space, and an exhaust unit that releases an air flow in the inner space. The exhaust unit includes an air-flow guide duct into which the air flow is introduced in a tangential direction with respect to a rotating direction of the substrate supported on the support unit.Type: ApplicationFiled: November 9, 2021Publication date: May 26, 2022Applicant: SEMES CO., LTD.Inventors: Ki Sang EUM, Jin Ho CHOI, Sun Wook JUNG, Byoung Doo CHOI, Hee Man AHN, Si Eun KIM
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Publication number: 20220163900Abstract: An apparatus for treating a substrate includes a processing container having an inner space; a support unit having a support plate configured to support and rotate the substrate in the inner space; a liquid supply unit configured to supply treating liquid to the substrate supported by the support unit; and an exhaust unit configured to exhaust an air flow in the inner space, wherein the exhaust unit includes an air flow guide duct guiding a flow direction of an air flow flowing on the substrate to an outer side of the substrate due to a rotation of the substrate supported by the support unit, and the air flow guide duct having an inlet into which an air flow is introduced, the inlet provided at a substantially same level with the substrate supported by the support unit.Type: ApplicationFiled: November 22, 2021Publication date: May 26, 2022Inventors: KI SANG EUM, JUNG YUL LEE, SUN WOOK JUNG, YANG YEOL RYU
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Patent number: 10153137Abstract: The inventive concepts provide a substrate treating apparatus. The substrate treating apparatus includes a process chamber in which a treatment space is provided, a support unit supporting a substrate in the process chamber, a gas supply unit supplying a gas into the process chamber, and a plasma source generating plasma from the gas. The support unit includes a support plate on which a substrate is loaded, a focus ring disposed to surround the support plate, an electric field adjusting ring disposed under the focus ring, and an actuator vertically moving the electric field adjusting ring.Type: GrantFiled: October 14, 2016Date of Patent: December 11, 2018Assignee: Semes Co., Ltd.Inventors: Seok Won Hwang, Kisang Eum, Sun Wook Jung
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Publication number: 20170110295Abstract: The inventive concepts provide a substrate treating apparatus. The substrate treating apparatus includes a process chamber in which a treatment space is provided, a support unit supporting a substrate in the process chamber, a gas supply unit supplying a gas into the process chamber, and a plasma source generating plasma from the gas. The support unit includes a support plate on which a substrate is loaded, a focus ring disposed to surround the support plate, an electric field adjusting ring disposed under the focus ring, and an actuator vertically moving the electric field adjusting ring.Type: ApplicationFiled: October 14, 2016Publication date: April 20, 2017Applicant: SEMES CO., LTD.Inventors: Seok Won HWANG, Kisang Eum, Sun Wook Jung
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Patent number: 7741667Abstract: Provided are a CMOS image sensor and a fabricating method thereof. The CMOS image sensor includes a device isolation layer, a plurality of photodiode regions, an interlayer insulating layer, a refracting layer, a planarizing layer, a color filter layer, and a plurality of microlenses. The refracting layer, with a higher refractive index than that of the interlayer insulating layer, is formed through the interlayer insulating layer on portions of the device isolation layer, to divide the interlayer insulating layer and give the divided portions thereof the characteristics of a waveguide.Type: GrantFiled: September 8, 2006Date of Patent: June 22, 2010Assignee: Dongbu Electronics Co., Ltd.Inventor: Sun Wook Jung