Patents by Inventor Sunao Matsubara

Sunao Matsubara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6478977
    Abstract: The present invention relates to a polishing method using a grindstone comprising abrasive grains and a bonding resin for bonding the abrasive grains, as well as to a polishing apparatus to be used for the polishing method. By using a resin for bonding abrasive grains, it is possible to obtain a grindstone having a desired modulus of elasticity. With such a grindstone, the surface of a substrate having concave and convex portions can be rendered uniformly flat, irrespective of the size of the concave and convex portions. Further, by first polishing the substrate surface with a polishing tool of a small elastic modulus and thereafter polishing it with a polishing tool of a large elastic modulus, it is possible to obtain a polished surface of reduced damage. The method of the invention is effective in planarizing various substrate surfaces having concave and convex portions.
    Type: Grant
    Filed: February 8, 2000
    Date of Patent: November 12, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Shigeo Moriyama, Katsuhiko Yamaguchi, Yoshio Homma, Sunao Matsubara, Yoshihiro Ishida, Ryousei Kawa-ai
  • Patent number: 6180020
    Abstract: The present invention relates to a polishing method using a grindstone comprising abrasive grains and a bonding resin for bonding the abrasive grains, as well as to a polishing apparatus to be used for the polishing method. By using a resin for bonding abrasive grains, it is possible to obtain a grindstone having a desired modulus of elasticity. With such a grindstone, the surface of a substrate having concave and convex portions can be rendered uniformly flat, irrespective of the size of the concave and convex portions. Further, by first polishing the substrate surface with a polishing tool of a small elastic modulus and thereafter polishing it with a polishing tool of a large elastic modulus, it is possible to obtain a polished surface of reduced damage. The method of the invention is effective in planarizing various substrate surfaces having concave and convex portions.
    Type: Grant
    Filed: March 12, 1998
    Date of Patent: January 30, 2001
    Assignee: Hitachi, Ltd.
    Inventors: Shigeo Moriyama, Katsuhiko Yamaguchi, Yoshio Homma, Sunao Matsubara, Yoshihiro Ishida, Ryousei Kawa-ai
  • Patent number: 5815396
    Abstract: The present invention relates to vacuum processing equipment for processing a wafer in a vacuum, and film coating or forming equipment and method for forming a film on a wafer wherein radiation measurement and temperature control of the wafer is carried out by using an infrared radiation thermometer. Based upon the radiation measurement, heating and/or cooling of the wafer during processing is carried out.
    Type: Grant
    Filed: May 9, 1995
    Date of Patent: September 29, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Hideaki Shimamura, Yuji Yoneoka, Shigeru Kobayashi, Satosi Kisimoto, Sunao Matsubara, Hiroyuki Shida, Yukio Tanigaki, Masashi Yamamoto, Susumu Tsuzuku, Eisuke Nishitani, Tokio Kato, Akira Okamoto
  • Patent number: 5707500
    Abstract: The present invention relates to vacuum processing equipment for processing a wafer in a vacuum, and film coating or forming equipment and method for forming a film on a wafer wherein radiation measurement and temperature control of the wafer is carried out by using an infrared radiation thermometer. Based upon the radiation measurement, heating and/or cooling of the wafer during processing is carried out.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: January 13, 1998
    Assignee: Hitachi, Ltd
    Inventors: Hideaki Shimamura, Yuji Yoneoka, Shigeru Kobayashi, Satosi Kisimoto, Sunao Matsubara, Hiroyuki Shida, Yukio Tanigaki, Masashi Yamamoto, Susumu Tsuzuku, Eisuke Nishitani, Tokio Kato, Akira Okamoto
  • Patent number: 4721535
    Abstract: A solar cell including at least a thin film formed of an amorphous silicon material and having p-type conductivity. The thin film comprises a multi-layer structure including at least one non-doped layer formed of a material of an amorphous silicon material and having a thickness of 10 to 300 .ANG. and at least one p-type doped amorphous silicon layer of a given thickness. The p-type doped amorphous silicon layer is stacked such that at least one face thereof is in contact with said at least one non-doped layer of amorphous silicon material so that the thin film of multi-layer structure exhibits in effect p-type conductivity.
    Type: Grant
    Filed: August 4, 1986
    Date of Patent: January 26, 1988
    Assignee: Director-General of the Agency of Industrial Science & Technology
    Inventors: Haruo Itoh, Toshikazu Shimada, Shin-ichi Muramatsu, Sunao Matsubara, Nobuo Nakamura
  • Patent number: 4642412
    Abstract: A plurality of photovoltaic devices (e.g., solar cells) connect with each other and form a photo-electric conversion apparatus. The photovoltaic devices concerned are so connected with each other that when a given pattern of light is irradiated upon the photo-electric conversion apparatus concerned, the electrical output generated when the whole of it is irradiated is smaller than that generated when some parts of it are irradiated. Since an electronic system equipped with this apparatus as a power supply can be designed to work when the apparatus is irradiated with such a pattern of light that irradiates only a part of the apparatus, an electronic system having such an identifying faculty can be made easily.Further, an apparatus like this type may be made by connecting the elements of this apparatus in series or in reverse direction to form units, and by connecting this plurality of units in series and/or in parallel.
    Type: Grant
    Filed: July 29, 1985
    Date of Patent: February 10, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Shinichi Muramatsu, Toshikazu Shimada, Sunao Matsubara, Haruo Itoh, Nobuo Nakamura