Patents by Inventor Sung-Beom Jung
Sung-Beom Jung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11621184Abstract: A laser marking device includes a laser emission unit configured to emit a laser beam to a first surface of an object to be processed, and a pressing unit configured to press a second surface that is opposite to the first surface of the object to be processed to make the first surface of the object to be flat. The pressing unit includes a first pressing portion configured to press an edge area of the second surface in a contact manner, and at least one second pressing portion configured to press a middle area of the second surface in a non-contact manner to maintain a separation distance from the second surface within a certain distance.Type: GrantFiled: October 30, 2020Date of Patent: April 4, 2023Assignee: EO TECHNICS CO., LTD.Inventors: Sung Beom Jung, Jea Ho Moon, Soo Young Kim, Doo Seok Lee
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Publication number: 20210050239Abstract: A laser marking device includes a laser emission unit configured to emit a laser beam to a first surface of an object to be processed, and a pressing unit configured to press a second surface that is opposite to the first surface of the object to be processed to make the first surface of the object to be flat. The pressing unit includes a first pressing portion configured to press an edge area of the second surface in a contact manner, and at least one second pressing portion configured to press a middle area of the second surface in a non-contact manner to maintain a separation distance from the second surface within a certain distance.Type: ApplicationFiled: October 30, 2020Publication date: February 18, 2021Applicant: EO TECHNICS CO., LTD.Inventors: Sung Beom JUNG, Jea Ho MOON, Soo Young KIM, Doo Seok LEE
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Patent number: 10867828Abstract: Provided is an apparatus and method for correcting a marking position, in which, by measuring and correcting a marking position by using a processing film for position correction, marking may be accurately performed on a position on a semiconductor chip during a marking operation, before a marking operation is performed on semiconductor chips provided on a wafer. The apparatus for correcting a marking position of a wafer includes a support configured to support a processing film for position correction, a laser head configured to emit a laser beam to the processing film for position correction to form a pattern, a vision camera configured to obtain pattern position information, a movable table configured to move the support in a horizontal direction, and a controller configured to compare and match the pattern position information and marking position information set in the laser head.Type: GrantFiled: April 27, 2016Date of Patent: December 15, 2020Assignee: EO TECHNICS CO., LTD.Inventors: Sang Chul Choi, Soo Young Kim, Sun Youp Lee, Sung Beom Jung, Seung Kwan Choi
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Patent number: 10861725Abstract: A laser marking device includes a laser emission unit configured to emit a laser beam to a first surface of an object to be processed, and a pressing unit configured to press a second surface that is opposite to the first surface of the object to be processed to make the first surface of the object to be flat. The pressing unit includes a first pressing portion configured to press an edge area of the second surface in a contact manner, and at least one second pressing portion configured to press a middle area of the second surface in a non-contact manner to maintain a separation distance from the second surface within a certain distance.Type: GrantFiled: April 27, 2016Date of Patent: December 8, 2020Assignee: EO TECHNICS CO., LTD.Inventors: Sung Beom Jung, Jea Ho Moon, Soo Young Kim, Doo Seok Lee
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Publication number: 20200211875Abstract: A laser marking device includes a laser emission unit configured to emit a laser beam to a first surface of an object to be processed, and a pressing unit configured to press a second surface that is opposite to the first surface of the object to be processed to make the first surface of the object to be flat. The pressing unit includes a first pressing portion configured to press an edge area of the second surface in a contact manner, and at least one second pressing portion configured to press a middle area of the second surface in a non-contact manner to maintain a separation distance from the second surface within a certain distance.Type: ApplicationFiled: April 27, 2016Publication date: July 2, 2020Applicant: EO TECHNICS CO., LTD.Inventors: Sung Beom JUNG, Jea Ho MOON, Soo Young KIM, Doo Seok LEE
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Publication number: 20190259645Abstract: Provided is an apparatus and method for correcting a marking position, in which, by measuring and correcting a marking position by using a processing film for position correction, marking may be accurately performed on a position on a semiconductor chip during a marking operation, before a marking operation is performed on semiconductor chips provided on a wafer. The apparatus for correcting a marking position of a wafer includes a support configured to support a processing film for position correction, a laser head configured to emit a laser beam to the processing film for position correction to form a pattern, a vision camera configured to obtain pattern position information, a movable table configured to move the support in a horizontal direction, and a controller configured to compare and match the pattern position information and marking position information set in the laser head.Type: ApplicationFiled: April 27, 2016Publication date: August 22, 2019Applicant: EO TECHNICS CO., LTD.Inventors: Sang Chul CHOI, Soo Young KIM, Sun Youp LEE, Sung Beom JUNG, Seung Kwan CHOI
