Patents by Inventor Sung-eun Hong

Sung-eun Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220285426
    Abstract: A display device includes alignment electrodes spaced apart from each other, first and second light emitting elements between the alignment electrodes, a first pixel electrode electrically connected to first end portions of the first light emitting elements, a second pixel electrode electrically connected to second end portions of the first light emitting elements, a third pixel electrode electrically connected to the second pixel electrode and to first end portions of the second light emitting elements, a fourth pixel electrode electrically connected to second end portions of the second light emitting elements, and an insulating layer between the first pixel electrode and the second pixel electrode, wherein the insulating layer includes at least one opening exposing the second end portions of the first and second light emitting elements.
    Type: Application
    Filed: October 27, 2021
    Publication date: September 8, 2022
    Inventors: Hyun Wook LEE, Veidhes BASRUR, Myung Seok KWON, Ji Hyun MIN, Sung Won JO, Jung Eun HONG
  • Publication number: 20220281805
    Abstract: A lobamide compound according to an embodiment of the present disclosure is represented by Formula 1. The lobamide compound has excellent PTP-1B inhibitory activity that is far higher than that of conventional lobaric acid derivatives and which can be orally administered, and thus is very effective in the prevention or treatment of diabetes or obesity through oral administration.
    Type: Application
    Filed: August 14, 2020
    Publication date: September 8, 2022
    Inventors: Joung Han YIM, Il Chan KIM, Se Jong HAN, Tai Kyoung KIM, Dong Gyu JO, Hyun Cheol OH, Ha Ju PARK, Seul Ki MIN, Sung Jin KIM, Pil Sung KANG, Min Ju KIM, Jung Eun KIM, Kyung Hee KIM, Ju Mi HONG
  • Publication number: 20220276533
    Abstract: A backlight unit includes a substrate comprising a first area having light source blocks and a second area having light source blocks, and a light source driver disposed on at least one side of the substrate and electrically connected to the light source blocks of each of the first and second areas through each of first and second sensing lines. The first sensing lines electrically connected to the light source blocks of the first area have a first resistance value, and the second sensing lines electrically connected to the light source blocks of the second area have a second resistance value.
    Type: Application
    Filed: April 7, 2020
    Publication date: September 1, 2022
    Applicant: Samsung Display Co., LTD.
    Inventors: Dae Sik LEE, Sung Chul HONG, Jun Pyo LEE, Ji Eun LEE, Song Yi HAN
  • Patent number: 11411636
    Abstract: Provided is an apparatus and method for wideband short-range wireless communication using a directional antenna in a millimeter wave band, and the method for wideband short-range wireless communication according to an embodiment may determine a first time interval and a second time interval for a cooperated data frame transfer based on a packet transmission time at each transmission from a source node to a destination node, transmit a frame to a relay node through an antenna pattern directed towards the relay node at a start point of the first time interval, and transmit the frame to the destination node through an antenna pattern directed towards the destination node after a predetermined period of time from a start point of the second time interval.
    Type: Grant
    Filed: September 15, 2020
    Date of Patent: August 9, 2022
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Kap Seok Chang, Hyoung Jin Kwon, Sung Geun Jin, Yong Sun Kim, Seung Eun Hong, Woo Yong Lee, Hyun Kyu Chung
  • Publication number: 20220204492
    Abstract: The present invention provides a novel compound represented by Chemical Formula 1 or a salt thereof and a pharmaceutical composition for treating lung cancer containing same. A pyrimidine derivative compound represented by Chemical Formula 1 effectively inhibits the growth of cancer cells with an ALK mutation and an EGFR mutation, thereby being effectively usable in the treatment of lung cancer.
    Type: Application
    Filed: October 8, 2020
    Publication date: June 30, 2022
    Applicant: ONCOBIX CO., LTD.
    Inventors: Sung-Eun KIM, Sunho LEE, Rengasamy RAJESH, Yong Hyub LEE, Sung Tak HONG
  • Publication number: 20210251876
    Abstract: A UV protection cosmetic composition is provided. The composition may include an organic UV protection agent, a thickening agent, a silicone elastomer, ethanol and oil.
