Abstract: An optical proximity correction method includes loading a target layout for a mask, generating a correction density map based on manipulation of flare to correct global errors caused by exposing equipment, generating a flare map via convolution integration of the correction density map and a point spread function (PSF) regarding the flare, and correcting the target layout using the flare map and an OPC model.

Abstract: Provided are an optical proximity correction (OPC) method capable of correcting a slit-effect in an extreme ultraviolet (EUV) exposure process and a method of manufacturing an EUV mask by using the OPC method. The OPC method includes, dividing a transmission cross coefficient (TCC) according to regions of a slit that is used in an EUV exposure process, generating OPC models reflecting the TCCs that are divided, and correcting the OPC method.

Abstract: The present invention relates to an antiglare coating composition, and more particularly to an antiglare coating composition comprising an acrylate binder resin, fine particles whose refractive index varies between 0.2 to 0.5 from the refractive index of the binder resin and whose average particle size ranges from 0.05 to 1 ?m, and fine particles whose refractive index varies between 0.1 and whose average particle size ranges from 0.5 to 3 ?m. A coating composition of the present invention has a superior antiglare effect, reduced image distortion, high contrast, and enhanced image clarity when applied to a high-resolution display by scattering and inducing internal diffusion of light.

Abstract: Disclosed are a primer composition having photochromic property and impact resistance for coating transparent materials and a photochromic transparent material having a primer layer formed by coating and curing the primer composition. The primer composition for coating transparent materials comprises: a) 5-90 parts by weight of a polyurethane containing Brønsted salt; b) 5-50 parts by weight of a polyepoxy resin; and c) 140 parts by weight of a photochromic dye, based on 100 parts by weight of the total primer composition. The photochromic transparent material having a primer layer formed by coating and curing the primer composition shows excellent photochromic property and impact resistance.

Abstract: A photo-mask has a main mask pattern in a main region, a density correcting pattern in a peripheral region, and an exposure blocking pattern interposed between the main mask pattern and density correcting pattern. The exposure blocking pattern is configured to prevent the density correcting pattern from being transcribed to a wafer. The photo-mask is made by providing mask substrate on which a mask layer and a photoresist layer are disposed, providing design data that specifies at least the main mask pattern, and using the design data to derive exposure data that controls the exposure of the photoresist layer. The exposure data includes information that specifies the exposure blocking pattern, the portion of the peripheral region to be occupied by the density correcting pattern, and the pattern density of that portion of the peripheral region to be occupied by the density correcting pattern.

Abstract: Disclosed is a coating composition that can provide structural materials having hydrophilicity, excellent self-cleaning property and long service life. The present invention also discloses a method for preparing the composition, a substrate, such as a film or structural exterior material like vinyl sidings, with the applied coating composition, and a method to prepare a substrate with the coating composition. The coating composition has hydroxy group-containing inorganic particles that improve the initial hydrophilicity of conventional coating agents. Additionally, by using two types of inorganic particles having different particles diameters, the coating composition can form a hydrophilic coating layer having a contact angle with water of 30° or less.

Abstract: There is provided an apparatus for optical disc spin-coating, comprising a cap having a tapered protruding portion or a recess in its central lower portion; a turntable for rotation that has a tapered recess or protruding portion formed in an end of its central axis that is inserted into a center hole of an optical disc, wherein the tapered recess or protruding portion of the turntable is coupled with the tapered protruding portion or recess of the cap in a convexo-concave structure; and a vacuum hole formed in an optical disc support of the turntable. When the cap is eccentrically placed on the optical disc, the cap can be easily attached. In addition, the cap can be easily detached from the optical disc by using vacuum pressure. As a result, the operability and manufacturing efficiency can be increased.

Abstract: The present invention relates to a coating composition for forming an anti-reflective coating layer for a display device, comprising a fluorinated silane with low surface tension, a conductive polymer with antistatic properties, water, and a solvent. Thus, the coating film of the present invention prepared by coating the composition has high anti-reflection, excellent stain resistance to liquid-phase stains such as fingerprints and the solid-phase stains such as dust by controlling the refractive index, surface energy, and conductivity, and thus can be usefully applied to the outermost side of a display device, regardless of the type of substrates such as a Braun tube or a flat display film and the presence of other coating layers such as a hard coating layer and an anti-glare coating layer.

Abstract: A method of verifying electron beam data used to produce a photomask comprises dividing design data for the photomask into a plurality of repetitive regions, sequentially converting the sequential regions into electron beam data, and determining whether electron beam data corresponding to a current repetitive region is substantially identical to electron beam data corresponding to a previous repetitive region.