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Patent number: 10304778Abstract: Disclosed is a wafer marking method using a laser for marking a wafer having processing tape attached thereto. The disclosed laser marking method comprises the steps of: penetrating a 532-nm wavelength laser beam through the processing tape attached to one side of the wafer; and performing marking on the one side of the wafer by moving the 532-nm wavelength laser beam at a predetermined velocity, wherein the 532-nm wavelength laser beam has a frequency of 8 kHz to 40 kHz, and an output power of 0.8 W to 2 W.Type: GrantFiled: August 11, 2014Date of Patent: May 28, 2019Assignee: EO TECHNICS CO., LTDInventors: Chun Hoe Gu, Soo Young Kim, Sung Beom Jung
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Patent number: 10290525Abstract: Disclosed is a method for marking, by using a laser marker, a plurality of wafer dice divided by a wafer dicing process. The disclosed marking method for wafer dice comprises the steps of: setting a plurality of scan regions having a mutually overlapping portion on a wafer including the wafer dice; scanning the scan regions of the wafer a plurality of times by using a line scan camera; collecting position information of each of wafer dice located in regions in which the scan regions do not overlap; collecting, through image synthesis, position information of each of wafer dice located in regions in which the scan regions overlap; and marking, by using the laser marker, each of all the wafer dice of which the position information has been collected.Type: GrantFiled: July 1, 2014Date of Patent: May 14, 2019Assignee: EO TECHNICS CO., LTD.Inventors: Sun Jung Kim, Jae Man Choi, Sung Beom Jung, Jung Jin Seo
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Publication number: 20170200680Abstract: Disclosed is a wafer marking method using a laser for marking a wafer having processing tape attached thereto. The disclosed laser marking method comprises the steps of: penetrating a 532-nm wavelength laser beam through the processing tape attached to one side of the wafer; and performing marking on the one side of the wafer by moving the 532-nm wavelength laser beam at a predetermined velocity, wherein the 532-nm wavelength laser beam has a frequency of 8 kHz to 40 kHz, and an output power of 0.8 W to 2 W.Type: ApplicationFiled: August 11, 2014Publication date: July 13, 2017Applicant: EO TECHNICS CO., LTD.Inventors: Chun Hoe GU, Soo Young KIM, Sung Beom JUNG
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Publication number: 20170162410Abstract: Disclosed is a method for marking, by using a laser marker, a plurality of wafer dice divided by a wafer dicing process. The disclosed marking method for wafer dice comprises the steps of: setting a plurality of scan regions having a mutually overlapping portion on a wafer including the wafer dice; scanning the scan regions of the wafer a plurality of times by using a line scan camera; collecting position information of each of wafer dice located in regions in which the scan regions do not overlap; collecting, through image synthesis, position information of each of wafer dice located in regions in which the scan regions overlap; and marking, by using the laser marker, each of all the wafer dice of which the position information has been collected.Type: ApplicationFiled: July 1, 2014Publication date: June 8, 2017Applicant: EO TECHNICS CO., LTD.Inventors: Sun Jung KIM, Jae Man CHOI, Sung Beom JUNG, Jung Jin SEO
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Patent number: 8275389Abstract: An apparatus and method for determining operation of location update in a broadband wireless communication system are provided. The apparatus includes a receiver, an interpreter, and a determiner. In an idle mode, the receiver receives a paging advertisement message from a Base Station (BS). The interpreter identifies paging group identification information included in the paging advertisement message. The determiner determines one of execution and non-execution of a location update process due to a change of a paging group if the paging group identification information is different from paging group identification information included in a previously received paging advertisement message.Type: GrantFiled: December 17, 2008Date of Patent: September 25, 2012Assignee: Samsung Electronics Co., Ltd.Inventors: Sung-Beom Jung, Jae-Yeong Kwon, Soo-Yeul Oh, Pyeong-Hwan Wee, Sang-Jun Lee, Young-Hak Choi, Sang-Ho Lee
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Publication number: 20090156236Abstract: An apparatus and method for determining operation of location update in a broadband wireless communication system are provided. The apparatus includes a receiver, an interpreter, and a determiner. In an idle mode, the receiver receives a paging advertisement message from a Base Station (BS). The interpreter identifies paging group identification information included in the paging advertisement message. The determiner determines one of execution and non-execution of a location update process due to a change of a paging group if the paging group identification information is different from paging group identification information included in a previously received paging advertisement message.Type: ApplicationFiled: December 17, 2008Publication date: June 18, 2009Applicant: SAMSUNG ELECTRONICS CO. LTD.Inventors: Sung-Beom JUNG, Jae-Yeong KWON, Soo-Yeul OH, Pyeong-Hwan WEE, Sang-Jun LEE, Young-Hak CHOI, Sang-Ho LEE