    Type: Application
    Filed: October 29, 2019
    Publication date: August 19, 2021
    Inventors: Jin Young KIM, Su Bin CHOI, Kyoung Jin KIM, Sung Eun HONG, Sung Bong KYE
  • Patent number: 7887772
    Abstract: The present invention discloses an ultrafine graphitic carbon fiber and a preparation method thereof. An ultrafine fiber having a diameter of 1 to 3000 nm is prepared by electrospinning a halogenated polymer solution containing a metal compound inducing graphitization. In carbonization, an ultrafine porous graphitic carbon fiber having a large specific surface area, micropores and macropores is prepared by the graphitization by a metal catalyst generated from the metal compound. The ultrafine carbon fiber can be used as a carbon material for storing hydrogen, an adsorbing material of biochemically noxious substances, an electrode material of a supercapacitor, a secondary cell and a fuel cell, and a catalyst carrier material.
    Type: Grant
    Filed: December 1, 2006
    Date of Patent: February 15, 2011
    Assignee: Korea Institute of Science and Technology
    Inventors: Seong-Mu Jo, Dong-Young Kim, Byung-Doo Chin, Sung-Eun Hong
  • Publication number: 20100324330
    Abstract: The composition for preventing development-defects containing (1) an ammonium salt, a tetraalkylammonium salt or a C1 to C4 alkanolamine salt of C4 to C15 perfluoroalkylcarboxylic acid, C4 to C10 perfluoroalkylsulfonic acid and perfluoroadipic acid, or (2) a fluorinated alkyl quaternary ammonium salt of inorganic acid, wherein said surfactant is formed at the equivalent ratio of acid to base of 1:1-1:3 is applied on a chemically amplified photoresist coating on a substrate having a diameter of 8 inches or more. The chemically amplified photoresist coating is baked before and/or after applying the composition for preventing development-defects described above. Then, the baked coating with the development-defect preventing composition coating is exposed to light, post-exposure-baked, and developed.
    Type: Application
    Filed: August 10, 2010
    Publication date: December 23, 2010
    Inventors: Yasushi Akiyama, Yusuke Takano, Kiyohisa Takahashi, Sung-Eun Hong, Tetsuo Okayasu
  • Patent number: 7799513
    Abstract: The composition for preventing development-defects containing (1) an ammonium salt, a tetraalkylammonium salt or a C1 to C4 alkanolamine salt of C4 to C15 perfluoroalkylcarboxylic acid, C4 to C10 perfluoroalkylsulfonic acid and perfluoroadipic acid, or (2) a fluorinated alkyl quaternary ammonium salt of inorganic acid, wherein said surfactant is formed at the equivalent ratio of acid to base of 1:1-1:3 is applied on a chemically amplified photoresist coating on a substrate having a diameter of 8 inches or more. The chemically amplified photoresist coating is baked before and/or after applying the composition for preventing development-defects described above. Then, the baked coating with the development-defect preventing composition coating is exposed to light, post-exposure-baked, and developed.
    Type: Grant
    Filed: June 10, 2003
    Date of Patent: September 21, 2010
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Yasushi Akiyama, Yusuke Takano, Kiyohisa Takahashi, Sung-Eun Hong, Tetsuo Okayasu
  • Patent number: 7745077
    Abstract: The present invention relates to an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit with an alkylamino group, where the unit has a structure (1), where, R1 to R5 are independently selected from hydrogen and C1 to C6 alkyl, and W is C1 to C6 alkyl. The invention also relates to a process for imaging a photoresist layer using the present composition.
    Type: Grant
    Filed: June 18, 2008
    Date of Patent: June 29, 2010
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Muthiah Thiyagarajan, Yi Cao, Sung Eun Hong, Ralph R. Dammel
  • Patent number: 7745093
    Abstract: In the present invention, in a water soluble resin composition for use in a method for pattern formation in which a covering layer is provided on a resist pattern formed of a radiation-sensitive resin composition capable of coping with ArF exposure to increase the width of the resist pattern and thus to realize effective formation of higher density trench or hole pattern, the size reduction level of the resist pattern layer can be further increased as compared with that in the prior art technique, and, in addition, the size reduction level dependency of the coarse-and-fine resist pattern can be reduced. A method for pattern formation using the water soluble resin composition is also provided. The water soluble resin composition which is usable for the method for pattern formation applicable to ArF excimer laser irradiation comprises a water soluble resin, an acid generating agent capable of generating an acid upon heating, a surfactant, a crosslinking agent, and a water-containing solvent.
