Patents by Inventor SUNG AN DO

SUNG AN DO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220128905
    Abstract: Photoresist compositions improving the quality of a photoresist pattern, methods for forming a pattern using the same, and methods for fabricating a semiconductor device using the same are provided. The photoresist composition includes a photosensitive resin, a photoacid generator, a photoacid-labile additive comprising a structure of Formula 1-1, and optionally a solvent: Ar2—Y-PG2??[Formula 1-1] wherein Ar1 is a substituted or unsubstituted aromatic ring, Y is an ester group, an oxycarbonyl group, an acetal group, an amide group, or a thioester group, and PG2 is a substituted or unsubstituted secondary alkyl group, a substituted or unsubstituted tertiary alkyl group, a substituted or unsubstituted alkoxyalkyl group, a substituted or unsubstituted alkoxy group, or a substituted or unsubstituted alkyloxycarbonyl group.
    Type: Application
    Filed: August 18, 2021
    Publication date: April 28, 2022
    Inventors: SUK KOO HONG, SUNG AN DO, HONG JOON LEE, SEUNG CHUL KWON, JONG HOON KIM, SIN HAE DO, JUNG MIN LEE, EUN SHOO HAN