Abstract: A photo-mask has a main mask pattern in a main region, a density correcting pattern in a peripheral region, and an exposure blocking pattern interposed between the main mask pattern and density correcting pattern. The exposure blocking pattern is configured to prevent the density correcting pattern from being transcribed to a wafer. The photo-mask is made by providing mask substrate on which a mask layer and a photoresist layer are disposed, providing design data that specifies at least the main mask pattern, and using the design data to derive exposure data that controls the exposure of the photoresist layer. The exposure data includes information that specifies the exposure blocking pattern, the portion of the peripheral region to be occupied by the density correcting pattern, and the pattern density of that portion of the peripheral region to be occupied by the density correcting pattern.

Abstract: The present invention relates to an antiglare coating composition, and more particularly to an antiglare coating composition comprising an acrylate binder resin, fine particles whose refractive index varies between 0.2 to 0.5 from the refractive index of the binder resin and whose average particle size ranges from 0.05 to 1 ?m, and fine particles whose refractive index varies between 0.1 and whose average particle size ranges from 0.5 to 3 ?m. A coating composition of the present invention has a superior antiglare effect, reduced image distortion, high contrast, and enhanced image clarity when applied to a high-resolution display by scattering and inducing internal diffusion of light.

Abstract: A photomask for use in photolithography has substrate, a main pattern at one side of the substrate, and a transparency-adjusting layer at the other side of the substrate. The transparency-adjusting layer has a characteristic that allows it to change the intensity of the illumination incident on the main pattern during the exposure process accordingly. In manufacturing the photomask, a first exposure process is carried out on a wafer using just the substrate and main pattern. The critical dimensions of elements of the pattern formed on the wafer as a result of the first exposure process are measured. Differences between these critical dimensions and a reference critical dimension are then used in designing a layout of the transparency-adjusting layer in which the characteristic of the layer is varied to compensate for such differences.

Abstract: There is provided an apparatus for optical disc spin-coating, comprising a cap having a tapered protruding portion or a recess in its central lower portion; a turntable for rotation that has a tapered recess or protruding portion formed in an end of its central axis that is inserted into a center hole of an optical disc, wherein the tapered recess or protruding portion of the turntable is coupled with the tapered protruding portion or recess of the cap in a convexo-concave structure; and a vacuum hole formed in an optical disc support of the turntable. When the cap is eccentrically placed on the optical disc, the cap can be easily attached. In addition, the cap can be easily detached from the optical disc by using vacuum pressure. As a result, the operability and manufacturing efficiency can be increased.

Abstract: The present invention relates to a coating composition for forming an anti-reflective coating layer for a display device, comprising a fluorinated silane with low surface tension, a conductive polymer with antistatic properties, water, and a solvent. Thus, the coating film of the present invention prepared by coating the composition has high anti-reflection, excellent stain resistance to liquid-phase stains such as fingerprints and the solid-phase stains such as dust by controlling the refractive index, surface energy, and conductivity, and thus can be usefully applied to the outermost side of a display device, regardless of the type of substrates such as a Braun tube or a flat display film and the presence of other coating layers such as a hard coating layer and an anti-glare coating layer.

Abstract: A photomask for use in photolithography has substrate, a main pattern at one side of the substrate, and a transparency-adjusting layer at the other side of the substrate. The transparency-adjusting layer has a characteristic that allows it to change the intensity of the illumination incident on the main pattern during the exposure process accordingly. In manufacturing the photomask, a first exposure process is carried out on a wafer using just the substrate and main pattern. The critical dimensions of elements of the pattern formed on the wafer as a result of the first exposure process are measured. Differences between these critical dimensions and a reference critical dimension are then used in designing a layout of the transparency-adjusting layer in which the characteristic of the layer is varied to compensate for such differences.

Abstract: A coating composition having excellent antifogging property, good abrasion resistance, improved adhesion to the substrate and good water resistance, which comprises an epoxy functional organosilane or the hydrolysate or condensate thereof; an amino functional organosilane or the hydrolysate or condensate thereof; a hydrophilic (meth)acrylate monomer, or a copolymer of two components selected from the hydrophilic (meth)acrylate monomer, another hydrophilic monomer and an organosilane and/or a terpolymer of the three components; a curing catalyst; and, optionally, a multi-functional (meth)acrylate monomer having at least two (meth)acryl groups and a radical polymerization initiator.

Abstract: A coating composition having excellent antifogging property, good abrasion resistance, improved adhesion to the substrate and good water resistance, which comprises an epoxy functional organosilane or the hydrolysate or condensate thereof; an amino functional organosilane or the hydrolysate or condensate thereof; a hydrophilic (meth)acrylate monomer, or a copolymer of two components selected from the hydrophilic (meth)acrylate monomer, another hydrophilic monomer and an organosilane and/or a terpolymer of the three components; a curing catalyst; and, optionally, a multi-functional (meth)acrylate monomer having at least two (meth)acryl groups and a radical polymerization initiator.