    Type: Grant
    Filed: April 8, 2005
    Date of Patent: June 29, 2010
    Inventors: Takeshi Nishibe, Sung Eun Hong, Yusuke Takano, Tetsuo Okayasu
  • Publication number: 20100119717
    Abstract: A process which comprises applying a water-soluble resin composition comprising a water-soluble vinyl resin, a compound having at least two amino groups in the molecule, a solvent, and, if necessary, an additive such as a surfactant on a resist pattern (2) formed on a substrate (1) to form a water-soluble resin film (3) , modifying part of the water-soluble resin film adjacent to the resist pattern through mixing to form a water-insolubilized layer (4) which cannot be removed by water washing on the surface of the resist pattern, and removing unmodified part of the water-soluble resin film by water washing and which enables the effective scale-down of separation size and hole opening size of a resist pattern to a level finer than the limit of resolution of the wave length of exposure.
    Type: Application
    Filed: May 1, 2008
    Publication date: May 13, 2010
    Inventors: Sung-Eun Hong, Yusuke Takano, Wen-Bing Kang
  • Publication number: 20090317739
    Abstract: The present invention relates to an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit with an alkylamino group, where the unit has a structure (1), where, R1 to R5 are independently selected from hydrogen and C1 to C6 alkyl, and W is C1 to C6 alkyl. The invention also relates to a process for imaging a photoresist layer using the present composition.
    Type: Application
    Filed: June 18, 2008
    Publication date: December 24, 2009
    Inventors: Muthiah Thiyagarajan, Yi Cao, Sung Eun Hong, Ralph R. Dammel
  • Publication number: 20080193880
    Abstract: In the present invention, in a water soluble resin composition for use in a method for pattern formation in which a covering layer is provided on a resist pattern formed of a radiation-sensitive resin composition capable of coping with ArF exposure to increase the width of the resist pattern and thus to realize effective formation of higher density trench or hole pattern, the size reduction level of the resist pattern layer can be further increased as compared with that in the prior art technique, and, in addition, the size reduction level dependency of the coarse-and-fine resist pattern can be reduced. A method for pattern formation using the water soluble resin composition is also provided. The water soluble resin composition which is usable for the method for pattern formation applicable to ArF excimer laser irradiation comprises a water soluble resin, an acid generating agent capable of generating an acid upon heating, a surfactant, a crosslinking agent, and a water-containing solvent.
    Type: Application
    Filed: April 8, 2005
    Publication date: August 14, 2008
    Inventors: Takeshi Nishibe, Sung Eun Hong, Yusuke Takano, Tetsuo Okayasu
  • Patent number: 7335464
    Abstract: A water-soluble resin composition of the present invention comprises at least a water-soluble resin, an acid generator capable of generating an acid by heating and a solvent containing water. The water-soluble resin composition is applied on a highly water-repellant resist pattern 3 formed by a resist such as an ArF-responsive radiation sensitive resin composition on a substrate 1 to form a coated layer 4 thereon. The resist pattern 3 and the coated layer 4 are heat-treated to form a developer-insoluble modified coated layer 5 in the vicinity of a surface of the resist pattern 3. The coated layer is developed and the resist pattern thickened by the modified layer 5 is formed. The modified layer is a layer with sufficient thickness and is able to be formed with a high dimensional controllability in a highly water-repellant resist pattern such as ArF-responsive radiation sensitive resin composition.
