Abstract: A method of forming a rim type of photomask prevents a chrome pattern formed in the 0°-phase shift region of the mask substrate from being irregular and hence, ensures that the border of the 0°-phase shift region has a uniform width. First, a light blocking layer is formed on a quartz substrate. A select portion of the light blocking layer is etched to form a patterned light blocking layer, and the underlying quartz substrate is etched to a predetermined depth to form a 180°-phase shift region. Then, a fluid material layer is formed on the quartz substrate without an electron beam lithography process. The fluid material layer covers a central portion of the patterned light blocking layer and leaves an outer peripheral portion of the patterned light blocking layer exposed. Subsequently, the patterned light blocking layer is etched using the fluid material layer as a mask to form a light blocking pattern and to expose the substrate along a border adjacent the 180°-phase shift region.

Abstract: A liquid crystal display device and a driving method thereof for preventing a brightness difference between horizontal line blocks are disclosed. In the liquid crystal display device, a liquid crystal display panel has a liquid crystal cell matrix. A power supply generates a common voltage. Common lines directly on a substrate of the liquid crystal display panel are connected to a common electrode of the liquid crystal cell. A common voltage compensator compensates for the common voltage into a large resistance value with a resistance value greater than a combination of resistances of the common lines and the large resistance directly between the power supply and the common lines.

Abstract: A method of precisely inspecting the entire surface of a mask at a high speed in consideration of optical effects of the mask. The method includes designing a target mask layout for a pattern to be formed on a wafer, and extracting an effective mask layout using an inspection image measured from the target mask layout using an aerial image inspection apparatus as a mask inspection apparatus. The effective mask layout is input to a wafer simulation tool for calculating a wafer image to be formed on the wafer. Optical effects of the mask are detected by comparing the target mask layout with the effective mask layout.

Abstract: A liquid crystal display device includes a liquid crystal display panel including a plurality of data lines, a plurality of gate lines, and a plurality of liquid crystal cells, the plurality of liquid crystal cells associated to a first and second liquid crystal cell groups, a data drive circuit to supply a data voltage to the data lines in response to a polarity control signal, a gate drive circuit to supply a scan pulse to the gate lines, and a polarity control circuit to generate different polarity control signals for each frame period and to control data voltage frequencies of the first and second liquid crystal cell groups to be different from each other.

Abstract: In an attenuated phase-shift mask (PSM) and a method of forming the same, a phase-shift layer and a light-shielding layer are sequentially stacked on a transparent substrate. The phase-shift layer and the light-shielding layer are sequentially removed from the substrate, to form a light-shielding pattern including a first opening and a phase-shift pattern including a second opening that is connected to the first opening and partially exposes the transparent substrate. Then, a transmitting portion is formed through the light-shielding pattern by partially removing the light-shielding pattern. The transmitting portion includes at least one portion of the phase-shift pattern on which a transmittance controller is formed. In one embodiment, the transmittance controller comprises a metal having a high absorption coefficient, and is formed through sputtering and diffusion processes.

Abstract: A liquid crystal display device including a liquid crystal panel, a first printed circuit board attached to one side of the liquid crystal panel and including a mounted drive circuit configured to drive the liquid crystal display panel, a second printed circuit board including a mounted timing controller configured to supply a predetermined control signal and a predetermined data signal to the drive circuit and a mounted power supplying section configured to supply a predetermined voltage to the drive circuit, a flexible circuit board configured to supply the predetermined control signal, the predetermined data signal, and the predetermined voltage supplied from the second printed circuit board to the first printed circuit board, and a memory device mounted to the second printed circuit board.

Abstract: A liquid crystal display device includes a liquid crystal panel, including multiple pixels, and a driving circuit. The pixels are driven according to a first driving pattern. The driving circuit monitors the liquid crystal panel for a cross-talk condition. The driving circuit generates a signal and changes the driving pattern to an alternate driving pattern when a cross-talk condition is detected in the liquid crystal panel.

Abstract: Provided are an interleaving apparatus and method in a communication system. The interleaving apparatus includes a determiner for determining whether a next index k to be generated is an index to be discarded, and if the next index k is the index to be discarded, generating a skip signal; an index generator responding to a clock to increase the next index k by “1” and output the increased index k, and if the skip signal is detected, increasing the index k by “2” and outputting the increased index k; and an address generator performing a predetermined operation using the index k generated by the index generator to generate an address required for interleaving. Thus, a number of clocks required for interleaving and/or deinterleaving can be reduced.

Abstract: A method of forming a rim type of photomask prevents a chrome pattern formed in the 0°-phase shift region of the mask substrate from being irregular and hence, ensures that the border of the 0°-phase shift region has a uniform width. First, a light blocking layer is formed on a quartz substrate. A select portion of the light blocking layer is etched to form a patterned light blocking layer, and the underlying quartz substrate is etched to a predetermined depth to form a 180°-phase shift region. Then, a fluid material layer is formed on the quartz substrate without an electron beam lithography process. The fluid material layer covers a central portion of the patterned light blocking layer and leaves an outer peripheral portion of the patterned light blocking layer exposed. Subsequently, the patterned light blocking layer is etched using the fluid material layer as a mask to form a light blocking pattern and to expose the substrate along a border adjacent the 180°-phase shift region.