Patents by Inventor Sung-Cheng Lin

Sung-Cheng Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11955370
    Abstract: A system and methods of forming a dielectric material within a trench are described herein. In an embodiment of the method, the method includes introducing a first precursor into a trench of a dielectric layer, such that portions of the first precursor react with the dielectric layer and attach on sidewalls of the trench. The method further includes partially etching portions of the first precursor on the sidewalls of the trench to expose upper portions of the sidewalls of the trench. The method further includes introducing a second precursor into the trench, such that portions of the second precursor react with the remaining portions of the first precursor to form the dielectric material at the bottom of the trench.
    Type: Grant
    Filed: September 18, 2020
    Date of Patent: April 9, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Bo-Cyuan Lu, Ting-Gang Chen, Sung-En Lin, Chunyao Wang, Yung-Cheng Lu, Chi On Chui, Tai-Chun Huang, Chieh-Ping Wang
  • Publication number: 20240087947
    Abstract: A semiconductor device and method of manufacture are provided. In some embodiments isolation regions are formed by modifying a dielectric material of a dielectric layer such that a first portion of the dielectric layer is more readily removed by an etching process than a second portion of the dielectric layer. The modifying of the dielectric material facilitates subsequent processing steps that allow for the tuning of a profile of the isolation regions to a desired geometry based on the different material properties of the modified dielectric material.
    Type: Application
    Filed: January 10, 2023
    Publication date: March 14, 2024
    Inventors: Chung-Ting Ko, Yu-Cheng Shiau, Li-Jung Kuo, Sung-En Lin, Kuo-Chin Liu
  • Publication number: 20240085614
    Abstract: An anti-peep light source module includes a light source module and a viewing angle switching module. The light source module has a light source and a light guide plate (LGP) and has light emitting elements arranged along a first direction. The viewing angle switching module is located on a transmission path of an illumination beam of the light source module and includes a viewing angle limiting element and a viewing angle adjusting element configured to change a viewing angle of the illumination beam. The viewing angle limiting element has a grating structure and is located between the viewing angle adjusting element and the light source module. an included angle between an extension direction of the grating structure and the first direction is within a range from 88 degrees to 92 degrees. The anti-peep light source module and A display device achieve favorable optical performance, user experience, and production yield.
    Type: Application
    Filed: September 8, 2023
    Publication date: March 14, 2024
    Applicant: Coretronic Corporation
    Inventors: Yi-Cheng Lin, Chih-Hsuan Kuo, Sung-Chun Hsu, Ming-Hsiung Fan, Tzeng-Ke Shiau
  • Patent number: D586816
    Type: Grant
    Filed: October 29, 2007
    Date of Patent: February 17, 2009
    Assignee: Top Victory Investments Ltd.
    Inventors: Chih-Hui Shen, Sung-Cheng Lin