    Type: Grant
    Filed: February 16, 2004
    Date of Patent: February 26, 2008
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Yusuke Takano, Sung-Eun Hong
  • Patent number: 7329477
    Abstract: The present invention provides a process for using an amine contamination-protecting top-coating composition. Preferably, the amine contamination-protecting top-coating composition of the present invention comprises an amine contamination-protecting compound. Useful amine contamination-protecting compounds include amine derivatives; amino acid derivatives; amide derivatives; urethane derivatives; urea derivatives; salts thereof; and mixtures thereof. The amine contamination-protecting top-coating composition of the present invention reduces or eliminates problems such as T-topping due to a post exposure delay effect and/or difficulties in forming a fine pattern below 100 nm due to acid diffusion associated with conventional lithography processes involving a photoresist polymer containing an alicyclic main chain using a light source, such as KrF (248 nm), ArF (193 nm), F2 (157 nm), E-beam, ion beam and extremely ultraviolet (EUV).
    Type: Grant
    Filed: November 19, 2004
    Date of Patent: February 12, 2008
    Assignee: Hynix Semiconductor Inc.
    Inventors: Jae Chang Jung, Keun Kyu Kong, Hyeong Soo Kim, Jin Soo Kim, Cha Won Koh, Sung Eun Hong, Geun Su Lee, Min Ho Jung, Ki Ho Baik
  • Publication number: 20070134151
    Abstract: The present invention discloses an ultrafine graphitic carbon fiber and a preparation method thereof. An ultrafine fiber having a diameter of 1 to 3000 nm is prepared by electrospinning a halogenated polymer solution containing a metal compound inducing graphitization. In carbonization, an ultrafine porous graphitic carbon fiber having a large specific surface area, micropores and macropores is prepared by the graphitization by a metal catalyst generated from the metal compound. The ultrafine carbon fiber can be used as a carbon material for storing hydrogen, an adsorbing material of biochemically noxious substances, an electrode material of a supercapacitor, a secondary cell and a fuel cell, and a catalyst carrier material.
    Type: Application
    Filed: December 1, 2006
    Publication date: June 14, 2007
    Applicant: Korea Institute of Science and Technology
    Inventors: Seong-Mu Jo, Dong-Young Kim, Byung-Doo Chin, Sung-Eun Hong
  • Patent number: 7150961
    Abstract: The present invention provides an additive for a photoresist composition for a resist flow process. A compound of following Formula 1 having low glass transition temperature is added to a photoresist composition containing a polymer which is not suitable for the resist flow process due to its high glass transition temperature, thus improving a flow property of the photoresist composition. As a result, the photoresist composition comprising an additive of Formula 1 can be used for the resist flow process. wherein, A, B, R and R? are as defined in the specification of the invention.
    Type: Grant
    Filed: February 27, 2004
    Date of Patent: December 19, 2006
    Assignee: Hynix Semiconductor Inc.
    Inventors: Min Ho Jung, Sung Eun Hong, Jae Chang Jung, Geun Su Lee, Ki Ho Baik
  • Publication number: 20060160015
    Abstract: A water-soluble resin composition of the present invention comprises at least a water-soluble resin, an acid generator capable of generating an acid by heating and a solvent containing water. The water-soluble resin composition is applied on a highly water-repellant resist pattern 3 formed by a resist such as an ArF-responsive radiation sensitive resin composition on a substrate 1 to form a coated layer 4 thereon. The resist pattern 3 and the coated layer 4 are heat-treated to form a developer-insoluble modified coated layer 5 in the vicinity of a surface of the resist pattern 3. The coated layer is developed and the resist pattern thickened by the modified layer 5 is formed. The modified layer is a layer with sufficient thickness and is able to be formed with a high dimensional controllability in a highly water-repellant resist pattern such as ArF-responsive radiation sensitive resin composition.
    Type: Application
    Filed: February 16, 2004
    Publication date: July 20, 2006
    Inventors: Yusuke Takano, Sung-Eun Hong
  • Patent number: 6984482
    Abstract: The present invention provides an over-coating composition comprising a basic compound for coating a photoresist composition to provide a vertical photoresist pattern.
    Type: Grant
    Filed: June 17, 2002
    Date of Patent: January 10, 2006
    Assignee: Hynix Semiconductor Inc.
    Inventors: Jae Chang Jung, Keun Kyu Kong, Hyeong Soo Kim, Jin Soo Kim, Cha Won Koh, Sung Eun Hong, Geun Su Lee, Min Ho Jung, Ki Ho Baik