Abstract: Provided is a cyclonic plasma melting furnace. A melting furnace chamber body includes an inlet through which waste is input and an outlet through which air or gas is discharged. The outlet is provided in a direction opposite to the inlet. At least one plasma torch is provided on the melting furnace chamber body so as to be inclined at a predetermined angle with respect to a direction in which the air or the gas is discharged through the outlet.

Abstract: Provided is a cyclonic plasma melting furnace. A melting furnace chamber body includes an inlet through which waste is input and an outlet through which air or gas is discharged. The outlet is provided in a direction opposite to the inlet. At least one plasma torch is provided on the melting furnace chamber body so as to be inclined at a predetermined angle with respect to a direction in which the air or the gas is discharged through the outlet.

Abstract: The present invention relates to method for depositing an organic material for an organic light emitting device and an organic light emitting device manufactured thereby. The method includes the steps of: applying a premix in which a host and a dopant are premixed, to a first donor substrate; heating the premix by applying an electric field to the first donor substrate; depositing the host and the dopant separated into different layers on a second donor substrate, with the host or the dopant having a relatively low vaporization temperature first deposited from the premix onto the second donor substrate and then the dopant or the host having a relatively high vaporization temperature deposited later onto the second donor substrate; heating the host and the dopant by applying an electric field to the second donor substrate; and depositing the host and the dopant that are uniformly mixed on a target substrate.

Abstract: The present invention relates to method for depositing an organic material for an organic light emitting device and an organic light emitting device manufactured thereby. The method includes the steps of: applying a premix in which a host and a dopant are premixed, to a first donor substrate; heating the premix by applying an electric field to the first donor substrate; depositing the host and the dopant separated into different layers on a second donor substrate, with the host or the dopant having a relatively low vaporization temperature first deposited from the premix onto the second donor substrate and then the dopant or the host having a relatively high vaporization temperature deposited later onto the second donor substrate; heating the host and the dopant by applying an electric field to the second donor substrate; and depositing the host and the dopant that are uniformly mixed on a target substrate.